JP6659181B2 - Transport apparatus, lithography apparatus, and article manufacturing method - Google Patents

Description

  The present invention relates to a transport device, a lithographic apparatus, and a method for manufacturing an article.

  2. Description of the Related Art As semiconductor devices become more highly integrated, multilayer circuit patterns are being developed. In a substrate having a multilayered circuit pattern, distortion is accumulated due to the lamination of the circuit patterns, and warpage may occur. Then, a circuit pattern can be further formed on the warped substrate by the lithography apparatus.

  Japanese Patent Application Laid-Open No. H11-163,199 discloses that according to a warp amount of a substrate detected by a sensor, a substrate is prevented from coming into contact with the cassette when the substrate is carried out of the cassette by the arm (transport unit) or when the substrate is carried into the cassette. Discloses a method for controlling the insertion height of an arm into a cassette.

JP 2005-260010 A

  In a lithographic apparatus, even when a warped substrate is transported to a substrate stage, the substrate may come into contact with a member in the lithographic apparatus and be damaged depending on the degree of warpage of the substrate. Therefore, in the lithographic apparatus, it is preferable that the substrate is conveyed to the substrate stage after grasping the warpage (shape) of the substrate so as to avoid contact of the substrate with a member in the lithographic apparatus.

  Therefore, an object of the present invention is to provide an advantageous technique for avoiding breakage of a substrate.

  In order to achieve the above object, a transfer device according to one aspect of the present invention is a transfer device that transfers a substrate to a stage, a holding unit that holds the substrate, and a detection unit that detects a height of the substrate. A first transfer unit that transfers the substrate to the holding unit, a second transfer unit that transfers the substrate from the holding unit to the stage, and a state in which the substrate is transferred to the first transfer unit. A control unit for causing the second transfer unit to transfer the substrate to the stage along a route determined based on a detection result obtained by causing the detection unit to detect the height of the substrate.

  According to the present invention, for example, an advantageous technique for avoiding breakage of a substrate can be provided.

FIG. 3 is a diagram illustrating a configuration of a forming unit of the imprint apparatus. It is the figure which looked at the conveyance device from the top (Z direction). It is the figure which looked at the conveyance device from the side (-Y direction). FIG. 4 is a diagram for explaining an arrangement of a detection unit. 5 is a flowchart illustrating a method of transferring a substrate to a stage. FIG. 4 is a diagram illustrating a state where a substrate is held by a first transport unit. It is a figure showing a 1st distribution. It is a figure showing a 2nd distribution. FIG. 4 is a diagram illustrating shape information of a substrate. It is a figure showing the state where each of two boards from which shape differs mutually is held. FIG. 5 is a diagram for explaining an arrangement of two detection units.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. In the drawings, the same members or elements are denoted by the same reference numerals, and redundant description will be omitted. The transfer apparatus according to the present invention can be applied to a lithography apparatus that forms a pattern on a substrate, such as an imprint apparatus, an exposure apparatus, and a drawing apparatus. In the embodiment described below, an imprint apparatus that forms a pattern on an imprint material on a substrate using a mold will be described.

<First embodiment>
An imprint apparatus according to a first embodiment of the present invention will be described. The imprint apparatus is used for manufacturing a semiconductor device or the like, and performs an imprint process of forming a pattern on an imprint material on a substrate using a mold. For example, an imprint apparatus supplies an imprint material onto a substrate, and brings the imprint material supplied onto the substrate into contact with a mold. Then, the imprint material is cured while the imprint material on the substrate is in contact with the mold, and the mold is released (released) from the cured imprint material. Thus, a pattern can be formed on the imprint material on the substrate. The imprint apparatus of the present embodiment may include the forming unit 10 illustrated in FIG. 1 that forms a pattern on a substrate, and the transfer device 20 illustrated in FIG. 2 that transfers the substrate to the forming unit 10 (stage 12).

