KR101654860B1 - Exposure device - Google Patents
Exposure device Download PDFInfo
- Publication number
- KR101654860B1 KR101654860B1 KR1020150046350A KR20150046350A KR101654860B1 KR 101654860 B1 KR101654860 B1 KR 101654860B1 KR 1020150046350 A KR1020150046350 A KR 1020150046350A KR 20150046350 A KR20150046350 A KR 20150046350A KR 101654860 B1 KR101654860 B1 KR 101654860B1
- Authority
- KR
- South Korea
- Prior art keywords
- exposure
- exposure area
- unwinder
- area
- exposure device
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
Abstract
The present invention relates to an exposure apparatus, and an exposure apparatus according to an embodiment of the present invention is characterized in that the exposure apparatus according to an embodiment of the present invention stores a flexible object for exposure, A first exposure device for transferring the exposure light to the exposure area; A second exposure device for storing a second object having flexibility for exposure and for transferring the second object to an exposure area; And a lamp unit located on one side of the first and second exposure apparatuses for irradiating light for exposing an object in each of the exposure regions of the first and second exposure apparatuses. According to the present invention, it is possible to expose two or more objects during a single process using a plurality of exposure apparatuses in an exposure apparatus, thereby shortening the processing time for exposure.
Description
The present invention relates to an exposure apparatus, and more particularly to an exposure apparatus for exposing an object such as a flexible film.
Recently, integration density of semiconductor integrated circuits is developing in the field of electronic industry. As a result, surface mount technology that directly mounts small chip components has developed, and electronic devices have become smaller, requiring printed circuit boards that can be embedded in complex and narrow spaces. One of them is a flexible printed circuit board, and flexible printed circuit boards are continuously used in electronic equipment such as portable terminals, LCD cameras, printer heads, and the like.
When the flexible printed circuit board is manufactured, a dry film is laminated on a copper clad laminate having a copper foil layer formed on one side or both sides of an insulating film such as a polyimide resin, and sequentially patterned using a circuit pattern . The present invention relates to an exposure apparatus used in an exposure process in the process of forming a circuit pattern as described above. The conventional exposure apparatus is an exposure apparatus in which a film is transferred from one side to the other as in Korean Patent Registration No. 10-0146610 (circuit pattern continuous exposure apparatus of flexible printed wiring board, Accordingly, there is a problem that the volume of the exposure apparatus is increased and the installation space is accordingly occupied.
An object of the present invention is to provide an exposure apparatus which can be installed in a small space by reducing the volume of the exposure apparatus.
An exposure apparatus according to an embodiment of the present invention includes: a first exposure device that stores a flexible object for exposure and transfers the object to an exposure area; A second exposure device for storing a second object having flexibility for exposure and for transferring the second object to an exposure area; And a lamp unit located on one side of the first and second exposure apparatuses for irradiating light for exposing an object in each of the exposure regions of the first and second exposure apparatuses.
Here, the first exposure device may include a first un-winder wound around the first object; A first carrier for transferring the first object from the first unwinder to an exposure area; A first optical unit that receives light emitted from the lamp unit and irradiates the light to an exposure area; And a rewinder for rewinding and storing the first object exposed in the exposure area, wherein the first unwinder and the first rewinder can be disposed on one side of the optical unit , The first unwinder may be disposed on top of the first rewinder.
The first optical unit may be disposed between the first unwinder and the exposure region, and may be a mirror receiving light emitted from the lamp unit and reflecting the light to the exposure region.
A first controller for controlling the first unwinder so that the tension of the first object to be transferred from the first unwinder to the exposure area is maintained, and a second controller for controlling the first unwinder to be transferred from the exposure area to the first rewinder, And a second controller for controlling the first rewinder so as to maintain the tension of the first object in the exposure area, and may further comprise an alignment unit for aligning the first object in the exposure area.
The second exposure device may further include: a second unwinder to which the second object is wound and stored; A second carrier for transferring the second object from the second unwinder to an exposure area; A second optical unit that receives light emitted from the lamp unit and irradiates the light to an exposure area; And a second rewinder for retracting and storing the second object exposed in the exposure area, wherein the light emitted from the lamp unit selectively transmits light to one of the first and second optical units And an inversion mirror for controlling the irradiation.
At this time, the first exposure device and the second exposure device may be arranged in the directions opposite to each other, or may be arranged in the same direction.
The first and second exposure devices may expose the first and second objects at a time when they are staggered from each other.
In addition, the first and second exposers may transport the first and second objects in a roll-to-roll manner.
According to the present invention, it is possible to expose two or more objects during a single process using a plurality of exposure apparatuses in an exposure apparatus, thereby shortening the processing time for exposure. Furthermore, since the size of the exposure device can be reduced by positioning the unwinder and the rewinder of the exposure device at the same position, the exposure process can be performed more quickly by operating a plurality of exposure devices using one lamp.
1 is a schematic view showing an exposure apparatus according to an embodiment of the present invention.
2 is a schematic view showing a first exposure device of an exposure apparatus according to an embodiment of the present invention.
3 is a schematic view showing an arrangement of an exposure apparatus according to an embodiment of the present invention.
4 is a schematic view showing the arrangement of an exposure apparatus according to another embodiment of the present invention.
Preferred embodiments of the present invention will be described more specifically with reference to the accompanying drawings.
