KR101121417B1 - 표시소자의 제조장치 - Google Patents

표시소자의 제조장치 Download PDF

Info

Publication number
KR101121417B1
KR101121417B1 KR1020040086470A KR20040086470A KR101121417B1 KR 101121417 B1 KR101121417 B1 KR 101121417B1 KR 1020040086470 A KR1020040086470 A KR 1020040086470A KR 20040086470 A KR20040086470 A KR 20040086470A KR 101121417 B1 KR101121417 B1 KR 101121417B1
Authority
KR
South Korea
Prior art keywords
gas
raw material
gas injector
injector
evaporator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1020040086470A
Other languages
English (en)
Korean (ko)
Other versions
KR20060037513A (ko
Inventor
김재호
Original Assignee
주성엔지니어링(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주성엔지니어링(주) filed Critical 주성엔지니어링(주)
Priority to KR1020040086470A priority Critical patent/KR101121417B1/ko
Priority to US11/255,062 priority patent/US8157916B2/en
Priority to TW094136806A priority patent/TWI453800B/zh
Priority to CN2005101095762A priority patent/CN1766157B/zh
Priority to JP2005312875A priority patent/JP4942985B2/ja
Publication of KR20060037513A publication Critical patent/KR20060037513A/ko
Application granted granted Critical
Publication of KR101121417B1 publication Critical patent/KR101121417B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020040086470A 2004-10-28 2004-10-28 표시소자의 제조장치 Expired - Lifetime KR101121417B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020040086470A KR101121417B1 (ko) 2004-10-28 2004-10-28 표시소자의 제조장치
US11/255,062 US8157916B2 (en) 2004-10-28 2005-10-19 Apparatus for fabricating display device
TW094136806A TWI453800B (zh) 2004-10-28 2005-10-21 用於製造顯示裝置之設備
CN2005101095762A CN1766157B (zh) 2004-10-28 2005-10-26 用于制作显示装置的设备
JP2005312875A JP4942985B2 (ja) 2004-10-28 2005-10-27 薄膜製造用装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020040086470A KR101121417B1 (ko) 2004-10-28 2004-10-28 표시소자의 제조장치

Publications (2)

Publication Number Publication Date
KR20060037513A KR20060037513A (ko) 2006-05-03
KR101121417B1 true KR101121417B1 (ko) 2012-03-15

Family

ID=36260374

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040086470A Expired - Lifetime KR101121417B1 (ko) 2004-10-28 2004-10-28 표시소자의 제조장치

Country Status (5)