  FIG. 1 is a schematic diagram illustrating a configuration of the forming unit 10 of the imprint apparatus. The forming unit 10 includes, for example, an imprint head 11, a stage 12 (substrate stage), an irradiation unit 13, a supply unit 14, and a control unit 15, and uses the mold 1 as the imprint material 3 on the substrate. To form an imprint process. The control unit 15 includes, for example, a CPU and a memory, and controls imprint processing.

  The imprint head 11 holds the mold 1 by a vacuum suction force or the like, and holds the mold 1 at least in the Z direction (imprint direction) so that the mold 1 and the imprint material 3 on the substrate are brought into contact with or separated from each other. Drive. The mold 1 held by the imprint head 11 is made of a material capable of transmitting light for curing the imprint material 3 such as quartz, for example, and is transferred to the imprint material 3 on the substrate. It has a region in which an uneven pattern to be formed is formed.

  The stage 12 is configured to hold the substrate 2 by a vacuum suction force or the like, and to be movable in the XY directions (directions perpendicular to the stamping direction). The substrate 2 held by the stage 12 is, for example, a semiconductor substrate or a glass substrate, and is transferred onto the stage by a transfer device 20 described later. For example, the stage 12 has pins 12a (for example, three pins 12a) that can protrude from a surface (holding surface) that holds the substrate 2, and transfers the substrate 2 onto the stage from a second transport unit 21b described later. At this time, the pin 12a is made to protrude from the holding surface. Then, when the substrate 2 is transferred onto the pins 12a by the transfer device 20 (second transfer unit 21b), the stage 12 reduces the amount of protrusion of the pins 12a from the holding surface. Thereby, the substrate 2 is arranged on the holding surface of the stage 12 and is held by the stage 12.

  When the mold 1 and the imprint material 3 on the substrate are in contact with each other, the irradiation unit 13 applies light (ultraviolet light) for curing the imprint material 3 via the mold 1 to the imprint material 3 on the substrate. Irradiation. In the imprint apparatus of the present embodiment, the light curing method is used, so that the irradiation unit 13 for irradiating light is used. However, when the heat cycle method is used, a heat source is used instead of the irradiation unit 13. May be provided. The supply unit 14 supplies (applies) the imprint material 3 onto the substrate. In the imprint apparatus of the present embodiment, an ultraviolet curable resin having a property of being cured by irradiation of light (ultraviolet) can be used as the imprint material 3.

  Next, the transport device 20 included in the imprint apparatus will be described with reference to FIGS. FIG. 2 is a schematic diagram when the transport device 20 is viewed from above (+ Z direction), and FIG. 3 is a schematic diagram when the transport device 20 (around the PA section 22) is viewed from the side (−Y direction). FIG. The transport device 20 includes a transport unit 21 that transports the substrate 2 and a pre-alignment unit 22 (also referred to as a positioning device or a processing unit; hereinafter, referred to as a PA unit 22) that performs processing for detecting an edge of the substrate 2. And a control unit 25. Then, the transport device 20 transports the substrate 2 from the standby position C where the substrate loaded into the device waits, to the transport position A where the stage 12 is disposed, via the PA unit 22 by the transport unit 21. After the substrate 2 is placed on the stage 12 at the loading position A, the stage 12 moves so that the substrate 2 is placed under the mold 1. After the imprint process on the substrate 2 on the stage 12 is completed, the stage 12 moves to the unloading position B, and the transfer unit 21 transfers the substrate on the stage 12 from the unloading position B to the standby position. At the standby position C, a plurality of substrates 2 are stored in a cassette for each lot.

  Here, the transport unit 21 of the present embodiment includes, for example, a first transport unit 21a that transports the substrate 2 from the standby position C to the PA unit 22 and a transport unit 21 from the PA unit 22 to the loading position A (on the stage 12). And a second transport unit 21b that transports That is, the transport of the substrate 2 from the standby position C to the PA unit 22 and the transport of the substrate 2 from the PA unit 22 to the carry-in position A (above the stage 12) are performed by different transport units. However, the present invention is not limited to this, and the transfer of the substrate 2 from the standby position C to the PA unit 22 and the transfer of the substrate 2 from the PA unit 22 to the loading position A may be performed by a common transfer unit. For example, both the transfer of the substrate 2 from the standby position C to the PA unit 22 and the transfer of the substrate 2 from the PA unit 22 to the carry-in position A without providing the second transfer unit 21b in the transfer device 20 are performed by the first method. This may be performed by the transport unit 21a. Further, in the present embodiment, the control unit 15 of the forming unit 10 and the control unit 25 of the transport device 20 have different configurations, but may have an integrated configuration.

