KR101561682B1 - 깊은 홈 후측 콘택 광발전 태양 전지들 - Google Patents
깊은 홈 후측 콘택 광발전 태양 전지들 Download PDFInfo
- Publication number
- KR101561682B1 KR101561682B1 KR1020117013407A KR20117013407A KR101561682B1 KR 101561682 B1 KR101561682 B1 KR 101561682B1 KR 1020117013407 A KR1020117013407 A KR 1020117013407A KR 20117013407 A KR20117013407 A KR 20117013407A KR 101561682 B1 KR101561682 B1 KR 101561682B1
- Authority
- KR
- South Korea
- Prior art keywords
- doped region
- wafer
- passivation layer
- doped
- rear surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 claims abstract description 61
- 238000002161 passivation Methods 0.000 claims abstract description 43
- 239000004065 semiconductor Substances 0.000 claims abstract description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 238000009792 diffusion process Methods 0.000 claims description 20
- 239000002019 doping agent Substances 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 239000010949 copper Substances 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 10
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- 238000005215 recombination Methods 0.000 claims description 5
- 230000006798 recombination Effects 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 238000007772 electroless plating Methods 0.000 claims description 4
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 239000011574 phosphorus Substances 0.000 claims description 4
- 239000010432 diamond Substances 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- 238000007650 screen-printing Methods 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 238000005245 sintering Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 abstract description 43
- 239000010410 layer Substances 0.000 description 41
- 238000010561 standard procedure Methods 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000006117 anti-reflective coating Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000370 acceptor Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000002803 fossil fuel Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/40—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising photovoltaic cells in a mechanically stacked configuration
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/146—Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
- H10F77/148—Shapes of potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
- H10F77/219—Arrangements for electrodes of back-contact photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/93—Interconnections
- H10F77/933—Interconnections for devices having potential barriers
- H10F77/935—Interconnections for devices having potential barriers for photovoltaic devices or modules
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Photovoltaic Devices (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Manufacturing & Machinery (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0820684.9A GB0820684D0 (en) | 2008-11-12 | 2008-11-12 | Photovoltaic solar cells |
| GB0820684.9 | 2008-11-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20110097827A KR20110097827A (ko) | 2011-08-31 |
| KR101561682B1 true KR101561682B1 (ko) | 2015-10-20 |
Family
ID=40139786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020117013407A Active KR101561682B1 (ko) | 2008-11-12 | 2009-11-12 | 깊은 홈 후측 콘택 광발전 태양 전지들 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8889462B2 (enExample) |
| EP (1) | EP2356687B1 (enExample) |
| JP (1) | JP5503668B2 (enExample) |
| KR (1) | KR101561682B1 (enExample) |
| CN (1) | CN102246324B (enExample) |
| GB (2) | GB0820684D0 (enExample) |
