KR101676120B1 - 오프셋 인쇄용 클리쉐 및 이의 제조방법 - Google Patents

오프셋 인쇄용 클리쉐 및 이의 제조방법 Download PDF

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Publication number
KR101676120B1
KR101676120B1 KR1020140169920A KR20140169920A KR101676120B1 KR 101676120 B1 KR101676120 B1 KR 101676120B1 KR 1020140169920 A KR1020140169920 A KR 1020140169920A KR 20140169920 A KR20140169920 A KR 20140169920A KR 101676120 B1 KR101676120 B1 KR 101676120B1
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KR
South Korea
Prior art keywords
fine pattern
line
pattern line
substrate
cliche
Prior art date
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KR1020140169920A
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English (en)
Korean (ko)
Other versions
KR20160065656A (ko
Inventor
성지현
김사라
이동현
이승헌
황지영
Original Assignee
주식회사 엘지화학
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Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to KR1020140169920A priority Critical patent/KR101676120B1/ko
Priority to CN201510674415.1A priority patent/CN105644133B/zh
Publication of KR20160065656A publication Critical patent/KR20160065656A/ko
Application granted granted Critical
Publication of KR101676120B1 publication Critical patent/KR101676120B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Printing Methods (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
KR1020140169920A 2014-12-01 2014-12-01 오프셋 인쇄용 클리쉐 및 이의 제조방법 KR101676120B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020140169920A KR101676120B1 (ko) 2014-12-01 2014-12-01 오프셋 인쇄용 클리쉐 및 이의 제조방법
CN201510674415.1A CN105644133B (zh) 2014-12-01 2015-10-16 用于胶印的移印版及其制备方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140169920A KR101676120B1 (ko) 2014-12-01 2014-12-01 오프셋 인쇄용 클리쉐 및 이의 제조방법

Publications (2)

Publication Number Publication Date
KR20160065656A KR20160065656A (ko) 2016-06-09
KR101676120B1 true KR101676120B1 (ko) 2016-11-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140169920A KR101676120B1 (ko) 2014-12-01 2014-12-01 오프셋 인쇄용 클리쉐 및 이의 제조방법

Country Status (2)

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KR (1) KR101676120B1 (zh)
CN (1) CN105644133B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102154216B1 (ko) * 2017-09-18 2020-09-09 주식회사 아모그린텍 터치 스크린 패널용 기판, 이를 포함하는 터치 스크린 패널 및 이의 제조 방법
TWI781884B (zh) * 2022-02-10 2022-10-21 南韓商皮埃斯產業有限公司 顯示板側面終端印刷系統

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101226914B1 (ko) 2012-03-13 2013-01-29 이동열 미세패턴 형성방법 및 이를 이용하여 제조된 클리쉐

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264962A (ja) * 2000-03-17 2001-09-28 Dainippon Printing Co Ltd オフセット印刷版
US6413286B1 (en) * 2000-05-03 2002-07-02 Saint-Gobain Abrasives Technology Company Production tool process
KR101335910B1 (ko) * 2005-09-16 2013-12-02 미쓰비시 마테리알 가부시키가이샤 인쇄용 잉크 및 그 잉크를 사용한 도막의 제조 방법
JP2008142956A (ja) * 2006-12-07 2008-06-26 Nec Lcd Technologies Ltd 印刷版及びその製造方法並びに液晶表示装置
KR100988437B1 (ko) 2007-09-21 2010-10-18 주식회사 엘지화학 네가티브 포토레지스트를 이용한 유리 또는 금속 식각방법 및 이를 이용한 클리쉐의 제조방법
JP6322139B2 (ja) * 2011-09-02 2018-05-09 エルジー・ケム・リミテッド クリシェおよびその製造方法
JP5433668B2 (ja) * 2011-11-28 2014-03-05 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版及びその製版方法
US9764541B2 (en) * 2012-05-31 2017-09-19 Lg Chem, Ltd. Cliché and printing apparatus comprising same
WO2014010888A1 (ko) * 2012-07-11 2014-01-16 주식회사 엘지화학 리버스 오프셋 인쇄용 인쇄판 및 그의 제조방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101226914B1 (ko) 2012-03-13 2013-01-29 이동열 미세패턴 형성방법 및 이를 이용하여 제조된 클리쉐

Also Published As

Publication number Publication date
KR20160065656A (ko) 2016-06-09
CN105644133A (zh) 2016-06-08
CN105644133B (zh) 2018-07-13

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