KR100997882B1 - 웨이퍼 패턴 검사방법 - Google Patents
웨이퍼 패턴 검사방법 Download PDFInfo
- Publication number
- KR100997882B1 KR100997882B1 KR1020080088352A KR20080088352A KR100997882B1 KR 100997882 B1 KR100997882 B1 KR 100997882B1 KR 1020080088352 A KR1020080088352 A KR 1020080088352A KR 20080088352 A KR20080088352 A KR 20080088352A KR 100997882 B1 KR100997882 B1 KR 100997882B1
- Authority
- KR
- South Korea
- Prior art keywords
- pattern
- inspection
- image data
- wafer
- target pattern
- Prior art date
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
- G01N2021/95615—Inspecting patterns on the surface of objects using a comparative method with stored comparision signal
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
Claims (2)
- 카메라(20)를 이용하여 웨이퍼(1)에 형성된 검사대상 패턴을 촬영하는 1차 촬영단계와;촬영된 검사대상 패턴의 영상데이터(B)와 메모리(30)에 저장된 표준패턴의 영상데이터(A)를 비교하는 1차 비교단계와;상기 검사대상 패턴에 인접된 비교대상 패턴을 촬영하는 2차 촬영단계와;상기 2차 촬영단계에서 촬영된 비교대상 패턴의 영상데이터(C)와 상기 1차 비교단계에서 결함(D)이 인식되어 분류된 결함데이터(E)를 상호 비교하여, 상기 결함(D)과 동일한 결함이 상기 비교대상 패턴의 영상데이터(C)의 동일한 위치에 존재하면 상기 검사대상 패턴은 결함이 없는 정상 패턴인 것으로 판단하며, 상기 결함(D)과 동일한 결함이 상기 비교대상 패턴의 영상데이터(C)의 동일한 위치에 존재하지 않으면 상기 검사대상 패턴은 결함이 있는 것으로 판단하는 2차 비교단계;를 포함하는 것을 특징으로 하는 웨이퍼 패턴 검사방법.
- 제 1항에 있어서, 상기 패턴 검사단계에서 상기 검사대상 패턴의 다음번에 검사할 패턴(1a)을 비교대상 패턴으로 설정하는 것을 특징으로 하는 웨이퍼 패턴 검사방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080088352A KR100997882B1 (ko) | 2008-09-08 | 2008-09-08 | 웨이퍼 패턴 검사방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020080088352A KR100997882B1 (ko) | 2008-09-08 | 2008-09-08 | 웨이퍼 패턴 검사방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100029532A KR20100029532A (ko) | 2010-03-17 |
KR100997882B1 true KR100997882B1 (ko) | 2010-12-02 |
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ID=42179740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020080088352A KR100997882B1 (ko) | 2008-09-08 | 2008-09-08 | 웨이퍼 패턴 검사방법 |
Country Status (1)
Country | Link |
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KR (1) | KR100997882B1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9599575B2 (en) * | 2012-02-07 | 2017-03-21 | Applied Materials Israel, Ltd. | System, a method and a computer program product for CAD-based registration |
WO2018048843A1 (en) * | 2016-09-08 | 2018-03-15 | Corning Incorporated | Optical inspection systems and methods for detecting surface defects in a transparent sheet |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11166901A (ja) | 1997-12-03 | 1999-06-22 | Nikon Corp | 検査装置及び方法 |
JP2001281161A (ja) | 2000-03-30 | 2001-10-10 | Toshiba Corp | 欠陥検査装置及び検査方法 |
KR100457803B1 (ko) | 1994-12-08 | 2005-04-20 | 텐코 인스트루먼츠 | 표면검사시스템 |
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2008
- 2008-09-08 KR KR1020080088352A patent/KR100997882B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100457803B1 (ko) | 1994-12-08 | 2005-04-20 | 텐코 인스트루먼츠 | 표면검사시스템 |
JPH11166901A (ja) | 1997-12-03 | 1999-06-22 | Nikon Corp | 検査装置及び方法 |
JP2001281161A (ja) | 2000-03-30 | 2001-10-10 | Toshiba Corp | 欠陥検査装置及び検査方法 |
Also Published As
Publication number | Publication date |
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KR20100029532A (ko) | 2010-03-17 |
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