KR101179939B1 - 계산기 홀로그램, 생성 방법 및 노광 장치 - Google Patents

계산기 홀로그램, 생성 방법 및 노광 장치 Download PDF

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Publication number
KR101179939B1
KR101179939B1 KR1020107016424A KR20107016424A KR101179939B1 KR 101179939 B1 KR101179939 B1 KR 101179939B1 KR 1020107016424 A KR1020107016424 A KR 1020107016424A KR 20107016424 A KR20107016424 A KR 20107016424A KR 101179939 B1 KR101179939 B1 KR 101179939B1
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South Korea
Prior art keywords
light
intensity distribution
polarization
phase
light intensity
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Expired - Fee Related
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KR1020107016424A
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English (en)
Korean (ko)
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KR20100103634A (ko
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이사오 마츠바라
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0891—Processes or apparatus adapted to convert digital holographic data into a hologram
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0478—Serial printer, i.e. point oriented processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2249—Holobject properties
    • G03H2001/2276—Polarisation dependent holobject
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
    • G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
    • G03H2001/303—Interleaved sub-holograms, e.g. three RGB sub-holograms having interleaved pixels for reconstructing coloured holobject
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/31—Polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/20—Birefringent optical element, e.g. wave plate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/10—Physical parameter modulated by the hologram
    • G03H2240/13—Amplitude and phase complex modulation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/10—Physical parameter modulated by the hologram
    • G03H2240/15—Polarisation modulation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/40—Dynamic of the variations
    • G03H2240/41—Binary
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/50—Parameters or numerical values associated with holography, e.g. peel strength
    • G03H2240/55—Thickness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/50—Reactivity or recording processes
    • G03H2260/51—Photoanisotropic reactivity wherein polarized light induces material birefringence, e.g. azo-dye doped polymer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Holo Graphy (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020107016424A 2007-12-28 2008-12-08 계산기 홀로그램, 생성 방법 및 노광 장치 Expired - Fee Related KR101179939B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2007-341123 2007-12-28
JP2007341123A JP5032972B2 (ja) 2007-12-28 2007-12-28 計算機ホログラム、生成方法及び露光装置
PCT/JP2008/072723 WO2009084409A1 (en) 2007-12-28 2008-12-08 Computer generated hologram, generation method, and exposure apparatus

Publications (2)

Publication Number Publication Date
KR20100103634A KR20100103634A (ko) 2010-09-27
KR101179939B1 true KR101179939B1 (ko) 2012-09-07

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KR1020107016424A Expired - Fee Related KR101179939B1 (ko) 2007-12-28 2008-12-08 계산기 홀로그램, 생성 방법 및 노광 장치

Country Status (6)

Country Link
US (1) US8373914B2 (enExample)
EP (1) EP2225770B1 (enExample)
JP (1) JP5032972B2 (enExample)
KR (1) KR101179939B1 (enExample)
TW (1) TWI391989B (enExample)
WO (1) WO2009084409A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5078764B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5167032B2 (ja) * 2008-08-27 2013-03-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
US8531747B2 (en) 2009-06-24 2013-09-10 Canon Kabushiki Kaisha Hologram, hologram data generation method, and exposure apparatus
JP5527074B2 (ja) * 2009-11-16 2014-06-18 セイコーエプソン株式会社 偏光素子及びプロジェクター
JP5526851B2 (ja) * 2010-02-19 2014-06-18 セイコーエプソン株式会社 偏光素子及びプロジェクター
JP5463947B2 (ja) * 2010-02-19 2014-04-09 セイコーエプソン株式会社 偏光素子及びプロジェクター
US9116303B2 (en) 2010-03-05 2015-08-25 Canon Kabushiki Kaisha Hologram with cells to control phase in two polarization directions and exposure apparatus
JP2013186350A (ja) * 2012-03-08 2013-09-19 Canon Inc 回折光学素子の構造データの算出方法、プログラムおよび製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006196715A (ja) 2005-01-13 2006-07-27 Nikon Corp 光束変換素子、照明光学装置、露光装置、および露光方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3246615B2 (ja) * 1992-07-27 2002-01-15 株式会社ニコン 照明光学装置、露光装置、及び露光方法
JP3371846B2 (ja) * 1999-04-06 2003-01-27 日本電気株式会社 ホログラム素子
JP3958163B2 (ja) * 2002-09-19 2007-08-15 キヤノン株式会社 露光方法
US7414786B2 (en) * 2004-01-12 2008-08-19 University Of Rochester System and method converting the polarization state of an optical beam into an inhomogeneously polarized state
JP4332460B2 (ja) * 2004-04-02 2009-09-16 キヤノン株式会社 照明光学系及び当該照明光学系を有する露光装置
JP2006005319A (ja) * 2004-06-21 2006-01-05 Canon Inc 照明光学系及び方法、露光装置及びデバイス製造方法
KR100684872B1 (ko) * 2004-08-03 2007-02-20 삼성전자주식회사 빛의 편광을 공간적으로 제어하는 광학 시스템 및 이를제작하는 방법
US7599069B2 (en) * 2005-05-06 2009-10-06 The University Of Chicago Vector beam generator using a passively phase stable optical interferometer
JP5173309B2 (ja) * 2007-07-31 2013-04-03 キヤノン株式会社 ホログラム、露光装置及びデバイス製造方法
US8531747B2 (en) * 2009-06-24 2013-09-10 Canon Kabushiki Kaisha Hologram, hologram data generation method, and exposure apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006196715A (ja) 2005-01-13 2006-07-27 Nikon Corp 光束変換素子、照明光学装置、露光装置、および露光方法

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Publication number Publication date
WO2009084409A1 (en) 2009-07-09
JP2009164297A (ja) 2009-07-23
EP2225770A1 (en) 2010-09-08
KR20100103634A (ko) 2010-09-27
TW200943382A (en) 2009-10-16
TWI391989B (zh) 2013-04-01
EP2225770B1 (en) 2015-04-01
EP2225770A4 (en) 2011-05-18
US20100208315A1 (en) 2010-08-19
US8373914B2 (en) 2013-02-12
JP5032972B2 (ja) 2012-09-26

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