KR101243354B1 - Roll to roll type alignment stage apparatus - Google Patents

Roll to roll type alignment stage apparatus Download PDF

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Publication number
KR101243354B1
KR101243354B1 KR1020120139653A KR20120139653A KR101243354B1 KR 101243354 B1 KR101243354 B1 KR 101243354B1 KR 1020120139653 A KR1020120139653 A KR 1020120139653A KR 20120139653 A KR20120139653 A KR 20120139653A KR 101243354 B1 KR101243354 B1 KR 101243354B1
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KR
South Korea
Prior art keywords
stage
roll
vacuum chuck
alignment
film
Prior art date
Application number
KR1020120139653A
Other languages
Korean (ko)
Inventor
신용화
김근정
Original Assignee
주식회사 쓰리디플러스
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Priority to KR1020120139653A priority Critical patent/KR101243354B1/en
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Publication of KR101243354B1 publication Critical patent/KR101243354B1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

In an alignment stage device in which a film is supplied in a roll-to-roll manner, the vacuum chuck on which the film is placed is fixed, and the position correction is performed by moving the stage mounted on the upper part spaced apart from the vacuum chuck, thereby preventing damage to the film. Disclosed is a roll-to-roll type alignment stage device that can be prevented from being applied.
The roll-to-roll alignment stage apparatus according to the present invention is a roll-to-roll alignment stage apparatus in which a film wound on a first roller is exposed on a vacuum chuck and then wound on a second roller. A stage on which a mask is mounted; A vacuum chuck mounted on the lower part spaced apart from the stage, for vacuum sucking the film transferred to a position corresponding to the stage; A position correction motor attached to an upper surface of the stage to correct a position of the stage; A charge-coupled device camera mounted on top of the stage and configured to measure alignment between the stage and the vacuum chuck; And a light sensor for measuring a gap which is mounted on an upper portion of the stage to measure a gap between the stage and the vacuum chuck.

Description

Roll to roll type alignment stage device {ROLL TO ROLL TYPE ALIGNMENT STAGE APPARATUS}

The present invention relates to an alignment stage apparatus, and more particularly, to an alignment stage apparatus of a roll to roll type.

In general, a semiconductor wafer exposure apparatus includes a vacuum chuck for seating a wafer to be subjected to an exposure process, a stage for recognizing a pattern on a wafer by a light source provided at a predetermined distance above the vacuum chuck and emitting from an illumination system, and the vacuum It comprises a pre-aligned stage that maintains the alignment of the wafer in advance before the wafer is seated on the chuck. At this time, the wafer for exposure in the pre-alignment stage is subjected to pre-alignment based on the flat zone, and then transferred to a vacuum chuck to perform fine alignment to perform the exposure process while adjusting the focus with the stage.

Therefore, in the manufacture of devices such as semiconductor devices and liquid crystal display devices, an exposure apparatus is used to project and expose a fine pattern of images formed on a photo stage or a reticle onto a substrate such as a semiconductor wafer or glass plate coated with a photoresist such as photoresist. Is repeated. When performing projection exposure, it is necessary to precisely align the position of the substrate with the position of the pattern image formed on the projected reticle. In order to perform this alignment, the exposure apparatus is provided with the alignment apparatus. The alignment apparatus includes an alignment sensor for detecting the position of the alignment mark formed on the substrate, and a control system for aligning the substrate based on the position of the alignment mark detected by the alignment sensor.

Since the surface state (roughness) of the substrate to be measured changes during the manufacturing process of a semiconductor element or a liquid crystal display element, it is difficult to accurately detect the position of the substrate by a single alignment sensor. Another sensor is used. The main examples of the alignment sensor include a laser step alignment (LSA) method, a field image alignment (FIA) method, and a laser interferometric alignment (LIA) method.

Prior arts related to the present invention include Korean Patent Laid-Open Publication No. 10-2012-0108091 (2012.10.05.), Which discloses an inline type substrate coater device and a method thereof.

SUMMARY OF THE INVENTION An object of the present invention is an alignment stage apparatus in which a film is supplied in a roll-to-roll manner, in which a vacuum chuck on which a film is mounted is fixed, and a position correction is performed by moving a stage mounted on an upper portion spaced from the vacuum chuck. By providing a roll-to-roll type alignment stage apparatus which can prevent damage to a film in advance.