Country Link
US (1) US8157916B2 (https=)
JP (1) JP4942985B2 (https=)
KR (1) KR101121417B1 (https=)
CN (1) CN1766157B (https=)
TW (1) TWI453800B (https=)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI341872B (en) * 2006-08-07 2011-05-11 Ind Tech Res Inst Plasma deposition apparatus and depositing method thereof
KR101301642B1 (ko) * 2007-03-07 2013-08-29 주성엔지니어링(주) 가열수단을 가지는 가스분사장치와 이를 포함하는기판처리장치
KR101394481B1 (ko) * 2007-10-30 2014-05-13 주성엔지니어링(주) 가스 분사 장치 및 이를 이용한 유기 박막 증착 장치
KR101363395B1 (ko) * 2007-10-31 2014-02-21 주성엔지니어링(주) 가스 분사 장치 및 이를 이용한 유기 박막 증착 장치와유기 박막 증착 방법
KR101173645B1 (ko) * 2007-12-31 2012-08-20 (주)에이디에스 가스 분사 유닛 및 이를 구비하는 박막 증착 장치
KR100952313B1 (ko) * 2009-03-26 2010-04-09 에스엔유 프리시젼 주식회사 원료 공급 유닛과 원료 공급 방법 및 박막 증착 장치
JP5623786B2 (ja) * 2009-05-22 2014-11-12 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置
JP5620146B2 (ja) 2009-05-22 2014-11-05 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置
US8882920B2 (en) * 2009-06-05 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
US8882921B2 (en) * 2009-06-08 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
KR101074792B1 (ko) * 2009-06-12 2011-10-19 삼성모바일디스플레이주식회사 박막 증착 장치
KR101117719B1 (ko) * 2009-06-24 2012-03-08 삼성모바일디스플레이주식회사 박막 증착 장치
KR101127575B1 (ko) * 2009-08-10 2012-03-23 삼성모바일디스플레이주식회사 증착 가림막을 가지는 박막 증착 장치
JP5328726B2 (ja) 2009-08-25 2013-10-30 三星ディスプレイ株式會社 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法
JP5677785B2 (ja) 2009-08-27 2015-02-25 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法
US20110052795A1 (en) * 2009-09-01 2011-03-03 Samsung Mobile Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US8696815B2 (en) 2009-09-01 2014-04-15 Samsung Display Co., Ltd. Thin film deposition apparatus
US8876975B2 (en) 2009-10-19 2014-11-04 Samsung Display Co., Ltd. Thin film deposition apparatus
KR101084184B1 (ko) 2010-01-11 2011-11-17 삼성모바일디스플레이주식회사 박막 증착 장치
KR101174875B1 (ko) 2010-01-14 2012-08-17 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR101193186B1 (ko) * 2010-02-01 2012-10-19 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR101156441B1 (ko) 2010-03-11 2012-06-18 삼성모바일디스플레이주식회사 박막 증착 장치
KR101202348B1 (ko) 2010-04-06 2012-11-16 삼성디스플레이 주식회사 박막 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
US8894458B2 (en) 2010-04-28 2014-11-25 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
KR101223723B1 (ko) 2010-07-07 2013-01-18 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR101673017B1 (ko) 2010-07-30 2016-11-07 삼성디스플레이 주식회사 박막 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조 방법
KR101723506B1 (ko) 2010-10-22 2017-04-19 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR101738531B1 (ko) 2010-10-22 2017-05-23 삼성디스플레이 주식회사 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR20120045865A (ko) 2010-11-01 2012-05-09 삼성모바일디스플레이주식회사 유기층 증착 장치
KR20120065789A (ko) 2010-12-13 2012-06-21 삼성모바일디스플레이주식회사 유기층 증착 장치
JP5718362B2 (ja) * 2010-12-14 2015-05-13 シャープ株式会社 蒸着装置、蒸着方法、並びに、有機エレクトロルミネッセンス表示装置の製造方法
KR101760897B1 (ko) 2011-01-12 2017-07-25 삼성디스플레이 주식회사 증착원 및 이를 구비하는 유기막 증착 장치
KR101852517B1 (ko) 2011-05-25 2018-04-27 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR101840654B1 (ko) 2011-05-25 2018-03-22 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR101857249B1 (ko) 2011-05-27 2018-05-14 삼성디스플레이 주식회사 패터닝 슬릿 시트 어셈블리, 유기막 증착 장치, 유기 발광 표시장치제조 방법 및 유기 발광 표시 장치
KR101826068B1 (ko) 2011-07-04 2018-02-07 삼성디스플레이 주식회사 유기층 증착 장치
US20130269613A1 (en) * 2012-03-30 2013-10-17 Applied Materials, Inc. Methods and apparatus for generating and delivering a process gas for processing a substrate
US9279185B2 (en) * 2012-06-14 2016-03-08 Asm Technology Singapore Pte Ltd Feed-through apparatus for a chemical vapour deposition device
US9388494B2 (en) 2012-06-25 2016-07-12 Novellus Systems, Inc. Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
KR102017744B1 (ko) 2012-12-12 2019-10-15 삼성디스플레이 주식회사 증착 장치, 이를 이용한 박막 형성 방법 및 유기 발광 표시 장치 제조 방법
KR101448046B1 (ko) * 2012-12-28 2014-10-15 엘아이지에이디피 주식회사 유기발광소자 제조장치
US9399228B2 (en) 2013-02-06 2016-07-26 Novellus Systems, Inc. Method and apparatus for purging and plasma suppression in a process chamber
JP5837962B1 (ja) * 2014-07-08 2015-12-24 株式会社日立国際電気 基板処理装置、半導体装置の製造方法およびガス整流部
US10954597B2 (en) * 2015-03-17 2021-03-23 Asm Ip Holding B.V. Atomic layer deposition apparatus
US9758868B1 (en) 2016-03-10 2017-09-12 Lam Research Corporation Plasma suppression behind a showerhead through the use of increased pressure
KR102935543B1 (ko) 2019-07-17 2026-03-05 램 리써치 코포레이션 기판 프로세싱을 위한 산화 프로파일의 변조
KR102894024B1 (ko) * 2019-09-19 2025-12-02 가부시키가이샤 후지킨 기화 공급 장치
DE102021117574A1 (de) * 2021-07-07 2023-01-12 Thyssenkrupp Steel Europe Ag Beschichtungsanlage zur Beschichtung eines flächigen Gegenstands sowie ein Verfahren zum Beschichten eines flächigen Gegenstands
CN116555733B (zh) * 2023-05-17 2024-07-05 拓荆科技(上海)有限公司 一种高温喷淋装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980032712A (ko) * 1996-10-11 1998-07-25 마에다시게루 반응가스 분출 헤드
KR20020038625A (ko) * 2002-04-01 2002-05-23 배경빈 기상유기물 증착방법과 이를 이용한 기상유기물 증착장치

