KR101482552B1 - 네가티브 감광성 수지 조성물 - Google Patents

네가티브 감광성 수지 조성물 Download PDF

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Publication number
KR101482552B1
KR101482552B1 KR20080040159A KR20080040159A KR101482552B1 KR 101482552 B1 KR101482552 B1 KR 101482552B1 KR 20080040159 A KR20080040159 A KR 20080040159A KR 20080040159 A KR20080040159 A KR 20080040159A KR 101482552 B1 KR101482552 B1 KR 101482552B1
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KR
South Korea
Prior art keywords
photosensitive resin
resin composition
negative photosensitive
weight
liquid crystal
Prior art date
Application number
KR20080040159A
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English (en)
Korean (ko)
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KR20090114494A (ko
Inventor
김병욱
윤혁민
김동명
최상각
구기혁
여태훈
윤주표
신홍대
최수연
김진선
이상훈
Original Assignee
주식회사 동진쎄미켐
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 주식회사 동진쎄미켐 filed Critical 주식회사 동진쎄미켐
Priority to KR20080040159A priority Critical patent/KR101482552B1/ko
Priority to TW98114165A priority patent/TWI471697B/zh
Priority to JP2009110352A priority patent/JP5639746B2/ja
Priority to CNA2009101369722A priority patent/CN101571672A/zh
Publication of KR20090114494A publication Critical patent/KR20090114494A/ko
Application granted granted Critical
Publication of KR101482552B1 publication Critical patent/KR101482552B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/235—Saturated compounds containing more than one carboxyl group
    • C07C59/245—Saturated compounds containing more than one carboxyl group containing hydroxy or O-metal groups
    • C07C59/285—Polyhydroxy dicarboxylic acids having five or more carbon atoms, e.g. saccharic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Liquid Crystal (AREA)
KR20080040159A 2008-04-30 2008-04-30 네가티브 감광성 수지 조성물 KR101482552B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR20080040159A KR101482552B1 (ko) 2008-04-30 2008-04-30 네가티브 감광성 수지 조성물
TW98114165A TWI471697B (zh) 2008-04-30 2009-04-29 負型感光性樹脂組成物
JP2009110352A JP5639746B2 (ja) 2008-04-30 2009-04-30 ネガティブ感光性樹脂組成物
CNA2009101369722A CN101571672A (zh) 2008-04-30 2009-04-30 负型感光性树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR20080040159A KR101482552B1 (ko) 2008-04-30 2008-04-30 네가티브 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
KR20090114494A KR20090114494A (ko) 2009-11-04
KR101482552B1 true KR101482552B1 (ko) 2015-01-21

Family

ID=41231055

Family Applications (1)

Application Number Title Priority Date Filing Date
KR20080040159A KR101482552B1 (ko) 2008-04-30 2008-04-30 네가티브 감광성 수지 조성물

Country Status (4)

Country Link
JP (1) JP5639746B2 (zh)
KR (1) KR101482552B1 (zh)
CN (1) CN101571672A (zh)
TW (1) TWI471697B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101612673B1 (ko) * 2015-03-11 2016-04-14 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101121038B1 (ko) * 2008-07-01 2012-03-15 주식회사 엘지화학 복수의 광개시제를 포함한 감광성 수지 조성물, 이를 이용한 투명 박막층 및 액정 표시 장치
KR101235254B1 (ko) * 2009-12-31 2013-02-20 주식회사 삼양사 고내열성 음성 레지스트 조성물
TWI477904B (zh) * 2010-03-26 2015-03-21 Sumitomo Chemical Co Photosensitive resin composition
CN107652383A (zh) * 2011-10-20 2018-02-02 日立化成株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法以及印刷电路板的制造方法
KR20140098483A (ko) * 2013-01-31 2014-08-08 삼성디스플레이 주식회사 감광성 수지 조성물 및 이를 이용한 패턴 형성 방법
KR102450387B1 (ko) 2015-05-13 2022-10-04 롬엔드하스전자재료코리아유한회사 네거티브형 감광성 수지 조성물 및 이를 이용한 절연막
KR102630945B1 (ko) * 2015-11-20 2024-01-30 주식회사 동진쎄미켐 감광성 수지 조성물
CN107870513B (zh) * 2017-12-01 2020-12-29 苏州瑞红电子化学品有限公司 负性光刻胶、悬浊液及该悬浊液的配制方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06279635A (ja) * 1993-03-26 1994-10-04 Mitsubishi Petrochem Co Ltd 着色樹脂組成物
JP2005234362A (ja) 2004-02-20 2005-09-02 Jsr Corp スペーサー形成用感放射線性樹脂組成物、スペーサーとその形成方法および液晶表示素子

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005300994A (ja) * 2004-04-13 2005-10-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP4419736B2 (ja) * 2004-07-20 2010-02-24 Ｊｓｒ株式会社 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP4646582B2 (ja) * 2004-09-15 2011-03-09 ダイセル化学工業株式会社 フォトレジスト用共重合体の製造法
WO2006070794A1 (ja) * 2004-12-28 2006-07-06 Dai Nippon Printing Co., Ltd. 表示素子用黒色樹脂組成物、及び表示素子用部材
KR101221450B1 (ko) * 2005-07-19 2013-01-11 주식회사 동진쎄미켐 유무기 복합 감광성 수지 조성물
JP4631594B2 (ja) * 2005-08-16 2011-02-16 Ｊｓｒ株式会社 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP2007286101A (ja) * 2006-04-12 2007-11-01 Dainippon Printing Co Ltd 感光性着色樹脂組成物、カラーフィルター、表示装置
JP4911304B2 (ja) * 2007-03-20 2012-04-04 Ｊｓｒ株式会社 感放射線性樹脂組成物および液晶表示素子用スペーサー

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06279635A (ja) * 1993-03-26 1994-10-04 Mitsubishi Petrochem Co Ltd 着色樹脂組成物
JP2005234362A (ja) 2004-02-20 2005-09-02 Jsr Corp スペーサー形成用感放射線性樹脂組成物、スペーサーとその形成方法および液晶表示素子

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101612673B1 (ko) * 2015-03-11 2016-04-14 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물
CN105974733A (zh) * 2015-03-11 2016-09-28 东友精细化工有限公司 负型感光性树脂组合物、用其形成的图案和图像显示装置
CN105974733B (zh) * 2015-03-11 2021-01-15 东友精细化工有限公司 负型感光性树脂组合物、用其形成的图案和图像显示装置

Also Published As

Publication number Publication date
TWI471697B (zh) 2015-02-01
CN101571672A (zh) 2009-11-04
JP5639746B2 (ja) 2014-12-10
KR20090114494A (ko) 2009-11-04
TW201003317A (en) 2010-01-16
JP2009271532A (ja) 2009-11-19

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