The first transport unit 21a transports the substrates 2 accommodated in the cassette at the standby position C one by one to the PA unit 22 (above the holding unit 22a). First conveying portion 21a, for example, comprise a hand 21a ₁ for holding a substrate 2, an arm 21a ₂ for driving the hand 21a _1. Hand 21a ₁ of the first conveyor section 21a of the lower surface of the substrate 2 can be configured to hold different parts from the parts (the central part) held by the holding portion 22a of the PA unit 22.

The PA unit 22 includes, for example, a holding unit 22a (rotating unit) that holds and rotates the central part of the substrate 2 and an edge detecting unit 22b (second detecting unit) that detects the edge of the substrate 2 held by the holding unit 22a. ). In the PA section 22, a process of detecting the edge position (X direction in the present embodiment) of the edge of the substrate 2 by the edge detection section 22b while rotating the substrate 2 by the holding section 22a, that is, so-called pre-alignment is performed. By this pre-alignment, the position of the notch (orientation flat) of the substrate 2 in the circumferential direction and the center position of the substrate 2 with respect to the holding portion 22a can be obtained. Edge detector 22b for detecting an edge of the substrate 2, and the injection portion 22b ₁ for emitting light, a light transmission type sensor having a light receiving portion 22b ₂ for receiving the light emitted from the exit portion 22b ₁ (e.g. line Sensor) (see FIG. 4B). Such sensors are part of the light emitted from the exit portion 22b ₁ is arranged to be blocked by the substrate 2, the position of the edge board 2 by the intensity distribution of light incident on the light receiving portion 22b ₂ (the In the embodiment, the X direction) can be detected.

The pre-aligned substrate 2 is transported from the PA section 22 to the loading position A (above the stage 12) by the second transport section 21b. Second conveying unit 21b, for example, comprise a hand 21b ₁ for holding a substrate 2, and a drive mechanism 21b ₂ for driving the hand 21b ₁ in the Z-direction and Y-direction. Hand 21b ₁ of the second conveying unit 21b, configured to hold a substrate 2 is different from the hand 21a ₁ of the first conveyor 21a, and has a holding to suspend constituting the outer peripheral portion of the lower surface of the substrate 2. The driving mechanism 21b _2, when driving the hand 21b ₁ in the Z direction, the support shaft 21b ₃ for supporting the hand 21b ₁ is expanded and contracted in the Z direction, when driving the hand 21b ₁ in the Y direction , the support shaft 21b ₃ (along a guide member extending in the Y direction) in the Y-direction moving. Here, in the transport device 20 of the present embodiment, the configurations of the first transport unit 21a and the second transport unit 21b are different from each other, but are not limited thereto. For example, the first transport unit 21a and the second transport unit 21b The configuration of the portion 21b may be the same.

  In the transfer device 20 configured as described above, when the substrate 2 on which a pattern is to be formed has a warp, the transfer of the substrate 2 from the PA unit 22 to the stage 12 causes the substrate 2 to move inside the lithography apparatus. It may be damaged by contact with the member. Therefore, in the transfer device 20, it is preferable to control the transfer of the substrate 2 to the stage 12 after grasping the shape of the substrate 2 in order to avoid contact of the substrate 2 with a member in the lithography apparatus. Therefore, the transfer device 20 of the present embodiment includes the detection unit 24 that detects the height of the substrate 2, and controls the transfer of the substrate 2 to the stage 12 based on the detection result of the detection unit 24. In the detection area 24a set on the path (on the first path) for transporting the substrate 2 to the PA section 22 by the first transport section 21a, a portion of the substrate 2 that fits in the detection area 24a during the transportation of the substrate 2 Includes a detector 24 for detecting the height. Then, the transfer device 20 (control unit 25) generates shape information of the substrate 2 from the detection result of the detection unit 24, and in accordance with the shape information, transfers the substrate 2 from the PA unit 22 to the stage 12 by the second transfer unit 21b. Is determined (second route). Hereinafter, the configuration and arrangement of the detection unit 24 will be described.

