KR101493377B1 - 반도체 발광장치 - Google Patents
반도체 발광장치 Download PDFInfo
- Publication number
- KR101493377B1 KR101493377B1 KR20130114286A KR20130114286A KR101493377B1 KR 101493377 B1 KR101493377 B1 KR 101493377B1 KR 20130114286 A KR20130114286 A KR 20130114286A KR 20130114286 A KR20130114286 A KR 20130114286A KR 101493377 B1 KR101493377 B1 KR 101493377B1
- Authority
- KR
- South Korea
- Prior art keywords
- light emitting
- region
- insulating film
- interlayer insulating
- control transistor
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 114
- 239000010410 layer Substances 0.000 claims abstract description 86
- 239000011229 interlayer Substances 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 150000004767 nitrides Chemical class 0.000 claims abstract description 4
- 238000009751 slip forming Methods 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 27
- 230000005669 field effect Effects 0.000 claims description 4
- 230000007257 malfunction Effects 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 79
- 238000004519 manufacturing process Methods 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical group [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 229910002601 GaN Inorganic materials 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 230000003071 parasitic effect Effects 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical group [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Chemical group 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical group [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- QYHNIMDZIYANJH-UHFFFAOYSA-N diindium Chemical group [In]#[In] QYHNIMDZIYANJH-UHFFFAOYSA-N 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
- H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12041—LED
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Led Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2012-224681 | 2012-10-10 | ||
JP2012224681A JP5935643B2 (ja) | 2012-10-10 | 2012-10-10 | 半導体発光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20140046372A KR20140046372A (ko) | 2014-04-18 |
KR101493377B1 true KR101493377B1 (ko) | 2015-02-13 |
Family
ID=50454492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR20130114286A KR101493377B1 (ko) | 2012-10-10 | 2013-09-26 | 반도체 발광장치 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5935643B2 (zh) |
KR (1) | KR101493377B1 (zh) |
CN (1) | CN103730478B (zh) |
TW (1) | TWI542043B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180052977A (ko) * | 2016-11-11 | 2018-05-21 | 순천대학교 산학협력단 | 마이크로 픽셀 어레이 발광다이오드 및 이를 포함하는 조명 장치 |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6612119B2 (ja) * | 2015-02-16 | 2019-11-27 | 株式会社東芝 | 半導体発光装置 |
KR102385327B1 (ko) * | 2015-04-06 | 2022-04-12 | 삼성디스플레이 주식회사 | 플렉서블 표시 장치 및 이의 제조 방법 |
KR102520536B1 (ko) * | 2016-03-30 | 2023-04-12 | 엘지이노텍 주식회사 | 반도체 소자, 이를 포함하는 표시패널, 표시장치, 통신장치 |
KR102539668B1 (ko) * | 2016-06-30 | 2023-06-02 | 엘지이노텍 주식회사 | 반도체 소자, 이를 포함하는 표시패널, 표시장치, 통신장치 |
WO2017171337A1 (ko) * | 2016-03-30 | 2017-10-05 | 엘지이노텍 주식회사 | 반도체 소자 |
US10237929B2 (en) * | 2016-04-27 | 2019-03-19 | Sensor Electronic Technology, Inc. | Solid-state lighting source with integrated electronic modulator |
KR102573586B1 (ko) * | 2016-06-16 | 2023-09-01 | 엘지이노텍 주식회사 | 표시 장치 및 이의 제조 방법 |
KR102566787B1 (ko) * | 2016-06-27 | 2023-08-11 | 엘지디스플레이 주식회사 | 발광 다이오드 칩 및 이를 포함하는 디스플레이 장치와 이의 제조 방법 |