The alignment stage apparatus according to the embodiment of the present invention for achieving the above object is a roll to roll type of the film wound on the first roller is wound on the second roller after the exposure is performed in a vacuum chuck An alignment stage apparatus, comprising: a stage on which a mask is mounted; A vacuum chuck mounted on the lower part spaced apart from the stage, for vacuum sucking the film transferred to a position corresponding to the stage; A position correction motor attached to an upper surface of the stage to correct a position of the stage; A charge-coupled device camera mounted on top of the stage and configured to measure alignment between the stage and the vacuum chuck; And a light sensor for measuring a gap which is mounted on an upper portion of the stage to measure a gap between the stage and the vacuum chuck.

Alignment stage device according to the present invention can be seen by the roll-to-roll process to reduce the air transport and manufacturing costs as the film automatically moves.

In addition, the alignment stage device according to the present invention is fixed to the vacuum chuck on which the film is seated in a roll to roll (Roll to Roll) method, and damage to the film by moving the stage mounted on the upper part spaced apart from the vacuum chuck to correct the position It can be prevented from being applied.

In addition, the alignment stage apparatus according to the present invention can perform precise exposure through performing a gap measurement through the optical sensor for positioning and gap measurement between the stage and the vacuum chuck through the CCD camera during the exposure process of the film.

1 is a perspective view showing a roll-to-roll type alignment stage device according to an embodiment of the present invention.
FIG. 2 is a plan view schematically illustrating the stage of FIG. 1.
3 is a diagram for explaining a search procedure of position registration.

Advantages and features of the present invention, and methods of achieving the same will become apparent with reference to the embodiments described below in detail in conjunction with the accompanying drawings. It should be understood, however, that the invention is not limited to the disclosed embodiments, but is capable of many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, To fully disclose the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims. Like reference numerals refer to like elements throughout the specification.

Hereinafter, a roll-to-roll type alignment stage device according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

1 is a perspective view showing a roll-to-roll type alignment stage device according to an embodiment of the present invention, Figure 2 is a plan view schematically showing the stage of FIG.

1 and 2, the roll to roll type alignment stage device 100 according to an exemplary embodiment of the present invention is a stage 110, an optical sensor 120 for measuring gaps, a position correction motor 130, The CCD camera 140, the vacuum chuck 150, and the controller 160 are included.

The mask 30 is mounted on the bottom surface of the stage 110. At this time, when the light from the light source (not shown) mounted on the spaced apart from the stage 110 is irradiated in the direction of the stage 110, the pattern formed on the mask 30 mounted on the lower surface of the stage 110 is a film It is projected as it is on (1).

The stage 110 includes a first correction hole 115 and a second correction hole 125. In this case, the first correction holes 115 are formed to penetrate the stage 110, respectively, and are formed at four corners of the stage 110 corresponding to the CCD camera 140, which will be described later. It is formed to penetrate the stage 110, it may be formed on each of the central edges on both sides of the stage 110 corresponding to the gap sensor optical sensor 120 to be described later, but is not necessarily limited thereto. That is, the positions of the first and second correction holes 115 and 125 may be mounted at various positions according to the design purpose.

In particular, it is preferable that at least two or more second correction holes 125 are formed in the stage 110, which is mutually simplified between the stage 110 and the vacuum chuck 160 using the optical sensor 120 for gap measurement. This is to provide space for measuring at least both edges in order to check the horizontality between each other without tilting.

The optical sensor 120 for measuring a gap is mounted on an upper portion of the stage 110 to measure a gap between the stage 110 and the vacuum chuck 150. The gap sensor optical sensor 120 may be formed at a position corresponding to the second correction hole 125.

The gap sensor optical sensor 120 irradiates light to the vacuum chuck 150 through the second correction hole 125, and then the irradiated light is reflected from the upper surface of the vacuum chuck 160 to detect the gap sensor 120. The gap between the stage and the vacuum chuck is calculated by measuring the time to return to. Accordingly, after measuring the distance between the stage 110 and the vacuum chuck 160, the stage 110 is moved through the position correction motor 130 to maintain the horizontal alignment.

The position correction motor 130 is attached to the upper surface of the stage 110, and serves to correct the position of the stage 110. It is preferable to mount at least three or more such position correction motors 130 on the upper surface of the stage 110. When one or two position correction motors 130 are mounted on the stage 110, This is because constraints may occur in freely moving the stage 110 in all directions.