  FIG. 4 is a diagram for explaining the detection unit 24, and shows a configuration around the PA unit 22. 4A is a diagram of the periphery of the PA unit 22 viewed from the Z direction, and FIG. 4B is a diagram of the periphery of the PA unit 22 viewed from the −Y direction. The detection unit 24 detects the height of the substrate 2 by, for example, measuring the distance from the detection unit 24 to the substrate 2. The detection unit 24 of the present embodiment emits light to a detection area 24a such as a laser interferometer, and the height of the part (in the Z direction) is reflected by the light reflected by the part of the substrate 2 that fits in the detection area 24a. Position). However, the present invention is not limited to this. For example, a sensor that detects the height of the substrate 2 using capacitance may be included.

  The detection unit 24 can be arranged, for example, such that the detection region 24a is set in a part of the substrate held by the holding unit 22a. It is preferable that the detection unit 24 is arranged such that the detection region 24a is set (positioned) in a region where the warpage of the substrate 2 is large when the substrate 2 is held by the holding unit 22a. The region where the warpage of the substrate 2 is large is a portion closer to the center of rotation of the substrate 2 (the end of the substrate 2) than the portion (outer periphery) of the substrate 2 where the edge detector 22b detects an edge. The detection unit 24 is arranged such that the detection region 24a is set in a range inside the edge of the substrate 2 and within 10 mm from the edge, more preferably in a range inside the edge of the substrate 2 and within 5 mm from the edge. Is preferred. By arranging the detection unit 24 in this manner, the control unit 25 can determine the height distribution in the circumferential direction of the substrate 2 (the height distribution of the (Height distribution in the circumferential direction of the end portion) can be obtained.

  The detection unit 24 can be arranged such that the substrate 2 (preferably, the center of the substrate 2) passes through the detection area 24a while the substrate 2 is being transported by the first transport unit 21a. By arranging the detection unit 24 in this manner, the control unit 25 determines the transport direction (X direction (radius) of the substrate 2 based on the detection result of the detection unit 24 obtained during the transport of the substrate 2 by the first transport unit 21a. Direction)) can be obtained.

  Here, the description will be given of an example in which the detection unit 24 of the present embodiment is arranged so that the substrate 2 passes through the detection area 24a while the substrate 2 is being transported by the first transport unit 21a, but is not limited thereto. . For example, the substrate 2 may be arranged so as to pass through the detection region 24a while the substrate 2 is being transported by the second transport unit 21b. In FIG. 4, the detection unit 24 is disposed on the lower surface side of the substrate 2 so as to detect the height of the back surface (the surface on the −Z direction side) of the substrate 2. (Side surface) may be arranged on the upper surface side of the substrate 2 so as to detect the height.

  Next, a method of transporting the substrate 2 to the stage 12 will be described with reference to FIG. FIG. 5 is a flowchart showing a method of transporting the substrate 2 to the stage 12. Each step of the flowchart shown in FIG. 5 can be controlled by the control unit 25.

  In S10, the control unit 25 controls the first transfer unit 21a so that the transfer of the substrate 2 from the standby position C to the PA unit 22 is started. In S11, the control unit 25 obtains from the detection unit 24 the height of a portion (hereinafter, referred to as a front end portion 2a) that first fits in the detection area 24a of the detection unit 24 during the transfer of the substrate 2 by the first transfer unit 21a. I do. In S12, the control unit 25 contacts the holding unit 22a when the first transfer unit 21a transfers the substrate 2 onto the holding unit 22a based on the height of the tip end portion 2a of the substrate 2. It is determined whether or not it can be avoided. Then, when it is determined that the contact of the substrate 2 with the holding portion 22a can be avoided, the process proceeds to S13. Steps S11 and S12 can be performed before the front end portion 2a of the substrate 2 reaches the holding portion 22a. In S13, the control unit 25 transports the substrate 2 onto the holding unit 22a by the first transport unit 21a.

