KR101056059B1 - 타겟 접합제 - Google Patents
타겟 접합제 Download PDFInfo
- Publication number
- KR101056059B1 KR101056059B1 KR1020080120417A KR20080120417A KR101056059B1 KR 101056059 B1 KR101056059 B1 KR 101056059B1 KR 1020080120417 A KR1020080120417 A KR 1020080120417A KR 20080120417 A KR20080120417 A KR 20080120417A KR 101056059 B1 KR101056059 B1 KR 101056059B1
- Authority
- KR
- South Korea
- Prior art keywords
- sputtering target
- target
- binder
- bonding agent
- bonding
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/262—Sn as the principal constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
- B23K35/3006—Ag as the principal constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
- B23K35/302—Cu as the principal constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0483—Alloys based on the low melting point metals Zn, Pb, Sn, Cd, In or Ga
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Temperatures(℃) for Vapor Pressure(Torr) | |||||||||
Element Symbol | 10-8 | 10-7 | 10-6 | 10-5 | 10-4 | 10-3 | 10-2 | 10-1 | 1 |
Ag | 574 | 626 | 685 | 752 | 832 | 922 | 1027 | 1162 | 1322 |
Au | 807 | 877 | 947 | 1032 | 1132 | 1252 | 1397 | 1567 | 1767 |
Bi | 347 | 367 | 409 | 459 | 517 | 587 | 672 | 777 | 897 |
Cu | 722 | 787 | 852 | 937 | 1027 | 1132 | 1257 | 1417 | 1617 |
In | 488 | 539 | 597 | 664 | 742 | 837 | 947 | 1082 | 1247 |
Pt | 1292 | 1382 | 1492 | 1612 | 1747 | 1907 | 2097 | 2317 | 2587 |
Sn | 682 | 747 | 804 | 897 | 997 | 1107 | 1247 | 1412 | 1612 |
Zn | 123 | 147 | 177 | 209 | 247 | 292 | 344 | 408 | 487 |
타겟 접합제 조성 | |
비교예 1 | In |
비교예 2 | Sn |
실시예 1 | Sn20In1Ag0.1Cu |
실시예 2 | Sn20In1Ag0.56Cu |
실시예 3 | Sn20In2.5Ag0.26Cu |
실시예 4 | Sn20In2.8Ag0.1Cu |
실시예 5 | Sn20In2.8Ag0.56Cu |
타겟 접합제 조성 | 평균 경도(Hv) | |
비교예 1 | In | 1.08 |
비교예 2 | Sn | 51 |
실시예 1 | Sn20In1Ag0.1Cu | 14.13 |
실시예 2 | Sn20In1Ag0.56Cu | 13.60 |
실시예 3 | Sn20In2.5Ag0.26Cu | 13.93 |
실시예 4 | Sn20In2.8Ag0.1Cu | 15.75 |
실시예 5 | Sn20In2.8Ag0.56Cu | 15.98 |
접합제 조성 | 접합계면의 박리 | 휨 시험시 드는 힘 | 연성정도 | |
실시예 1 | Sn20In1Ag0.1Cu | × | ◎ | △ |
실시예 2 | Sn20In1Ag0.56Cu | × | ◎ | △ |
실시예 3 | Sn20In2.5Ag0.26Cu | × | ◎ | △ |
실시예 4 | Sn20In2.8Ag0.1Cu | × | ◎ | △ |
실시예 5 | Sn20In2.8Ag0.56Cu | × | ◎ | △ |
타겟 접합제 조성 | 연신율 | |
비교예 1 | In | 27% |
실시예 3 | Sn20In2.5Ag0.26Cu | 24.30% |
실시예 5 | Sn20In2.8Ag0.56Cu | 24% |
타겟 접합제 조성 | 접합강도 (kgf/㎠) | |
비교예 1 | Pure In | 24.7 |
실시예 3 | Sn20In2.5Ag0.26Cu | 129.0 |
실시예 5 | Sn20In2.8Ag0.56Cu | 116.1 |
타겟 접합제 조성 | 고상선 온도(℃) | 액상선 온도(℃) | 고액 구간(℃) | |
비교예 1 | In | 155.97 | 157.05 | 1.08 |
실시예 1 | Sn20In1Ag0.1Cu | 178.77 | 192.76 | 13.99 |
실시예 2 | Sn20In1Ag0.56Cu | 175.99 | 190.02 | 14.03 |
실시예 3 | Sn20In2.5Ag0.26Cu | 171.84 | 186.07 | 14.23 |
실시예 4 | Sn20In2.8Ag0.1Cu | 169.17 | 187.15 | 17.98 |
실시예 5 | Sn20In2.8Ag0.56Cu | 176.46 | 186.31 | 9.85 |
솔더 온도(℃) |
비교예 1 (In) |
실시예 3 (Sn20In2.5Ag0.26Cu) |
실시예 5 (Sn20In2.8Ag0.56Cu) |
200 | 0.71 | 0.89 | 0.62 |
210 | 0.54 | 0.78 | 0.59 |
220 | 0.48 | 0.61 | 0.46 |
250 | 0.26 | 0.38 | 0.36 |
실시예 1 Sn20In1Ag0.1Cu |
실시예 2 Sn20In1Ag0.56Cu |
실시예 4 Sn20In2.8Ag0.1Cu |
실시예3 Sn20In2.5Ag0.26Cu |
|||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | |
외관 | 양호 | 양호 | 양호 | 양호 | 양호 | 양호 | 양호 | 양호 | 양호 | 양호 |
접합률 | 99.90 | 99.97 | 99.25 | 99.94 | 99.55 | 99.85 | 99.73 | 99.39 | 99.58 | 99.88 |
평균 | 99.71 | 99.78 | 99.57 |
Claims (12)