KR102648970B1 (ko) * | 2016-06-30 | 2024-03-19 | 엘지디스플레이 주식회사 | 디스플레이 장치와 이의 제조 방법 |
KR20180078941A (ko) * | 2016-12-30 | 2018-07-10 | (재)한국나노기술원 | 액티브 매트릭스 디스플레이용 led 소자 및 그의 제조방법 |
KR102041270B1 (ko) * | 2018-04-04 | 2019-11-06 | 한국광기술원 | 미세 led 칩 및 패키지에 대한 제조방법 |
KR102022310B1 (ko) * | 2018-04-04 | 2019-09-18 | 한국광기술원 | 능동소자 집적형 미세 led 칩 및 이에 대한 제조방법 |
KR102550415B1 (ko) | 2018-05-09 | 2023-07-05 | 삼성전자주식회사 | Led 장치 및 이를 이용한 led 램프 |
TW202005076A (zh) * | 2018-05-29 | 2020-01-16 | 美商康寧公司 | 結合高溫與低溫元件形成的系統與方法 |
KR102609672B1 (ko) * | 2018-07-17 | 2023-12-05 | 이 잉크 코포레이션 | 전기 광학 디스플레이들 및 구동 방법들 |
CN111627949A (zh) * | 2019-02-27 | 2020-09-04 | 昆山工研院新型平板显示技术中心有限公司 | 微发光二极管像素单元器件结构、制备方法及显示面板 |
KR102243109B1 (ko) * | 2019-07-02 | 2021-04-22 | 한국과학기술원 | 웨이퍼 레벨 전사를 이용한 중/소형 디스플레이의 대량 제조방법 및 대형 디스플레이 제조 방법 |
CN110649060B (zh) * | 2019-11-01 | 2022-04-26 | 京东方科技集团股份有限公司 | 微发光二极管芯片及制作方法、显示面板制作方法 |
KR20210111920A (ko) * | 2020-03-03 | 2021-09-14 | 삼성디스플레이 주식회사 | 발광 소자 및 이를 포함하는 표시 장치 |
CN116134630A (zh) * | 2020-09-17 | 2023-05-16 | 日亚化学工业株式会社 | 图像显示装置的制造方法及图像显示装置 |
WO2022113949A1 (ja) * | 2020-11-25 | 2022-06-02 | 日亜化学工業株式会社 | 画像表示装置の製造方法および画像表示装置 |
CN116420240A (zh) * | 2020-11-25 | 2023-07-11 | 日亚化学工业株式会社 | 图像显示装置的制造方法以及图像显示装置 |
JPWO2022209748A1 (zh) * | 2021-03-29 | 2022-10-06 | ||
JPWO2022209823A1 (zh) * | 2021-03-30 | 2022-10-06 | ||
JP7508697B2 (ja) | 2021-03-31 | 2024-07-01 | 株式会社ジャパンディスプレイ | 表示装置 |
KR102578744B1 (ko) * | 2022-09-23 | 2023-09-14 | 엔스펙트라 주식회사 | 반사형 맞춤 컬러 표시장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10270753A (ja) * | 1997-03-21 | 1998-10-09 | Sanyo Electric Co Ltd | 半導体発光素子および表示装置 |
KR100234350B1 (ko) | 1992-03-28 | 1999-12-15 | 윤종용 | 화합물 반도체 장치의 제조방법 |
JP4871344B2 (ja) | 2008-11-25 | 2012-02-08 | 株式会社東芝 | 発光装置及びその製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6333522B1 (en) * | 1997-01-31 | 2001-12-25 | Matsushita Electric Industrial Co., Ltd. | Light-emitting element, semiconductor light-emitting device, and manufacturing methods therefor |
JP2001127278A (ja) * | 1999-10-25 | 2001-05-11 | Rohm Co Ltd | 複合半導体装置 |
CN100468766C (zh) * | 2003-09-24 | 2009-03-11 | 三垦电气株式会社 | 氮化物类半导体元件 |
JP4916859B2 (ja) * | 2005-12-20 | 2012-04-18 | 株式会社半導体エネルギー研究所 | 半導体装置、表示装置、電子機器、及び半導体装置の製造方法 |
JP5849388B2 (ja) * | 2010-11-04 | 2016-01-27 | サンケン電気株式会社 | 半導体発光装置 |
-
2012
- 2012-10-10 JP JP2012224681A patent/JP5935643B2/ja active Active
-
2013
- 2013-09-26 KR KR20130114286A patent/KR101493377B1/ko not_active IP Right Cessation
- 2013-10-08 CN CN201310464248.9A patent/CN103730478B/zh active Active
- 2013-10-09 TW TW102136497A patent/TWI542043B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100234350B1 (ko) | 1992-03-28 | 1999-12-15 | 윤종용 | 화합물 반도체 장치의 제조방법 |
JPH10270753A (ja) * | 1997-03-21 | 1998-10-09 | Sanyo Electric Co Ltd | 半導体発光素子および表示装置 |
JP4871344B2 (ja) | 2008-11-25 | 2012-02-08 | 株式会社東芝 | 発光装置及びその製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180052977A (ko) * | 2016-11-11 | 2018-05-21 | 순천대학교 산학협력단 | 마이크로 픽셀 어레이 발광다이오드 및 이를 포함하는 조명 장치 |
KR101878666B1 (ko) * | 2016-11-11 | 2018-08-16 | 순천대학교 산학협력단 | 마이크로 픽셀 어레이 발광다이오드 및 이를 포함하는 조명 장치 |
Also Published As
Publication number | Publication date |
---|---|
CN103730478A (zh) | 2014-04-16 |
TW201429004A (zh) | 2014-07-16 |
KR20140046372A (ko) | 2014-04-18 |
JP5935643B2 (ja) | 2016-06-15 |
JP2014078575A (ja) | 2014-05-01 |
CN103730478B (zh) | 2016-05-04 |
TWI542043B (zh) | 2016-07-11 |
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