FIG. 1 is a schematic view showing an exposure apparatus according to an embodiment of the present invention, FIG. 2 is a schematic view showing a first exposure device of an exposure apparatus according to an embodiment of the present invention, and FIG. 3 is a cross- FIG. 3 is a schematic view showing the arrangement of an exposure apparatus according to an embodiment;
1 to 3, an
The
The first and
With reference to FIG. 2, only the configuration of the
The
The first controller C1 controls the
The
The first and
As described above, the object F is conveyed by the first and
The
The
At this time, the
The
The
The
The light emitted from the
4 is a schematic view showing the arrangement of an exposure apparatus according to another embodiment of the present invention.
Referring to FIG. 4, an
In the
In another embodiment of the present invention, an optical unit is provided so that light emitted from the
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. It should be understood that the scope of the present invention is to be understood as the scope of the following claims and their equivalents.
100: Exposure device
110: housing 112: first accommodation space
114: second accommodation space 116: partition wall
120a:
121a:
123a:
125a: Aligning
127a: optical unit E: exposure area
130:
C1: first controller C2: second controller
F: object R: roller
Claims (13)
A second exposure device for storing a second object having flexibility for exposure and for transferring the second object to an exposure area; And
And a lamp unit located on one side of the first and second exposure apparatuses for irradiating light for exposing the first or second object in each of the exposure regions of the first and second exposure apparatuses,
The first exposure device includes:
A first un-winder in which the first object is wound and stored;
A first carrier for transferring the first object from the first unwinder to an exposure area;
A first optical unit that receives light emitted from the lamp unit and irradiates the light to an exposure area; And
And a first rewinder for rewinding and storing the first object exposed in the exposure area,
Wherein the second exposure device comprises:
A second unwinder in which the second object is wound and stored;
A second carrier for transferring the second object from the second unwinder to an exposure area;
A second optical unit that receives light emitted from the lamp unit and irradiates the light to an exposure area; And
And a second rewinder for rewinding and storing the second object exposed in the exposure area,
And an inversion mirror for controlling the light emitted from the lamp unit to be selectively irradiated to one of the first and second optical units.
Wherein the first unwinder is disposed on an upper portion of the first rewinder.
Wherein the first optical unit is disposed between the first un-winder and the exposure area.
Wherein the first optical unit is a mirror that receives light emitted from the lamp unit and reflects the light to the exposure area.
Further comprising a first controller for controlling the first unwinder so that the tension of the first object transferred from the first unwinder to the exposure area is maintained.
Further comprising a second controller for controlling the first rewinder so that the tension of the first object transferred to the first rewinder in the exposure area is maintained.
And an alignment unit for aligning the first object in an exposure area.
Wherein the first exposure device and the second exposure device are arranged in directions opposite to each other.
Wherein the first exposure device and the second exposure device are arranged in parallel in the same direction.
Wherein the first and second exposure devices respectively expose the first and second objects at a time when they are staggered from each other.
Wherein the first and second exposers transport the first and second objects in a roll to roll manner.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150046350A KR101654860B1 (en) | 2015-04-01 | 2015-04-01 | Exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150046350A KR101654860B1 (en) | 2015-04-01 | 2015-04-01 | Exposure device |
Publications (1)
Publication Number | Publication Date |
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KR101654860B1 true KR101654860B1 (en) | 2016-09-07 |
Family
ID=56949934
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020150046350A KR101654860B1 (en) | 2015-04-01 | 2015-04-01 | Exposure device |
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KR (1) | KR101654860B1 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0146610B1 (en) | 1995-03-15 | 1998-10-01 | 원우연 | Continuous exposing apparatus for circuit pattern of flexible print wired board |
KR20120012668A (en) * | 2010-08-02 | 2012-02-10 | 한국기계연구원 | In-line exposure system using virtual irradiating pattern and method for in-line printing using the same |
KR20120138247A (en) * | 2010-04-12 | 2012-12-24 | 에이에스엠엘 네델란즈 비.브이. | Substrate handling apparatus and lithographic apparatus |
KR101243354B1 (en) * | 2012-12-04 | 2013-03-13 | 주식회사 쓰리디플러스 | Roll to roll type alignment stage apparatus |
KR101291703B1 (en) * | 2012-12-04 | 2013-07-31 | 주식회사 남영기계 | Flexible printed circuit substrate for the production of roll-to-roll winder device |
-
2015
- 2015-04-01 KR KR1020150046350A patent/KR101654860B1/en active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0146610B1 (en) | 1995-03-15 | 1998-10-01 | 원우연 | Continuous exposing apparatus for circuit pattern of flexible print wired board |
KR20120138247A (en) * | 2010-04-12 | 2012-12-24 | 에이에스엠엘 네델란즈 비.브이. | Substrate handling apparatus and lithographic apparatus |
KR20120012668A (en) * | 2010-08-02 | 2012-02-10 | 한국기계연구원 | In-line exposure system using virtual irradiating pattern and method for in-line printing using the same |
KR101243354B1 (en) * | 2012-12-04 | 2013-03-13 | 주식회사 쓰리디플러스 | Roll to roll type alignment stage apparatus |
KR101291703B1 (en) * | 2012-12-04 | 2013-07-31 | 주식회사 남영기계 | Flexible printed circuit substrate for the production of roll-to-roll winder device |
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