KR101444981B1 - 노광 장치, 노광 방법 및 디바이스 제조 방법 - Google Patents

노광 장치, 노광 방법 및 디바이스 제조 방법 Download PDF

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Publication number
KR101444981B1
KR101444981B1 KR1020110040205A KR20110040205A KR101444981B1 KR 101444981 B1 KR101444981 B1 KR 101444981B1 KR 1020110040205 A KR1020110040205 A KR 1020110040205A KR 20110040205 A KR20110040205 A KR 20110040205A KR 101444981 B1 KR101444981 B1 KR 101444981B1
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South Korea
Prior art keywords
substrate
measurement
height
stage
measurement point
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Korean (ko)
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KR20110123665A (ko
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다까노리 사또
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캐논 가부시끼가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/53—Automatic registration or positioning of originals with respect to each other or the photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020110040205A 2010-05-07 2011-04-28 노광 장치, 노광 방법 및 디바이스 제조 방법 Active KR101444981B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010107716A JP5498243B2 (ja) 2010-05-07 2010-05-07 露光装置、露光方法及びデバイス製造方法
JPJP-P-2010-107716 2010-05-07

Publications (2)

Publication Number Publication Date
KR20110123665A KR20110123665A (ko) 2011-11-15
KR101444981B1 true KR101444981B1 (ko) 2014-09-26

Family

ID=44901733

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KR1020110040205A Active KR101444981B1 (ko) 2010-05-07 2011-04-28 노광 장치, 노광 방법 및 디바이스 제조 방법

Country Status (3)

Country Link
US (2) US8625072B2 (https=)
JP (1) JP5498243B2 (https=)
KR (1) KR101444981B1 (https=)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5849613B2 (ja) 2011-10-31 2016-01-27 株式会社リコー 画像表示装置
JP6053316B2 (ja) * 2012-05-09 2016-12-27 キヤノン株式会社 リソグラフィー装置、および、物品製造方法
JP6066610B2 (ja) 2012-07-31 2017-01-25 キヤノン株式会社 露光方法、露光装置及びデバイス製造方法
JP6071628B2 (ja) * 2013-02-22 2017-02-01 キヤノン株式会社 露光装置、露光方法及びデバイスの製造方法
JP5734344B2 (ja) 2013-05-16 2015-06-17 キヤノン株式会社 露光装置および物品の製造方法
JP5986538B2 (ja) 2013-06-10 2016-09-06 キヤノン株式会社 露光装置および物品の製造方法
JP6267530B2 (ja) * 2014-02-04 2018-01-24 キヤノン株式会社 露光装置、および物品の製造方法
JP6463935B2 (ja) * 2014-09-30 2019-02-06 キヤノン株式会社 露光装置、露光方法、およびデバイス製造方法
HK1246871A1 (en) 2015-02-23 2018-09-14 Nikon Corporation Measurement device, lithography system and exposure device, and management method, superposition measurement method and device manufacturing method
TWI840811B (zh) 2015-02-23 2024-05-01 日商尼康股份有限公司 基板處理系統及基板處理方法、以及元件製造方法
KR102688211B1 (ko) * 2015-02-23 2024-07-24 가부시키가이샤 니콘 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고 디바이스 제조 방법
NL2017810A (en) 2015-12-15 2017-06-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN107544213B (zh) * 2016-06-29 2019-10-25 上海微电子装备（集团）股份有限公司 光刻机动态调平调焦方法
JP6806509B2 (ja) * 2016-09-15 2021-01-06 キヤノン株式会社 露光装置及び物品の製造方法
CN108022847B (zh) * 2016-10-31 2020-12-18 中芯国际集成电路制造(上海)有限公司 用于检测基板上的标记的装置、设备和方法
JP6882091B2 (ja) * 2017-06-21 2021-06-02 キヤノン株式会社 露光装置及び物品の製造方法
JP6952590B2 (ja) * 2017-11-30 2021-10-20 キヤノン株式会社 露光装置、露光方法、および物品の製造方法
JP6688330B2 (ja) * 2018-02-28 2020-04-28 キヤノン株式会社 露光方法、露光装置、決定方法および物品製造方法
JP2020109531A (ja) * 2020-04-02 2020-07-16 キヤノン株式会社 露光装置、露光方法、および物品製造方法
EP3923078A1 (en) * 2020-06-10 2021-12-15 ASML Netherlands B.V. Heigth measurement method and height measurement system
JP2024157368A (ja) * 2023-04-25 2024-11-07 キヤノン株式会社 露光装置、露光方法、および物品製造方法
WO2025075018A1 (ja) * 2023-10-03 2025-04-10 キヤノン株式会社 決定方法、パターン転写方法、物品製造方法、プログラム、情報処理装置およびリソグラフィーシステム

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JPH06283403A (ja) * 1993-03-26 1994-10-07 Nikon Corp 面位置設定装置
JP3754743B2 (ja) * 1996-03-01 2006-03-15 キヤノン株式会社 表面位置設定方法、ウエハ高さ設定方法、面位置設定方法、ウエハ面位置検出方法および露光装置
JP3815759B2 (ja) * 1997-09-22 2006-08-30 キヤノン株式会社 検出方法、露光装置およびデバイス製造方法

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JP3376179B2 (ja) 1995-08-03 2003-02-10 キヤノン株式会社 面位置検出方法
JP3376219B2 (ja) 1996-08-22 2003-02-10 キヤノン株式会社 面位置検出装置および方法
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JPH1097987A (ja) * 1996-09-25 1998-04-14 Canon Inc 走査型露光装置および方法
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JP4072981B2 (ja) * 1998-10-09 2008-04-09 キヤノン株式会社 露光装置およびデバイス製造方法
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JPH06283403A (ja) * 1993-03-26 1994-10-07 Nikon Corp 面位置設定装置
JP3754743B2 (ja) * 1996-03-01 2006-03-15 キヤノン株式会社 表面位置設定方法、ウエハ高さ設定方法、面位置設定方法、ウエハ面位置検出方法および露光装置
JP3815759B2 (ja) * 1997-09-22 2006-08-30 キヤノン株式会社 検出方法、露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
KR20110123665A (ko) 2011-11-15
US20110273686A1 (en) 2011-11-10
JP2011238707A (ja) 2011-11-24
US9001306B2 (en) 2015-04-07
JP5498243B2 (ja) 2014-05-21
US8625072B2 (en) 2014-01-07
US20140092374A1 (en) 2014-04-03

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