| WO (1) | WO2010055346A2 (enExample) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2356689A4 (en) * | 2008-11-26 | 2013-11-20 | Microlink Devices Inc | SOLAR CELL WITH BACK WAY FOR CONTACT TO EMITTER LAYER |
| US20110195542A1 (en) * | 2010-02-05 | 2011-08-11 | E-Chem Enterprise Corp. | Method of providing solar cell electrode by electroless plating and an activator used therein |
| JP2011210802A (ja) * | 2010-03-29 | 2011-10-20 | Napura:Kk | 太陽電池 |
| CN102569491B (zh) * | 2010-12-17 | 2014-07-23 | 上海凯世通半导体有限公司 | 太阳能晶片的掺杂方法以及掺杂晶片 |
| CN102637766B (zh) * | 2011-02-15 | 2014-04-30 | 上海凯世通半导体有限公司 | 太阳能晶片掺杂方法、掺杂晶片、太阳能电池及制作方法 |
| CN102569492B (zh) * | 2010-12-17 | 2014-11-05 | 上海凯世通半导体有限公司 | 太阳能晶片的掺杂方法以及掺杂晶片 |
| CN102637767B (zh) * | 2011-02-15 | 2015-03-18 | 上海凯世通半导体有限公司 | 太阳能电池的制作方法以及太阳能电池 |
| US9559228B2 (en) * | 2011-09-30 | 2017-01-31 | Sunpower Corporation | Solar cell with doped groove regions separated by ridges |
| US9269851B2 (en) * | 2011-11-15 | 2016-02-23 | Newsouth Innovations Pty Limited | Metal contact scheme for solar cells |
| US20140345685A1 (en) * | 2011-12-13 | 2014-11-27 | Dow Corning Corporation | Photovoltaic Cell And Method Of Forming The Same |
| TWI470816B (zh) * | 2011-12-28 | 2015-01-21 | Au Optronics Corp | 太陽能電池 |
| CN103208557A (zh) * | 2012-01-13 | 2013-07-17 | 上海凯世通半导体有限公司 | 太阳能电池的制作方法及太阳能电池 |
| CN103325666A (zh) * | 2012-03-21 | 2013-09-25 | 苏州贝克微电子有限公司 | 半导体晶圆掺杂扩散技术 |
| CN102623564B (zh) * | 2012-03-30 | 2015-01-07 | 中山大学 | 一种具有激光开槽正面电极的晶体硅太阳电池的制作方法 |
| CN102738288A (zh) * | 2012-06-20 | 2012-10-17 | 常州天合光能有限公司 | 非晶硅钝化n型背接触电池及其制备方法 |
| CN102832270A (zh) * | 2012-08-16 | 2012-12-19 | 友达光电股份有限公司 | 太阳能电池及其制作方法 |
| CN102856328B (zh) * | 2012-10-10 | 2015-06-10 | 友达光电股份有限公司 | 太阳能电池及其制作方法 |
| CN102881737A (zh) * | 2012-10-15 | 2013-01-16 | 浙江正泰太阳能科技有限公司 | 体结背接触太阳能电池 |
| CN102903775B (zh) * | 2012-10-24 | 2014-10-22 | 中国科学院半导体研究所 | 用于聚光和激光输能的晶体硅太阳能电池结构及其制作方法 |
| WO2014137284A1 (en) * | 2013-03-05 | 2014-09-12 | Trina Solar Energy Development Pte Ltd | Method of fabricating a solar cell |
| TW201442261A (zh) * | 2013-04-30 | 2014-11-01 | Terasolar Energy Materials Corp | 矽晶太陽能電池的製造方法以及矽晶太陽能電池 |
| CN103794679B (zh) * | 2014-01-26 | 2016-07-06 | 晶澳(扬州)太阳能科技有限公司 | 一种背接触太阳能电池的制备方法 |
| US20160284917A1 (en) * | 2015-03-27 | 2016-09-29 | Seung Bum Rim | Passivation Layer for Solar Cells |
| WO2017146214A1 (ja) * | 2016-02-26 | 2017-08-31 | 京セラ株式会社 | 太陽電池素子 |
| TWI668876B (zh) * | 2017-08-29 | 2019-08-11 | 柯作同 | 太陽能電池及其製造方法 |
| WO2019102073A1 (en) * | 2017-11-24 | 2019-05-31 | Aalto-Korkeakoulusäätiö Sr | Photovoltaic semiconductor structure |
| US11081606B2 (en) * | 2018-12-27 | 2021-08-03 | Solarpaint Ltd. | Flexible and rollable photovoltaic cell having enhanced properties of mechanical impact absorption |
| US11978815B2 (en) | 2018-12-27 | 2024-05-07 | Solarpaint Ltd. | Flexible photovoltaic cell, and methods and systems of producing it |
| EP4226427A4 (en) * | 2020-10-07 | 2024-11-06 | Solarpaint Ltd. | FLEXIBLE SOLAR PANELS AND PHOTOVOLTAIC DEVICES AND METHODS AND SYSTEMS FOR THE PRODUCTION THEREOF |
| CN114695594B (zh) * | 2020-12-30 | 2024-11-15 | 苏州阿特斯阳光电力科技有限公司 | 背接触电池的制备方法及背接触电池 |
| CN121078843A (zh) * | 2021-06-04 | 2025-12-05 | 浙江爱旭太阳能科技有限公司 | 一种选择性接触区域掩埋型太阳能电池及其背面接触结构 |
| CN113964222B (zh) * | 2021-10-15 | 2023-11-10 | 浙江大学 | 一种低漏电的晶体硅太阳能电池片、电池组件及制备方法 |
| CN113964223B (zh) * | 2021-10-15 | 2023-11-10 | 浙江大学 | 一种抑制切割边缘漏电的晶体硅太阳能电池片、电池组件及制备方法 |
| CN115084299B (zh) * | 2022-06-23 | 2024-10-01 | 广东爱旭科技有限公司 | 一种p型太阳能电池及其制作方法、电池组件和光伏系统 |
| CN115000214B (zh) * | 2022-06-23 | 2024-03-29 | 浙江爱旭太阳能科技有限公司 | 一种p型太阳能电池及其制作方法、电池组件和光伏系统 |
| CN115000247B (zh) * | 2022-07-29 | 2022-11-04 | 中国华能集团清洁能源技术研究院有限公司 | 内部钝化的背接触perc电池片的制作方法 |
