KR101267670B1 - 웨이퍼 척용 온도 센서 - Google Patents
웨이퍼 척용 온도 센서 Download PDFInfo
- Publication number
- KR101267670B1 KR101267670B1 KR1020100053856A KR20100053856A KR101267670B1 KR 101267670 B1 KR101267670 B1 KR 101267670B1 KR 1020100053856 A KR1020100053856 A KR 1020100053856A KR 20100053856 A KR20100053856 A KR 20100053856A KR 101267670 B1 KR101267670 B1 KR 101267670B1
- Authority
- KR
- South Korea
- Prior art keywords
- temperature sensor
- wafer chuck
- fixing block
- wafer
- chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000003780 insertion Methods 0.000 claims abstract description 23
- 230000037431 insertion Effects 0.000 claims abstract description 23
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 10
- 239000011810 insulating material Substances 0.000 claims description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 238000012545 processing Methods 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 80
- 238000007689 inspection Methods 0.000 description 15
- 239000000523 sample Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 5
- 238000009529 body temperature measurement Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/14—Supports; Fastening devices; Arrangements for mounting thermometers in particular locations
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/16—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements
- G01K7/18—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements the element being a linear resistance, e.g. platinum resistance thermometer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measuring Temperature Or Quantity Of Heat (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2009-147061 | 2009-06-19 | ||
| JP2009147061A JP5197505B2 (ja) | 2009-06-19 | 2009-06-19 | ウエハチャック用の温度センサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20100136915A KR20100136915A (ko) | 2010-12-29 |
| KR101267670B1 true KR101267670B1 (ko) | 2013-05-24 |
Family
ID=43510815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020100053856A Active KR101267670B1 (ko) | 2009-06-19 | 2010-06-08 | 웨이퍼 척용 온도 센서 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5197505B2 (enExample) |
| KR (1) | KR101267670B1 (enExample) |
| TW (1) | TWI471538B (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103277651B (zh) * | 2013-06-13 | 2016-04-06 | 新乡学院 | 一种用于高温热探测的陶瓷基座 |
| JP2016161356A (ja) * | 2015-02-27 | 2016-09-05 | セイコーエプソン株式会社 | 電子部品搬送装置および電子部品検査装置 |
| CN108780753B (zh) * | 2016-03-28 | 2023-04-25 | 株式会社国际电气 | 基板处理装置、温度测定单元及半导体器件的制造方法 |
| CN110739657B (zh) * | 2018-07-20 | 2021-09-21 | 施耐德电器工业公司 | 用于环网柜的电缆头及环网柜 |
| TWI797484B (zh) * | 2020-10-06 | 2023-04-01 | 致茂電子股份有限公司 | 晶圓吸盤檢測系統 |
| JP7474678B2 (ja) | 2020-10-28 | 2024-04-25 | 東京エレクトロン株式会社 | 載置台、検査装置及び検査方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009042070A (ja) | 2007-08-09 | 2009-02-26 | Sei Hybrid Kk | 半導体製造装置用測温装置及びそれを搭載した半導体製造装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6090638U (ja) * | 1983-11-26 | 1985-06-21 | 株式会社三共合金鋳造所 | 温度測定治具 |
| JPS6124628U (ja) * | 1984-07-11 | 1986-02-14 | 三菱重工業株式会社 | 熱電対取付治具 |
| US5220171A (en) * | 1990-11-01 | 1993-06-15 | Canon Kabushiki Kaisha | Wafer holding device in an exposure apparatus |
| JPH0945752A (ja) * | 1995-07-27 | 1997-02-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| JP3814359B2 (ja) * | 1996-03-12 | 2006-08-30 | キヤノン株式会社 | X線投影露光装置及びデバイス製造方法 |
| JP2000286207A (ja) * | 1999-03-30 | 2000-10-13 | Tokyo Electron Ltd | 熱処理装置及び熱処理方法 |
| JP4659328B2 (ja) * | 2002-10-21 | 2011-03-30 | 東京エレクトロン株式会社 | 被検査体を温度制御するプローブ装置 |
| JP4307130B2 (ja) * | 2003-04-08 | 2009-08-05 | キヤノン株式会社 | 露光装置 |
| EP1800067A1 (en) * | 2004-10-14 | 2007-06-27 | Celerity, Inc. | Method and system for wafer temperature control |
-
2009
- 2009-06-19 JP JP2009147061A patent/JP5197505B2/ja active Active
-
2010
- 2010-06-08 KR KR1020100053856A patent/KR101267670B1/ko active Active
- 2010-06-18 TW TW99119932A patent/TWI471538B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009042070A (ja) | 2007-08-09 | 2009-02-26 | Sei Hybrid Kk | 半導体製造装置用測温装置及びそれを搭載した半導体製造装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201129787A (en) | 2011-09-01 |
| JP2011002390A (ja) | 2011-01-06 |
| TWI471538B (zh) | 2015-02-01 |
| KR20100136915A (ko) | 2010-12-29 |
| JP5197505B2 (ja) | 2013-05-15 |
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| E701 | Decision to grant or registration of patent right | ||
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| GRNT | Written decision to grant | ||
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