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3914515A (en) * 1973-07-16 1975-10-21 Rca Corp Process for forming transition metal oxide films on a substrate and photomasks therefrom
GB8328858D0 (en) * 1983-10-28 1983-11-30 Atomic Energy Authority Uk Metal vapour deposition
JPH0758036A (ja) * 1993-08-16 1995-03-03 Ebara Corp 薄膜形成装置
JP3452617B2 (ja) * 1993-12-10 2003-09-29 真空冶金株式会社 ガスデポジション装置
KR100197649B1 (ko) * 1995-09-29 1999-06-15 김영환 박막 증착장치
JP3579278B2 (ja) * 1999-01-26 2004-10-20 東京エレクトロン株式会社 縦型熱処理装置及びシール装置
DE10007059A1 (de) * 2000-02-16 2001-08-23 Aixtron Ag Verfahren und Vorrichtung zur Herstellung von beschichteten Substraten mittels Kondensationsbeschichtung
TW576873B (en) * 2000-04-14 2004-02-21 Asm Int Method of growing a thin film onto a substrate
US6572706B1 (en) * 2000-06-19 2003-06-03 Simplus Systems Corporation Integrated precursor delivery system
US6886491B2 (en) * 2001-03-19 2005-05-03 Apex Co. Ltd. Plasma chemical vapor deposition apparatus
US6513451B2 (en) 2001-04-20 2003-02-04 Eastman Kodak Company Controlling the thickness of an organic layer in an organic light-emiting device
DE10128091C1 (de) * 2001-06-11 2002-10-02 Applied Films Gmbh & Co Kg Vorrichtung für die Beschichtung eines flächigen Substrats
US6619304B2 (en) * 2001-09-13 2003-09-16 Micell Technologies, Inc. Pressure chamber assembly including non-mechanical drive means
US6749906B2 (en) 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
US6863736B2 (en) * 2002-05-29 2005-03-08 Ibis Technology Corporation Shaft cooling mechanisms
JP2004143521A (ja) * 2002-10-24 2004-05-20 Sony Corp 薄膜形成装置
KR100483834B1 (ko) * 2003-01-06 2005-04-20 삼성전자주식회사 회전식 가열부를 구비한 급속 열처리 장치
JP2005082880A (ja) * 2003-09-11 2005-03-31 Shoka Kagi Kofun Yugenkoshi 有機ｅｌ発光装置の成膜設備

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980032712A (ko) * 1996-10-11 1998-07-25 마에다시게루 반응가스 분출 헤드
KR20020038625A (ko) * 2002-04-01 2002-05-23 배경빈 기상유기물 증착방법과 이를 이용한 기상유기물 증착장치