At this time, the position correction motor 130 moves the stage 110 in the XYZ direction according to the drive signal of the controller 160 to be described later to assist the alignment of the position between the stage 110 and the vacuum chuck 150. Accordingly, the stage 110 may be precisely aligned with the vacuum chuck 160 by the position correction motor 130.

The CCD camera 140 is mounted on the top of the stage 110, and serves to measure the alignment between the stage 110 and the vacuum chuck 150.

The CCD camera 140 may be formed at a position corresponding to the first correction hole 115. In addition, the CCD camera 140 detects the alignment mark 155 through the first correction hole 115 and transmits the data to the controller 160. Accordingly, the position correction motor 130 receiving the driving signal from the controller 160 performs precise position alignment between the stage 110 and the vacuum chuck 150.

The vacuum chuck 150 is mounted on the lower part spaced apart from the stage 110, and serves to vacuum suck the film 1 transferred to a position corresponding to the stage 110. In addition, the vacuum chuck 150 includes alignment marks 155 formed at four corners corresponding to the CCD camera 140 and the first correction hole 115, respectively.

The controller 160 controls driving of the optical sensor 120 for measuring gaps, the position correction motor 130, and the CCD camera 140. The controller 160 may be mounted on one side spaced apart from the stage 110.

In the roll-to-roll type alignment stage device 100 according to the embodiment of the present invention described above, the film 1 wound on the first roller 10 is exposed through the vacuum chuck 150 and then exposed to the second roller. Go to 20 and wind up.

More specifically, the film 1 wound on the first roller 10 is taken out of the first roller 10 and moves along the traveling direction shown in FIG. 1. When the exposure area of the film 1 is located above the vacuum chuck 150, the film 1 may be stopped and the film 1 may be fixed to the vacuum chuck 150 by vacuum suction or the like.

Thereafter, the CCD camera 140 detects the position of the alignment mark 155 formed on the upper surface of the vacuum chuck 150 through the first correction hole 115. These position data are transmitted to the control unit 160, the control unit 150 moves the stage 110 so that the alignment mark 155 is located in the center of the first correction hole 115, the stage 110 and the vacuum Positioning between the chucks 150 is performed.

At this time, the optical sensor for gap measurement 120 is irradiated with light to the vacuum chuck 150 through the second correction hole 125 to measure the time when the light emitted from the upper surface of the vacuum chuck 150 is reflected The distance between the stage 110 and the vacuum chuck 150 may be measured.

When the alignment between the stage 110 and the vacuum chuck 150 is performed, light is irradiated toward the stage 110 from a light source (not shown) mounted on the spaced apart from the stage 110 and directed to the stage 110. By passing through the mounted mask 30, the exposure process is performed in such a manner that light is projected onto the film 1 in the same form as the pattern provided in the mask 30.

When the exposure process is completed, the vacuum suction of the vacuum chuck 150 is released and the film 1 is moved in the advancing direction until the next exposure area of the film 1 is located on the upper surface of the vacuum chuck 150. At this time, the film 1 in which exposure was completed is wound up by the 2nd roller 20.

3 is a diagram for explaining a search procedure of position registration.

Referring to FIG. 3, the alignment stage apparatus 100 according to the present invention rotates the stage 110 to search until the alignment mark 155 is positioned at the center of the first correction hole 115.

The stage 110 rotates and moves to perform an exposure process when the alignment mark 155 is finally detected at the center of the first correction hole 115.

On the other hand, when the alignment mark 155 is not detected through the first correction hole 115, the processing of the apparatus may be stopped due to abnormality of the detection of the alignment mark 155.

Alignment stage apparatus according to the present invention described above can be seen by the roll-to-roll process to reduce the air transport and manufacturing costs as the film automatically moves.

In addition, the alignment stage device according to the present invention is fixed to the vacuum chuck on which the film is seated in a roll to roll (Roll to Roll) method, and damage to the film by moving the stage mounted on the upper part spaced apart from the vacuum chuck to correct the position It can be prevented from being applied.

In addition, the alignment stage apparatus according to the present invention can perform precise exposure through performing a gap measurement through the optical sensor for positioning and gap measurement between the stage and the vacuum chuck through the CCD camera during the exposure process of the film.

Although the preferred embodiments of the present invention have been disclosed for illustrative purposes, those skilled in the art will appreciate that various modifications, additions and substitutions are possible, without departing from the scope and spirit of the invention as disclosed in the accompanying claims. These changes and modifications may be made without departing from the scope of the present invention. Accordingly, the scope of the present invention should be determined by the following claims.

