KR101563002B1 - 처리 장치 - Google Patents

처리 장치 Download PDF

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Publication number
KR101563002B1
KR101563002B1 KR1020090026624A KR20090026624A KR101563002B1 KR 101563002 B1 KR101563002 B1 KR 101563002B1 KR 1020090026624 A KR1020090026624 A KR 1020090026624A KR 20090026624 A KR20090026624 A KR 20090026624A KR 101563002 B1 KR101563002 B1 KR 101563002B1
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KR
South Korea
Prior art keywords
heating means
chamber
substrate
processing space
members
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KR1020090026624A
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English (en)
Korean (ko)
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KR20100086400A (ko
Inventor
히토시 이케다
마사시 기쿠치
마사히로 오가와
사토히로 오카야마
Original Assignee
가부시키가이샤 알박
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Publication of KR20100086400A publication Critical patent/KR20100086400A/ko
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Publication of KR101563002B1 publication Critical patent/KR101563002B1/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
KR1020090026624A 2009-01-22 2009-03-27 처리 장치 Active KR101563002B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009012402A JP5232671B2 (ja) 2009-01-22 2009-01-22 処理装置
JPJP-P-2009-012402 2009-01-22

Publications (2)

Publication Number Publication Date
KR20100086400A KR20100086400A (ko) 2010-07-30
KR101563002B1 true KR101563002B1 (ko) 2015-10-23

Family

ID=42530197

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090026624A Active KR101563002B1 (ko) 2009-01-22 2009-03-27 처리 장치

Country Status (4)

Country Link
JP (1) JP5232671B2 (enrdf_load_stackoverflow)
KR (1) KR101563002B1 (enrdf_load_stackoverflow)
CN (1) CN101786797B (enrdf_load_stackoverflow)
TW (1) TWI438290B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102560373B (zh) * 2010-12-16 2014-12-17 北京北方微电子基地设备工艺研究中心有限责任公司 基片加热腔室、使用基片加热腔室的方法及基片处理设备
CN102508381B (zh) * 2011-11-29 2015-02-11 深圳市华星光电技术有限公司 一种用于液晶面板的烘烤设备
CN104233210A (zh) * 2013-06-08 2014-12-24 深圳市联懋塑胶有限公司 一种高效顶喷真空离子镀套喷用的夹具
KR20170004773A (ko) * 2015-07-03 2017-01-11 김재욱 다단으로 탈포가 가능한 오토클레이브 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002221394A (ja) * 2001-01-24 2002-08-09 Showa Mfg Co Ltd 電子部品の加熱装置
JP2006261109A (ja) * 2005-02-18 2006-09-28 Semiconductor Energy Lab Co Ltd 発光装置およびその作製方法、及び蒸着装置
WO2006134888A1 (ja) * 2005-06-14 2006-12-21 Shimadzu Corporation Ｔｆｔ基板検査装置
JP2008197374A (ja) * 2007-02-13 2008-08-28 Ulvac Japan Ltd 真空チャンバ、ロードロックチャンバ、及び処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3833439B2 (ja) * 2000-05-02 2006-10-11 株式会社ノリタケカンパニーリミテド 大型基板用多段加熱炉、及び両面加熱式遠赤外線パネルヒーター、並びに該加熱炉内の給排気方法
JP4280481B2 (ja) * 2002-10-17 2009-06-17 タツモ株式会社 基板支持装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002221394A (ja) * 2001-01-24 2002-08-09 Showa Mfg Co Ltd 電子部品の加熱装置
JP2006261109A (ja) * 2005-02-18 2006-09-28 Semiconductor Energy Lab Co Ltd 発光装置およびその作製方法、及び蒸着装置
WO2006134888A1 (ja) * 2005-06-14 2006-12-21 Shimadzu Corporation Ｔｆｔ基板検査装置
JP2008197374A (ja) * 2007-02-13 2008-08-28 Ulvac Japan Ltd 真空チャンバ、ロードロックチャンバ、及び処理装置

Also Published As

Publication number Publication date
JP2010169896A (ja) 2010-08-05
KR20100086400A (ko) 2010-07-30
CN101786797B (zh) 2014-04-02
TWI438290B (zh) 2014-05-21
TW201028489A (en) 2010-08-01
CN101786797A (zh) 2010-07-28
JP5232671B2 (ja) 2013-07-10

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