KR101149089B1 - 노광 장치 - Google Patents

노광 장치 Download PDF

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Publication number
KR101149089B1
KR101149089B1 KR1020067027970A KR20067027970A KR101149089B1 KR 101149089 B1 KR101149089 B1 KR 101149089B1 KR 1020067027970 A KR1020067027970 A KR 1020067027970A KR 20067027970 A KR20067027970 A KR 20067027970A KR 101149089 B1 KR101149089 B1 KR 101149089B1
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KR
South Korea
Prior art keywords
exposure
mask
optical system
image
exposed
Prior art date
Application number
KR1020067027970A
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English (en)
Korean (ko)
Other versions
KR20070024685A (ko
Inventor
미요시 이토
Original Assignee
브이 테크놀로지 씨오. 엘티디
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Publication of KR20070024685A publication Critical patent/KR20070024685A/ko
Application granted granted Critical
Publication of KR101149089B1 publication Critical patent/KR101149089B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Color Television Image Signal Generators (AREA)
KR1020067027970A 2004-06-30 2005-06-27 노광 장치 KR101149089B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004194023A JP2006017895A (ja) 2004-06-30 2004-06-30 露光装置
JPJP-P-2004-00194023 2004-06-30
PCT/JP2005/011739 WO2006003863A1 (ja) 2004-06-30 2005-06-27 露光装置

Publications (2)

Publication Number Publication Date
KR20070024685A KR20070024685A (ko) 2007-03-02
KR101149089B1 true KR101149089B1 (ko) 2012-05-25

Family

ID=35782672

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067027970A KR101149089B1 (ko) 2004-06-30 2005-06-27 노광 장치

Country Status (5)

Country Link
JP (1) JP2006017895A (zh)
KR (1) KR101149089B1 (zh)
CN (1) CN1981244B (zh)
TW (1) TWI397776B (zh)
WO (1) WO2006003863A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160108792A (ko) * 2015-03-06 2016-09-20 아주하이텍(주) Ldi 노광장치의 스테이지 보정장치 및 이를 이용한 보정방법

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI437618B (zh) 2004-02-06 2014-05-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
EP1881521B1 (en) 2005-05-12 2014-07-23 Nikon Corporation Projection optical system, exposure apparatus and exposure method
TW201738667A (zh) * 2006-08-31 2017-11-01 Nippon Kogaku Kk 曝光方法及曝光裝置、以及元件製造方法
JP2008076709A (ja) * 2006-09-21 2008-04-03 V Technology Co Ltd 露光装置
US8431328B2 (en) 2007-02-22 2013-04-30 Nikon Corporation Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus
JP4971835B2 (ja) * 2007-03-02 2012-07-11 株式会社ブイ・テクノロジー 露光方法及び露光装置
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2009251290A (ja) * 2008-04-07 2009-10-29 V Technology Co Ltd 露光装置
KR101325431B1 (ko) * 2009-02-05 2013-11-04 도판 인사츠 가부시키가이샤 노광 방법, 컬러 필터의 제조 방법 및 노광 장치
JP5185158B2 (ja) * 2009-02-26 2013-04-17 Ｈｏｙａ株式会社 多階調フォトマスクの評価方法
KR101254442B1 (ko) 2009-02-26 2013-04-12 도판 인사츠 가부시키가이샤 컬러 필터 및 컬러 필터의 제조 방법
JP5261847B2 (ja) * 2009-06-16 2013-08-14 株式会社ブイ・テクノロジー アライメント方法、アライメント装置及び露光装置
TWI428688B (zh) * 2009-07-29 2014-03-01 Hoya Corp Method for manufacturing multi - modal mask and pattern transfer method
US8988653B2 (en) 2009-08-20 2015-03-24 Asml Netherlands B.V. Lithographic apparatus, distortion determining method, and patterning device
WO2011058634A1 (ja) 2009-11-12 2011-05-19 株式会社ブイ・テクノロジー 露光装置及びそれに使用するフォトマスク
TWI490657B (zh) * 2009-11-26 2015-07-01 V Technology Co Ltd 曝光裝置及其所使用的光罩
JP5630864B2 (ja) * 2010-12-06 2014-11-26 凸版印刷株式会社 露光装置
JP6940873B2 (ja) * 2017-12-08 2021-09-29 株式会社ブイ・テクノロジー 露光装置および露光方法
CN115278000A (zh) * 2022-06-24 2022-11-01 维沃移动通信有限公司 图像传感器、图像生成方法、摄像头模组及电子设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60257521A (ja) * 1984-06-04 1985-12-19 Nippon Telegr & Teleph Corp <Ntt> パタン形成用露光装置
JPS6289328A (ja) * 1985-10-16 1987-04-23 Canon Inc 露光装置
JPH09127702A (ja) * 1995-10-30 1997-05-16 Dainippon Printing Co Ltd 大サイズ基板用露光装置および露光方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56105634A (en) * 1980-01-25 1981-08-22 Fujitsu Ltd X rays transcription device
US4780615A (en) * 1985-02-01 1988-10-25 Canon Kabushiki Kaisha Alignment system for use in pattern transfer apparatus
JPH0677112A (ja) * 1992-08-28 1994-03-18 Nec Kyushu Ltd 露光装置における遮光領域制御機構
WO1999046807A1 (fr) * 1998-03-09 1999-09-16 Nikon Corporation Procede et appareil d'exposition par balayage, procede de fabrication associe, dispositif et procede de fabrication associe
AU1078700A (en) * 1998-11-06 2000-05-29 Nikon Corporation Exposure method and exposure apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60257521A (ja) * 1984-06-04 1985-12-19 Nippon Telegr & Teleph Corp <Ntt> パタン形成用露光装置
JPS6289328A (ja) * 1985-10-16 1987-04-23 Canon Inc 露光装置
JPH09127702A (ja) * 1995-10-30 1997-05-16 Dainippon Printing Co Ltd 大サイズ基板用露光装置および露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160108792A (ko) * 2015-03-06 2016-09-20 아주하이텍(주) Ldi 노광장치의 스테이지 보정장치 및 이를 이용한 보정방법
KR101711726B1 (ko) 2015-03-06 2017-03-03 아주하이텍(주) Ldi 노광장치의 스테이지 보정장치 및 이를 이용한 보정방법

Also Published As

Publication number Publication date
TW200600981A (en) 2006-01-01
WO2006003863A1 (ja) 2006-01-12
JP2006017895A (ja) 2006-01-19
CN1981244A (zh) 2007-06-13
TWI397776B (zh) 2013-06-01
KR20070024685A (ko) 2007-03-02
CN1981244B (zh) 2010-11-10

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