100: alignment stage device 110: stage
115: first correction hole 120: optical sensor for gap measurement
125: second correction hole 130: position correction motor
140: CCD camera 150: vacuum chuck
155: alignment mark 160: control unit
1 film 10 first roller
20: second roller 30: mask

Claims (10)

In a roll to roll type alignment stage apparatus in which a film wound on a first roller is exposed on a vacuum chuck and then wound on a second roller,
A stage on which a mask is mounted;
A vacuum chuck mounted on the lower part spaced apart from the stage, for vacuum sucking the film transferred to a position corresponding to the stage;
A position correction motor attached to an upper surface of the stage to correct a position of the stage;
A charge-coupled device camera mounted on top of the stage and configured to measure alignment between the stage and the vacuum chuck; And
Roll to roll type alignment stage device, characterized in that it comprises a; mounted on top of the stage, the optical sensor for measuring the gap (Gap) for measuring the gap between the stage and the vacuum chuck.
The method of claim 1,
The stage device
And a control unit for controlling the driving of the position correction motor, the CCD camera, and the optical sensor for gap measurement.
The method of claim 1,
The film
Roll-to-roll type alignment stage device, characterized in that the vacuum suction is fixed on the upper surface of the vacuum chuck.
The method of claim 1,
The position correction motor
At least three or more are formed, roll-to-roll type alignment stage device, characterized in that for moving the stage in the XYZ direction.
The method of claim 1,
The stage is
And a first correction hole formed to penetrate the stage and disposed at a position corresponding to the CCD camera.
The method of claim 5,
The vacuum chuck
And an alignment mark formed at a position corresponding to the CCD camera and the first correction hole.
The method according to claim 6,
The CCD camera
The alignment stage device of the roll-to-roll type, wherein the alignment mark is detected through the first correction hole.
The method of claim 1,
The stage is
And a second correction hole formed to pass through the stage and disposed at a position corresponding to the optical sensor for gap measurement.
The method of claim 1,
The stage is
A roll-to-roll type alignment stage device, which is rotated by the position correction motor to perform position registration and horizontal correction with the vacuum chuck.
The method of claim 1,
The optical sensor for measuring gap
And a distance between the stage and the vacuum chuck by measuring a speed at which the light emitted toward the vacuum chuck is reflected from the upper surface of the vacuum chuck to measure the distance.
KR1020120139653A 2012-12-04 2012-12-04 Roll to roll type alignment stage apparatus KR101243354B1 (en)

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KR1020120139653A KR101243354B1 (en) 2012-12-04 2012-12-04 Roll to roll type alignment stage apparatus

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Application Number Priority Date Filing Date Title
KR1020120139653A KR101243354B1 (en) 2012-12-04 2012-12-04 Roll to roll type alignment stage apparatus

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101548909B1 (en) 2014-04-24 2015-09-02 주식회사 에스아이 플렉스 Formation of double-sided circuit exposure method using commodity edge matching
KR101654860B1 (en) * 2015-04-01 2016-09-07 주식회사 필옵틱스 Exposure device
US9835951B2 (en) 2015-01-15 2017-12-05 Samsung Display Co., Ltd. Roll to roll light exposure system
CN109532187A (en) * 2019-01-09 2019-03-29 深圳市赢合技术有限公司 A kind of abutted equipment and its applying method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120038446A (en) * 2009-07-17 2012-04-23 가부시키가이샤 니콘 Pattern formation apparatus, pattern formation method, and device manufacturing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120038446A (en) * 2009-07-17 2012-04-23 가부시키가이샤 니콘 Pattern formation apparatus, pattern formation method, and device manufacturing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101548909B1 (en) 2014-04-24 2015-09-02 주식회사 에스아이 플렉스 Formation of double-sided circuit exposure method using commodity edge matching
US9835951B2 (en) 2015-01-15 2017-12-05 Samsung Display Co., Ltd. Roll to roll light exposure system
KR101654860B1 (en) * 2015-04-01 2016-09-07 주식회사 필옵틱스 Exposure device
CN109532187A (en) * 2019-01-09 2019-03-29 深圳市赢合技术有限公司 A kind of abutted equipment and its applying method
CN109532187B (en) * 2019-01-09 2023-12-19 惠州市赢合智能技术有限公司 Laminating equipment and laminating method thereof

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