- 스퍼터링 타겟(Sputtering target)과 배킹 플레이트(backing plate)를 접합하는 접합제에 있어서,In 10~20중량%, Ag 1~3중량%, Cu 0.1~1중량%를 함유하고, 그 나머지는 Sn인 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 1항에 있어서,원재료로서 Sn-Ag-Cu계 합금(SAC 합금)과 In을 사용하는 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 2항에 있어서,상기 원재료는 잉곳(Ingot)과 과립(granular) 중 어느 하나의 형태인 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 3항에 있어서,상기 과립 형태의 원재료는 평균 직경이 5mm ~ 30mm인 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 1항에 있어서,상기 스퍼터링 타겟이 Cu 또는 Cu합금인 경우에,상기 스퍼터링 타겟과 스퍼터링 타겟 접합제의 접합계면에 Cu6Sn5 금속간 화합물이 생성되는 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 1항에 있어서,액상선 온도(liquidus temperature)와 고상선 온도(solidus temperature)의 차이가 20℃ 이하인 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 1항에 있어서,고상선 온도는 160 ~ 200℃인 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 1항에 있어서,연신율이 23% ~ 27% 인 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 1항에 있어서,웨팅 밸런스 테스터(wetting balance tester, RESCA SAT 5000)를 이용하여 200℃에서 측정한 제로 크로스 타임(zero cross time) 값이 0.5 ~ 1 초인 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 1항에 있어서,비커스 경도가 10 ~ 18 Hv 인 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 1항에 있어서,상기 스퍼터링 타겟 접합제에 의해서 형성된 접합부의 인장 강도가 100kgf/㎠ 이상인 것을 특징으로 하는 스퍼터링 타겟 접합제.
- 제 1항에 있어서,초음파 탐상기를 이용하여 측정한, 상기 스퍼터링 타겟 접합제와 상기 스퍼터링 타겟 및 배킹 플레이트와의 접합률이 95% 이상인 것을 특징으로 하는 스퍼터링 타겟 접합제.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080120417A KR101056059B1 (ko) | 2008-12-01 | 2008-12-01 | 타겟 접합제 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020080120417A KR101056059B1 (ko) | 2008-12-01 | 2008-12-01 | 타겟 접합제 |
Publications (2)
Publication Number | Publication Date |
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KR20100062016A KR20100062016A (ko) | 2010-06-10 |
KR101056059B1 true KR101056059B1 (ko) | 2011-08-10 |
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KR1020080120417A KR101056059B1 (ko) | 2008-12-01 | 2008-12-01 | 타겟 접합제 |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101312412B1 (ko) * | 2011-07-04 | 2013-09-27 | 삼성코닝정밀소재 주식회사 | 스퍼터링 타겟 제조방법 |
CN103146953B (zh) * | 2013-03-22 | 2015-01-07 | 天津百瑞杰焊接材料有限公司 | 185℃保险丝熔断芯无铅低温合金及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060118413A1 (en) | 2002-07-25 | 2006-06-08 | Shigeru Taniguchi | Target and manufacturing method thereof |
KR20060101297A (ko) * | 2005-03-17 | 2006-09-22 | 미츠이 긴조쿠 고교 가부시키가이샤 | 스퍼터링 타겟 제조용 땜납합금 및 이를 이용한 스퍼터링타겟 |
JP2007021580A (ja) | 2005-06-15 | 2007-02-01 | Mitsui Mining & Smelting Co Ltd | スパッタリングターゲット製造用はんだ合金およびこれを用いたスパッタリングターゲット |
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- 2008-12-01 KR KR1020080120417A patent/KR101056059B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060118413A1 (en) | 2002-07-25 | 2006-06-08 | Shigeru Taniguchi | Target and manufacturing method thereof |
KR20060101297A (ko) * | 2005-03-17 | 2006-09-22 | 미츠이 긴조쿠 고교 가부시키가이샤 | 스퍼터링 타겟 제조용 땜납합금 및 이를 이용한 스퍼터링타겟 |
KR100875125B1 (ko) * | 2005-03-17 | 2008-12-22 | 미츠이 긴조쿠 고교 가부시키가이샤 | 스퍼터링 타겟 제조용 땜납합금 및 이를 이용한 스퍼터링타겟 |
JP2007021580A (ja) | 2005-06-15 | 2007-02-01 | Mitsui Mining & Smelting Co Ltd | スパッタリングターゲット製造用はんだ合金およびこれを用いたスパッタリングターゲット |
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Publication number | Publication date |
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KR20100062016A (ko) | 2010-06-10 |
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