For example, the substrate 2 may have a warp (shape) that is convex upward. When transporting a substrate 2 having such a warp by the first transfer unit 21a, as shown in FIG. 6, that the height of the tip portion 2a of the substrate 2 is lower than the hand 21a ₁ of the first conveyor 21a is there. In this case, the control unit 25 determines whether or not the contact of the substrate 2 with the holding unit 22a can be avoided by driving the first transport unit 21a or the holding unit 22a based on the height of the tip end portion 2a of the substrate 2. Judge. The drive of the first conveyor 21a and the holding portion 22a, for example, increasing the hand 21a ₁ of the first conveyor 21a than usual, can include such as by the holding surface of the holding portion 22a lower than normal. When the control unit 25 determines that the contact of the substrate 2 with the holding unit 22a can be avoided, the process proceeds to S13. In S13, the control unit 25 controls the first transport unit 21a to transfer the substrate to the PA unit 22 by driving the first transport unit 21a and the holding unit 22a so as to avoid the substrate 2 coming into contact with the holding unit 22a. 2 is controlled.

  On the other hand, since there is a limit in driving the first transport unit 21a and the holding unit 22a, depending on the size of the warpage of the substrate 2 (the height of the leading end portion 2a of the substrate 2), the holding unit 22a Contact of the substrate 2 with the substrate. In this case, the control unit 25 determines in S12 that the driving of the first transport unit 21a and the holding unit 22a cannot prevent the substrate 2 from contacting the holding unit 22a, and proceeds to S14. The transport of the substrate 2 to the PA section 22 (holding section 22a) is stopped. The substrate 2 whose transfer to the PA unit 22 has been stopped is transferred by the first transfer unit 21a to a cassette arranged at the standby position C.

  In S15, the control unit 25 determines the detection unit obtained by passing the substrate 2 through the detection area 24a of the detection unit 24 while the substrate 2 is being transported by the first transport unit 21a, as shown in FIG. The height distribution (first distribution) of the substrate 2 in the transport direction is obtained from the detection results of 24. The first distribution can be represented by, for example, a relationship between a position in the transport direction (a position in the X direction) and a height (a position in the Z direction) within the substrate, as shown in FIG. 7B.

  In S16, the control unit 25 detects the edge of the substrate 2 by the edge detection unit 22b while rotating the substrate 2 by the holding unit 22a (performs pre-alignment). At this time, as shown in FIG. 8A, the height of a portion of the substrate 2 that fits in the detection area 24a is detected by the detection unit 24 during the rotation of the substrate 2 by the holding unit 22a. That is, the detection by the detection unit 24 is performed during the rotation of the substrate 2 for detecting the edge of the substrate 2. Therefore, in S17, the control unit 25 obtains a height distribution (second distribution) in the circumferential direction of the substrate from the detection result of the detection unit 24 obtained during the detection of the edge of the substrate 2. The second distribution can be represented by the relationship between the circumferential angle (rotation angle) and the height in the substrate, for example, as shown in FIG. In the present embodiment, the height distribution over the entire circumference in the circumferential direction of the substrate 2 is determined, but the height distribution need not be the entire circumference.

  In S18, the control unit 25, based on the first distribution obtained in S15 and the second distribution obtained in S17, for example, as shown in FIG. Information). FIG. 9 is a diagram showing shape information of the substrate 2, and a line 2 b in the substrate represents a contour line. Here, in the present embodiment, when obtaining the shape information of the substrate 2, both the first distribution and the second distribution are used. However, the present invention is not limited to this. For example, only one of the first distribution and the second distribution is used. May be used. When obtaining the shape information of the substrate 2, the detection result (edge information of the substrate 2) of the edge detection unit 22 b may be further used. When the edge information of the substrate 2 is further used as described above, the shape information of the substrate 2 can be obtained with higher accuracy.

