KR101357745B1 - 임프린트 장치, 임프린트 방법 및 물품의 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법 및 물품의 제조 방법 Download PDF

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Publication number
KR101357745B1
KR101357745B1 KR1020100115521A KR20100115521A KR101357745B1 KR 101357745 B1 KR101357745 B1 KR 101357745B1 KR 1020100115521 A KR1020100115521 A KR 1020100115521A KR 20100115521 A KR20100115521 A KR 20100115521A KR 101357745 B1 KR101357745 B1 KR 101357745B1
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KR
South Korea
Prior art keywords
imprint
resin
array
substrate
ejection openings
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Expired - Fee Related
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KR1020100115521A
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English (en)
Korean (ko)
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KR20110073249A (ko
Inventor
히데끼 이나
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J25/00—Actions or mechanisms not otherwise provided for
    • B41J25/001—Mechanisms for bodily moving print heads or carriages parallel to the paper surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1020100115521A 2009-12-21 2010-11-19 임프린트 장치, 임프린트 방법 및 물품의 제조 방법 Expired - Fee Related KR101357745B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2009-288817 2009-12-21
JP2009288817A JP5495767B2 (ja) 2009-12-21 2009-12-21 インプリント装置及び方法、並びに物品の製造方法

Publications (2)

Publication Number Publication Date
KR20110073249A KR20110073249A (ko) 2011-06-29
KR101357745B1 true KR101357745B1 (ko) 2014-02-03

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ID=44151497

Family Applications (1)

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KR1020100115521A Expired - Fee Related KR101357745B1 (ko) 2009-12-21 2010-11-19 임프린트 장치, 임프린트 방법 및 물품의 제조 방법

Country Status (4)

Country Link
US (1) US9760000B2 (enExample)
JP (1) JP5495767B2 (enExample)
KR (1) KR101357745B1 (enExample)
TW (2) TW201406528A (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5828626B2 (ja) * 2010-10-04 2015-12-09 キヤノン株式会社 インプリント方法
JP5753755B2 (ja) * 2011-09-30 2015-07-22 富士フイルム株式会社 液滴吐出装置および液滴吐出方法
JP5910056B2 (ja) * 2011-12-13 2016-04-27 富士ゼロックス株式会社 レンズ製造装置
JP6029495B2 (ja) 2012-03-12 2016-11-24 キヤノン株式会社 インプリント方法およびインプリント装置、それを用いた物品の製造方法
JP6415120B2 (ja) * 2014-06-09 2018-10-31 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6320183B2 (ja) * 2014-06-10 2018-05-09 キヤノン株式会社 インプリント装置、インプリント方法、および物品製造方法
JP6322158B2 (ja) * 2014-07-02 2018-05-09 キヤノン株式会社 インプリント方法及び装置、物品の製造方法、及びプログラム
CN105842982B (zh) 2015-02-03 2019-11-08 佳能株式会社 压印装置以及物品的制造方法
JP6661334B2 (ja) * 2015-02-03 2020-03-11 キヤノン株式会社 装置、および物品の製造方法
JP6742177B2 (ja) * 2016-07-15 2020-08-19 キヤノン株式会社 インプリント装置、および物品製造方法
SG10201709153VA (en) * 2016-12-12 2018-07-30 Canon Kk Fluid droplet methodology and apparatus for imprint lithography
JP6898785B2 (ja) * 2017-06-16 2021-07-07 キヤノン株式会社 インプリント装置および物品製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008135602A (ja) 2006-11-29 2008-06-12 Seiko Epson Corp パターン形成方法及びパターン形成装置
JP2008256972A (ja) * 2007-04-05 2008-10-23 Toppan Printing Co Ltd 光学素子の製造方法、カラーフィルタの製造方法及び有機エレクトロルミネッセンス素子の製造方法
KR20080101965A (ko) * 2007-05-17 2008-11-24 세크론 주식회사 접착 수지의 도포 장치 및 이를 포함하는 다이 본딩 장치
KR20090109116A (ko) * 2007-02-06 2009-10-19 캐논 가부시끼가이샤 임프린트 방법 및 임프린트 장치

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3932964B2 (ja) * 2002-04-19 2007-06-20 セイコーエプソン株式会社 デバイスの製造方法及びデバイスの製造装置
JP2004255335A (ja) * 2003-02-27 2004-09-16 Seiko Epson Corp 液状物の吐出方法、液状物の吐出装置、カラーフィルタの製造方法およびカラーフィルタ、液晶表示装置、エレクトロルミネッセンス装置の製造方法およびエレクトロルミネッセンス装置、プラズマディスプレイパネルの製造方法およびプラズマディスプレイ、並びに電子機器
JP4155511B2 (ja) 2003-05-09 2008-09-24 Ｔｄｋ株式会社 インプリント装置およびインプリント方法
EP1685961A4 (en) * 2003-11-05 2010-04-07 Sony Corp LIQUID EXTRACTOR AND LIQUID EXHAUST PROCESS
JP2005186598A (ja) * 2003-12-26 2005-07-14 Konica Minolta Holdings Inc 画像記録装置
US20050276919A1 (en) 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method for dispensing a fluid on a substrate
JP4631357B2 (ja) * 2004-08-27 2011-02-16 セイコーエプソン株式会社 液滴吐出装置の描画制御方法、液滴吐出装置および電気光学装置の製造方法
US8011915B2 (en) * 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US8001924B2 (en) * 2006-03-31 2011-08-23 Asml Netherlands B.V. Imprint lithography
JP4185941B2 (ja) 2006-04-04 2008-11-26 キヤノン株式会社 ナノインプリント方法及びナノインプリント装置
JP5328080B2 (ja) * 2006-05-16 2013-10-30 芝浦メカトロニクス株式会社 溶液の供給装置
JP2007313439A (ja) * 2006-05-26 2007-12-06 Hitachi High-Technologies Corp 樹脂塗布装置及び樹脂塗布方法
US8707890B2 (en) * 2006-07-18 2014-04-29 Asml Netherlands B.V. Imprint lithography
JP2009056719A (ja) 2007-08-31 2009-03-19 Seiko Epson Corp 液体吐出装置およびその制御方法並びにプログラム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008135602A (ja) 2006-11-29 2008-06-12 Seiko Epson Corp パターン形成方法及びパターン形成装置
KR20090109116A (ko) * 2007-02-06 2009-10-19 캐논 가부시끼가이샤 임프린트 방법 및 임프린트 장치
JP2008256972A (ja) * 2007-04-05 2008-10-23 Toppan Printing Co Ltd 光学素子の製造方法、カラーフィルタの製造方法及び有機エレクトロルミネッセンス素子の製造方法
KR20080101965A (ko) * 2007-05-17 2008-11-24 세크론 주식회사 접착 수지의 도포 장치 및 이를 포함하는 다이 본딩 장치

Also Published As

Publication number Publication date
TWI532586B (zh) 2016-05-11
US9760000B2 (en) 2017-09-12
US20110151124A1 (en) 2011-06-23
JP2011129802A (ja) 2011-06-30
TW201121768A (en) 2011-07-01
TW201406528A (zh) 2014-02-16
KR20110073249A (ko) 2011-06-29
JP5495767B2 (ja) 2014-05-21

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