KR101029479B1 - 벡터 그래픽 데이터 처리 방법 및 묘화 장치 - Google Patents

벡터 그래픽 데이터 처리 방법 및 묘화 장치 Download PDF

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KR101029479B1
KR101029479B1 KR20040070220A KR20040070220A KR101029479B1 KR 101029479 B1 KR101029479 B1 KR 101029479B1 KR 20040070220 A KR20040070220 A KR 20040070220A KR 20040070220 A KR20040070220 A KR 20040070220A KR 101029479 B1 KR101029479 B1 KR 101029479B1
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KR20050024619A (ko
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미요시히사지
오쿠야마다카시
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가부시키가이샤 오크세이사쿠쇼
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T9/00—Image coding
    • G06T9/20—Contour coding, e.g. using detection of edges
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T5/00—Image enhancement or restoration
    • G06T5/20—Image enhancement or restoration using local operators
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N19/00—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals
    • H04N19/90—Methods or arrangements for coding, decoding, compressing or decompressing digital video signals using coding techniques not provided for in groups H04N19/10-H04N19/85, e.g. fractals
    • H04N19/93—Run-length coding

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  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Image Generation (AREA)
  • Compression Of Band Width Or Redundancy In Fax (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
KR20040070220A 2003-09-05 2004-09-03 벡터 그래픽 데이터 처리 방법 및 묘화 장치 Expired - Fee Related KR101029479B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00314009 2003-09-05
JP2003314009A JP4085204B2 (ja) 2003-09-05 2003-09-05 描画用ベクタデータの処理方法及び描画装置

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KR20050024619A KR20050024619A (ko) 2005-03-10
KR101029479B1 true KR101029479B1 (ko) 2011-04-18

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KR20040070220A Expired - Fee Related KR101029479B1 (ko) 2003-09-05 2004-09-03 벡터 그래픽 데이터 처리 방법 및 묘화 장치

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US (1) US7502510B2 (https=)
JP (1) JP4085204B2 (https=)
KR (1) KR101029479B1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4621618B2 (ja) * 2006-03-28 2011-01-26 株式会社東芝 図形描画装置、図形描画方法、およびプログラム
KR101392166B1 (ko) * 2006-12-18 2014-05-08 삼성전자주식회사 휴대용 디스플레이 장치의 이미지 편집 방법, 편집 이미지생성 방법 및 편집된 이미지 저장 방법 및 장치
US20090193067A1 (en) * 2008-01-30 2009-07-30 Microsoft Corporation Server-based recalculation of vector graphics
US7982749B2 (en) * 2008-01-31 2011-07-19 Microsoft Corporation Server-based rasterization of vector graphics
KR101039132B1 (ko) * 2008-11-11 2011-06-03 엠진 (주) 2차원 벡터 그래픽 처리를 위한 라스터라이저 및 그 방법
KR20120090354A (ko) 2011-02-07 2012-08-17 삼성전자주식회사 2차원 벡터 그래픽스를 위한 에지 관리 유닛과 그것을 포함하는 그래픽 처리장치 및 그 방법
JP6150560B2 (ja) * 2013-03-01 2017-06-21 株式会社Ｓｃｒｅｅｎホールディングス データ変換方法、描画システムおよびプログラム
JP6175253B2 (ja) * 2013-03-06 2017-08-02 株式会社Ｓｃｒｅｅｎホールディングス データ変換方法、描画システムおよびプログラム
JP6175997B2 (ja) 2013-08-30 2017-08-09 株式会社ソシオネクスト 画像処理方法、および画像処理装置
JP6066212B2 (ja) * 2014-03-13 2017-01-25 コニカミノルタ株式会社 画像形成装置
US10248371B1 (en) * 2018-06-08 2019-04-02 Ricoh Company, Ltd. Print job order optimization mechanism
CN114089604B (zh) * 2021-11-02 2024-06-21 杭州新诺微电子有限公司 一种阵列图形绘制方法及系统

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08305861A (ja) * 1995-04-28 1996-11-22 Meidensha Corp 輪郭ベクトル生成方法
JPH09171564A (ja) * 1995-12-20 1997-06-30 Fuji Xerox Co Ltd 描画装置
JPH10149436A (ja) 1996-09-20 1998-06-02 Nippon Steel Corp ラスターデータ管理方式及びラスターデータ編集装置
JP2003016464A (ja) 2001-04-24 2003-01-17 Canon Inc 画像処理装置及び画像処理方法

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
JP3645614B2 (ja) 1995-03-17 2005-05-11 ペンタックス株式会社 作画データの最適化手法
JPH09323180A (ja) * 1996-06-04 1997-12-16 Asahi Optical Co Ltd スケーリング補正機能を持つレーザ描画装置
US6100915A (en) * 1996-08-28 2000-08-08 Asahi Kogaku Kogyo Kabushiki Kaisha Laser drawing apparatus
JP3975626B2 (ja) * 1999-11-11 2007-09-12 株式会社オーク製作所 レーザ描画装置
US7050979B2 (en) * 2001-01-24 2006-05-23 Matsushita Electric Industrial Co., Ltd. Apparatus and method for converting a spoken language to a second language
US6493064B2 (en) * 2001-02-28 2002-12-10 Creo Il, Ltd. Method and apparatus for registration control in production by imaging
US6593066B2 (en) * 2001-02-28 2003-07-15 Creo Il. Ltd. Method and apparatus for printing patterns on substrates
JP5144863B2 (ja) * 2001-06-29 2013-02-13 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
JP4728536B2 (ja) * 2001-07-05 2011-07-20 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
JP4273291B2 (ja) 2001-08-17 2009-06-03 株式会社オーク製作所 多重露光描画装置および多重露光描画方法
TWI291729B (en) * 2001-11-22 2007-12-21 Semiconductor Energy Lab A semiconductor fabricating apparatus
US6979605B2 (en) * 2001-11-30 2005-12-27 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08305861A (ja) * 1995-04-28 1996-11-22 Meidensha Corp 輪郭ベクトル生成方法
JPH09171564A (ja) * 1995-12-20 1997-06-30 Fuji Xerox Co Ltd 描画装置
JPH10149436A (ja) 1996-09-20 1998-06-02 Nippon Steel Corp ラスターデータ管理方式及びラスターデータ編集装置
JP2003016464A (ja) 2001-04-24 2003-01-17 Canon Inc 画像処理装置及び画像処理方法

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US20050065623A1 (en) 2005-03-24
KR20050024619A (ko) 2005-03-10
JP2005084798A (ja) 2005-03-31
JP4085204B2 (ja) 2008-05-14
US7502510B2 (en) 2009-03-10

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