  In S19, based on the shape information of the substrate 2, the control unit 25 determines that the substrate 2 comes into contact with a member in the imprint apparatus when the substrate 2 is transported onto the stage 12 by the second transport unit 21b. Determine whether it is possible to avoid. If it is determined that the substrate 2 can be prevented from contacting members in the imprint apparatus, the process proceeds to S20. In S20, the control unit 25 transports the substrate 2 to the stage 12 based on the shape information of the substrate 2 by using the second transport unit 21b so as to avoid the substrate 2 from contacting a member in the imprint apparatus. Control. For example, the control unit 25 determines a transport path (second path) for transporting the substrate 2 to the stage 12 so as to prevent the substrate 2 from contacting a member in the imprint apparatus. Then, in S21, the control unit 25 transports the substrate 2 onto the stage 12 by the second transport unit 21b along the second route determined in S20.

For example, in the transfer device 20, when transferring the substrate 2, the position of the central portion of the substrate 2 and the position of the outer peripheral portion (outer edge) of the substrate 2 may differ depending on the warpage (shape) of the substrate 2. Figure 10 is a diagram viewed state holding each of the mutually two substrates having different shapes 2 (substrate 2 ', the substrate 2 ") by the hand 21b ₁ of the second conveying part 21b from the Y-direction. FIG. As shown in FIG. 10, when the substrate 2 ′ is held by the hand 21b ₁ of the second transport unit 21b, the height of the central portion and the outer peripheral portion of the substrate is higher than when the substrate 2 ″ is held. Differ by L. Therefore, when the substrate 2 ′ is transported on the stage along the same path as that for transporting the substrate 2 ″ to the stage 12, the substrate 2 ′ comes into contact with members in the imprint apparatus such as the pins 12 a protruding from the stage 12. Therefore, the transfer device 20 of the present embodiment obtains the shape information of the substrate 2 from the detection result of the detection unit 24, and is held by the transfer unit 21 (the second transfer unit 21b) based on the obtained shape information. Then, the state (position) of the substrate when the substrate 2 is moved is determined, whereby the second path for transporting the substrate 2 onto the stage is determined so as to avoid the substrate 2 from contacting members in the imprint apparatus. be able to.

  Here, in S20, it is preferable that the control unit 25 determine the second path so that the substrate 2 is the shortest path that does not contact the members in the imprint apparatus. The controller 25 may also control the amount of protrusion of the pins 12a that protrude from the stage 12 according to the shape information of the substrate 2 (for example, the amount of protrusion may be reduced). Further, the transfer device 20 may be provided with a correction unit that corrects the shape of the substrate 2 placed on the stage. In this case, after transporting the substrate 2 on the stage, the control unit 25 may determine whether it is necessary to correct the warpage of the substrate 2 by the correction unit according to the shape information of the substrate 2. .

  On the other hand, in S19, when the control unit 25 determines that the contact of the substrate 2 with the member in the imprint apparatus cannot be avoided, the process proceeds to S22, and the transport of the substrate 2 to the stage 12 is stopped. The substrate 2 that has been stopped from being transported to the stage 12 is transported by the first transport unit 21a to a cassette disposed at the standby position C.

  As described above, the transfer device 20 of the present embodiment includes the detection unit 24 that detects the height of the substrate 2, and controls the transfer of the substrate 2 to the stage 12 based on the detection result of the detection unit 24. Thus, when the substrate 2 is transported from the PA unit 22 to the stage, it is possible to prevent the substrate 2 from being damaged by contacting members in the imprint apparatus.

<Second embodiment>
In the second embodiment, an example in which a plurality of detection units 24 are provided will be described with reference to FIG. Here, an example in which two detection units (24-1 and 24-2) are provided will be described, but three or more detection units 24 may be provided. FIG. 11 is a diagram for explaining the arrangement of the two detection units 24, and shows a configuration around the PA unit 22. FIG. 11A is a diagram of the periphery of the PA unit 22 viewed from the Z direction, and FIG. 11B is a diagram of the periphery of the PA unit 22 viewed from the −Y direction.