Also Published As

Publication number Publication date
US20060090705A1 (en) 2006-05-04
TW200620421A (en) 2006-06-16
CN1766157A (zh) 2006-05-03
CN1766157B (zh) 2010-08-25
JP4942985B2 (ja) 2012-05-30
KR20060037513A (ko) 2006-05-03
JP2006124837A (ja) 2006-05-18
TWI453800B (zh) 2014-09-21
US8157916B2 (en) 2012-04-17

Similar Documents

Publication Publication Date Title
KR101121417B1 (ko) 표시소자의 제조장치
US11534790B2 (en) Apparatus and method of manufacturing display apparatus
KR100826743B1 (ko) 유기 박막의 제조장치
US11196030B2 (en) High efficiency vapor transport sublimation source using baffles coated with source material
JP7464692B2 (ja) 基板上にフィルムを形成するための蒸発器チャンバ
US20110033973A1 (en) Deposition apparatus for temperature sensitive materials
EP1727922A1 (en) High thickness uniformity vaporization source
EP2137335B1 (en) Fine control of vaporized organic material
CN104233198A (zh) 线性蒸发源及具有所述线性蒸发源的用于平板显示器的玻璃沉积设备
JP3684343B2 (ja) 薄膜堆積用分子線源セル
KR101324290B1 (ko) 기판제조장치의 원료공급장치
US20080145534A1 (en) Deposition apparatus with cavities for a substrate and an evaporation source, and deposition method using the same
KR100477546B1 (ko) 유기물질 증착방법 및 이를 적용한 장치
KR101107502B1 (ko) 표시소자의 제조장치
KR101313708B1 (ko) 기판제조장치와 이에 사용되는 가스분사장치
KR101107503B1 (ko) 고온에서 사용 가능한 솔레노이드 밸브 및 이를 포함하는원료공급시스템
KR101138612B1 (ko) 기화효율을 향상시킨 가스분사장치
CN113853449B (zh) 用于在基板上形成膜的方法及系统
KR102160508B1 (ko) 고온용 선형 증착원
US20070092697A1 (en) Apparatus and method for manufacturing display device substrate
KR101363395B1 (ko) 가스 분사 장치 및 이를 이용한 유기 박막 증착 장치와유기 박막 증착 방법
KR101313773B1 (ko) 유기물 증착 장치 및 이를 이용한 증착 방법
KR101313706B1 (ko) 유기발광다이오드 소자의 알루미늄 전극증착 장치 및 방법
KR20080036919A (ko) 유기발광다이오드소자 제조용 증착장치의 원료공급장치

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20041028

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20091028

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 20041028

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20110315

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20111129

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20120222

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20120222

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
FPAY Annual fee payment

Payment date: 20150105

Year of fee payment: 4

PR1001 Payment of annual fee

Payment date: 20150105

Start annual number: 4

End annual number: 4

FPAY Annual fee payment

Payment date: 20160105

Year of fee payment: 5

PR1001 Payment of annual fee

Payment date: 20160105

Start annual number: 5

End annual number: 5

FPAY Annual fee payment

Payment date: 20170221

Year of fee payment: 6

PR1001 Payment of annual fee

Payment date: 20170221

Start annual number: 6

End annual number: 6

FPAY Annual fee payment

Payment date: 20180816

Year of fee payment: 7

PR1001 Payment of annual fee

Payment date: 20180816

Start annual number: 7

End annual number: 7

FPAY Annual fee payment

Payment date: 20190104

Year of fee payment: 8

PR1001 Payment of annual fee

Payment date: 20190104

Start annual number: 8

End annual number: 8

FPAY Annual fee payment

Payment date: 20200102

Year of fee payment: 9

PR1001 Payment of annual fee

Payment date: 20200102

Start annual number: 9

End annual number: 9

PR1001 Payment of annual fee

Payment date: 20210216

Start annual number: 10

End annual number: 10

PR1001 Payment of annual fee

Payment date: 20220103

Start annual number: 11

End annual number: 11

PR1001 Payment of annual fee

Payment date: 20230201

Start annual number: 12

End annual number: 12

PR1001 Payment of annual fee

Payment date: 20231227

Start annual number: 13

End annual number: 13

PC1801 Expiration of term

Termination date: 20250428

Termination category: Expiration of duration