| CN118943223A (zh) * | 2024-07-24 | 2024-11-12 | 浙江爱旭太阳能科技有限公司 | 一种太阳能电池、电池组件及光伏系统 |
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| US4838952A (en) | 1988-04-29 | 1989-06-13 | Spectrolab, Inc. | Controlled reflectance solar cell |
| KR100378343B1 (ko) | 1996-01-09 | 2003-07-18 | 삼성전자주식회사 | 후면 함몰전극형 태양전지 |
| JP2007059644A (ja) | 2005-08-25 | 2007-03-08 | Toyota Motor Corp | 光起電力素子 |
| US7339110B1 (en) | 2003-04-10 | 2008-03-04 | Sunpower Corporation | Solar cell and method of manufacture |
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| US4703553A (en) * | 1986-06-16 | 1987-11-03 | Spectrolab, Inc. | Drive through doping process for manufacturing low back surface recombination solar cells |
| US5053083A (en) * | 1989-05-08 | 1991-10-01 | The Board Of Trustees Of The Leland Stanford Junior University | Bilevel contact solar cells |
| JPH0682854B2 (ja) * | 1989-11-24 | 1994-10-19 | 株式会社日立製作所 | 太陽電池 |
| JP2001267610A (ja) * | 2000-03-17 | 2001-09-28 | Hitachi Ltd | 太陽電池 |
| KR100372343B1 (ko) | 2000-12-22 | 2003-02-15 | 엘지전자 주식회사 | 넘버.세븐 신호망에서의 폐기 메시지 관리 방법 |
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| US7169669B2 (en) * | 2001-12-04 | 2007-01-30 | Origin Energy Solar Pty. Ltd. | Method of making thin silicon sheets for solar cells |
| JP2005310830A (ja) * | 2004-04-16 | 2005-11-04 | Sharp Corp | 太陽電池および太陽電池の製造方法 |
| CN1957478A (zh) | 2004-04-30 | 2007-05-02 | 新南创新有限公司 | 人造无定形半导体及其在太阳能电池中的应用 |
| JP4641858B2 (ja) * | 2005-04-22 | 2011-03-02 | シャープ株式会社 | 太陽電池 |
| JP4481869B2 (ja) * | 2005-04-26 | 2010-06-16 | 信越半導体株式会社 | 太陽電池の製造方法及び太陽電池並びに半導体装置の製造方法 |
| US20070137692A1 (en) * | 2005-12-16 | 2007-06-21 | Bp Corporation North America Inc. | Back-Contact Photovoltaic Cells |
| JP2009152222A (ja) * | 2006-10-27 | 2009-07-09 | Kyocera Corp | 太陽電池素子の製造方法 |
| CN101017858A (zh) * | 2007-01-10 | 2007-08-15 | 北京市太阳能研究所有限公司 | 一种背接触式太阳能电池及其制作方法 |
| CN201112399Y (zh) * | 2007-09-27 | 2008-09-10 | 江苏林洋新能源有限公司 | 具有浓硼浓磷扩散结构的太阳能电池 |
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- 2008-11-12 GB GBGB0820684.9A patent/GB0820684D0/en not_active Ceased
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2009
- 2009-11-12 KR KR1020117013407A patent/KR101561682B1/ko active Active
- 2009-11-12 US US13/128,742 patent/US8889462B2/en active Active
- 2009-11-12 EP EP09771758.1A patent/EP2356687B1/en active Active
- 2009-11-12 WO PCT/GB2009/051528 patent/WO2010055346A2/en not_active Ceased
- 2009-11-12 JP JP2011543814A patent/JP5503668B2/ja active Active
- 2009-11-12 CN CN200980149558.3A patent/CN102246324B/zh active Active
- 2009-11-12 GB GB0919795.5A patent/GB2466342B/en active Active
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| US4838952A (en) | 1988-04-29 | 1989-06-13 | Spectrolab, Inc. | Controlled reflectance solar cell |
| KR100378343B1 (ko) | 1996-01-09 | 2003-07-18 | 삼성전자주식회사 | 후면 함몰전극형 태양전지 |
| US7339110B1 (en) | 2003-04-10 | 2008-03-04 | Sunpower Corporation | Solar cell and method of manufacture |
| JP2007059644A (ja) | 2005-08-25 | 2007-03-08 | Toyota Motor Corp | 光起電力素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2466342A (en) | 2010-06-23 |
| US20110214721A1 (en) | 2011-09-08 |
| EP2356687B1 (en) | 2016-10-12 |
| KR20110097827A (ko) | 2011-08-31 |
| GB2466342B (en) | 2013-07-17 |
| CN102246324B (zh) | 2015-07-29 |
| GB0919795D0 (en) | 2009-12-30 |
| JP2012508473A (ja) | 2012-04-05 |
| JP5503668B2 (ja) | 2014-05-28 |
| CN102246324A (zh) | 2011-11-16 |
| WO2010055346A2 (en) | 2010-05-20 |
| EP2356687A2 (en) | 2011-08-17 |
| GB0820684D0 (en) | 2008-12-17 |
| US8889462B2 (en) | 2014-11-18 |
| WO2010055346A3 (en) | 2011-03-31 |
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