  As shown in FIG. 11, the plurality of detectors 24 are preferably arranged such that the positions of the detection areas 24a are shifted from each other in a direction (Y direction) perpendicular to the direction of transport of the substrate 2 by the first transporter 21a. In addition, it is preferable that the plurality of detection units 24 be arranged such that the distance between the rotation center of the substrate 2 (for example, the center of the substrate 2) by the holding unit 22a and the detection region 24a is different from each other during edge detection. By using the plurality of detectors 24 arranged as described above, the shape information of the substrate 2 can be obtained with higher accuracy from the detection results of the respective detectors 24.

<Embodiment of Method for Manufacturing Article>
The method for manufacturing an article according to the embodiment of the present invention is suitable for manufacturing an article such as a microdevice such as a semiconductor device or an element having a microstructure. The method for manufacturing an article according to the present embodiment includes a step of forming a pattern on the imprint material (resist) supplied to the substrate using the above-described imprint apparatus (a step of performing an imprint process on the substrate), and the steps of: Processing the substrate on which the pattern is formed. Instead of the imprint apparatus, the other lithographic apparatuses described above may be used. Further, such a manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist peeling, dicing, bonding, packaging, and the like). The method of manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article, as compared with the conventional method.

  Although the preferred embodiments of the present invention have been described above, it goes without saying that the present invention is not limited to these embodiments, and various modifications and changes can be made within the scope of the gist.

10: imprint apparatus, 11: imprint head, 12: stage, 20: transport apparatus, 21a: first transport section, 21b: second transport section, 22: pre-alignment section, 24: detection section, 25: control section

Claims (24)

A transfer device for transferring a substrate to a stage,
A holding unit for holding the substrate,
A detection unit that detects the height of the substrate,
A first transport unit that transports the substrate to the holding unit;
A second transfer unit that transfers the substrate from the holding unit to the stage;
While the substrate is being transported to the first transport unit, the height of the substrate is detected by the detection unit, and the substrate is transported to the second transport unit along a path determined based on a detection result obtained. A control unit for transporting the
A transport device comprising:   2. The transfer device according to claim 1, wherein the detection result includes a distribution of a height of the substrate in a transfer direction of the substrate.   3. The detection unit according to claim 1, wherein the detection unit includes a plurality of detection units that are arranged to be shifted from each other in a direction different from a transport direction of the substrate transported by the first transport unit. 4. Transport device.   4. The transfer device according to claim 1, wherein the control unit determines the path so as to prevent the substrate from contacting the stage. 5.   The control unit determines whether the substrate contacts the holding unit based on the height of the substrate detected by the detection unit, and when it is determined that the substrate contacts the holding unit, 4. The transfer device according to claim 1, wherein the transfer of the substrate to the holding unit by the first transfer unit is stopped. 5. A transfer device for transferring a substrate to a stage,
A holding unit that holds and rotates the substrate,
A detection unit that detects the height of the substrate,
A transfer unit that transfers the substrate from the holding unit to the stage,
In a state where the substrate is held and rotated by the holding unit, the height of the substrate is detected by the detection unit, and the substrate is transferred to the transport unit by a route determined based on a first detection result obtained. A control unit to be transported to the stage,
A transport device comprising:   The transfer device according to claim 6, wherein the first detection result includes a distribution indicating a height distribution of the substrate in a circumferential direction of the substrate.   8. The transfer according to claim 6, wherein the control unit changes a projection amount of a pin projected from the stage based on the first detection result when transferring the substrate to the stage. 9. apparatus.   7. The detection unit according to claim 6, wherein a distance between a rotation center at which the holding unit rotates the substrate and a detection area for detecting a height of the substrate is different from each other. The transfer device according to any one of claims 1 to 8, wherein   The transfer device according to claim 6, wherein the control unit determines the route so as to avoid the substrate from contacting the stage. A second detection unit that detects an edge of the substrate,
The second detection unit detects an edge of the substrate while rotating the substrate on the holding unit,
The transport device according to claim 6, wherein the control unit determines the path based on an edge of the substrate and the first detection result. Having another transport unit that transports the substrate to the holding unit,
The control unit is configured to detect the height of the substrate by the detection unit in a state where the substrate is being conveyed to the another conveyance unit, based on the second detection result and the first detection result obtained. The transport device according to claim 6, wherein a route is determined.   13. The transfer device according to claim 12, wherein the second detection result includes a distribution of a height of the substrate in a transfer direction of the substrate.   14. The transfer device according to claim 1, wherein the control unit determines the path so that a path in a height direction of the substrate is changed. A transfer device for transferring a substrate to a stage,
A holding unit for holding the substrate,
A detection unit that detects the height of the substrate,
A transport unit that transports the substrate,
A control unit that causes the detection unit to detect the height of the substrate, and causes the transfer unit to transfer the substrate to the stage on a path determined based on the detection result obtained.
A transport device comprising:   The transport device according to claim 15, wherein the detection unit detects the height of the substrate while the transport unit is transporting the substrate.   17. The transport apparatus according to claim 15, wherein the detection unit detects the height of the substrate while the substrate is being rotated while being held by the holding unit. A lithographic apparatus for forming a pattern on a substrate, comprising:
The transport device according to any one of claims 1 to 17,
A substrate is transferred by the transfer device, and has a stage that holds and moves the substrate, a forming unit that forms a pattern on the substrate held by the stage,
A lithographic apparatus, comprising: A transfer method for transferring a substrate to a stage,
A detection step of detecting the height of the substrate while the substrate is being conveyed to a holding unit that holds the substrate to obtain a detection result,
A determining step of determining a path for transporting the substrate to the stage based on the detection result;
A transporting step of transporting the substrate to the stage along the route determined in the determining step,
A transport method comprising: A transfer method for transferring a substrate to a stage,
A detection step of detecting a height of the substrate in a state where the holding unit that holds and rotates the substrate holds and rotates the substrate to obtain a detection result,
A determining step of determining a path for transporting the substrate to the stage based on the detection result;
A transporting step of transporting the substrate to the stage along the route determined in the determining step,
A transport method comprising: A transfer method for transferring a substrate to a stage,
A detection step of detecting the height of the substrate to obtain a detection result,
A determining step of determining a path for transporting the substrate to the stage based on the detection result;
A transporting step of transporting the substrate to the stage along the route determined in the determining step,
A transport method comprising: A detection step of detecting the height of the substrate while the substrate is being conveyed to a holding unit that holds the substrate to obtain a detection result,
A determining step of determining a path for transporting the substrate to a stage based on the detection result;
A transporting step of transporting the substrate to the stage along the route determined in the determining step,
A forming step of forming a pattern on the substrate transferred to the stage in the transferring step,
A processing step of processing the substrate on which the pattern is formed in the forming step,
A step of obtaining an article including at least a part of the substrate processed in the processing step,
A method for producing an article, comprising: A detection step of detecting a height of the substrate in a state where the holding unit that holds and rotates the substrate holds and rotates the substrate to obtain a detection result,
A determining step of determining a path for transporting the substrate to a stage based on the detection result;
A transporting step of transporting the substrate to the stage along the route determined in the determining step,
A forming step of forming a pattern on the substrate transferred to the stage in the transferring step,
A processing step of processing the substrate on which the pattern is formed in the forming step,
A step of obtaining an article including at least a part of the substrate processed in the processing step,
A method for producing an article, comprising: A detection step of detecting the height of the substrate to obtain a detection result,
A determining step of determining a path for transporting the substrate to a stage based on the detection result;
A transporting step of transporting the substrate to the stage along the route determined in the determining step,
A forming step of forming a pattern on the substrate transferred to the stage in the transferring step,
A processing step of processing the substrate on which the pattern is formed in the forming step,
A step of obtaining an article including at least a part of the substrate processed in the processing step,
A method for producing an article, comprising:

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