KR100991574B1 - 위치 검출기, 위치 검출 방법, 노광 장치 및 디바이스 제조방법 - Google Patents

위치 검출기, 위치 검출 방법, 노광 장치 및 디바이스 제조방법 Download PDF

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Publication number
KR100991574B1
KR100991574B1 KR1020080108128A KR20080108128A KR100991574B1 KR 100991574 B1 KR100991574 B1 KR 100991574B1 KR 1020080108128 A KR1020080108128 A KR 1020080108128A KR 20080108128 A KR20080108128 A KR 20080108128A KR 100991574 B1 KR100991574 B1 KR 100991574B1
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South Korea
Prior art keywords
template
mark
pattern
pseudo pattern
pseudo
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KR1020080108128A
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English (en)
Korean (ko)
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KR20090045133A (ko
Inventor
노조무 하야시
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20090045133A publication Critical patent/KR20090045133A/ko
Application granted granted Critical
Publication of KR100991574B1 publication Critical patent/KR100991574B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/24—Aligning, centring, orientation detection or correction of the image
    • G06V10/245—Aligning, centring, orientation detection or correction of the image by locating a pattern; Special marks for positioning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020080108128A 2007-10-31 2008-10-31 위치 검출기, 위치 검출 방법, 노광 장치 및 디바이스 제조방법 Expired - Fee Related KR100991574B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2007-283791 2007-10-31
JP2007283791A JP5351409B2 (ja) 2007-10-31 2007-10-31 位置検出器、テンプレートを得る方法、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20090045133A KR20090045133A (ko) 2009-05-07
KR100991574B1 true KR100991574B1 (ko) 2010-11-04

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KR1020080108128A Expired - Fee Related KR100991574B1 (ko) 2007-10-31 2008-10-31 위치 검출기, 위치 검출 방법, 노광 장치 및 디바이스 제조방법

Country Status (4)

Country Link
US (1) US8369604B2 (https=)
JP (1) JP5351409B2 (https=)
KR (1) KR100991574B1 (https=)
TW (1) TWI408330B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5650060B2 (ja) * 2011-06-03 2015-01-07 日本電信電話株式会社 画像追跡装置及び画像追跡方法
JP6088803B2 (ja) * 2012-11-16 2017-03-01 株式会社日立ハイテクノロジーズ 画像処理装置、自己組織化リソグラフィ技術によるパターン生成方法、及びコンピュータープログラム
US10438098B2 (en) * 2017-05-19 2019-10-08 Hand Held Products, Inc. High-speed OCR decode using depleted centerlines
CN110517945A (zh) * 2018-05-21 2019-11-29 上海新微技术研发中心有限公司 半导体器件的制造方法及半导体器件
JP7701216B2 (ja) * 2021-08-27 2025-07-01 株式会社Ｓｃｒｅｅｎホールディングス 描画システム、描画方法およびプログラム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005116561A (ja) 2003-10-02 2005-04-28 Nikon Corp テンプレート作成方法及び装置、位置検出方法及び装置、並びに露光方法及び装置
JP2006214816A (ja) 2005-02-02 2006-08-17 Nikon Corp 半導体検査装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5859923A (en) * 1992-12-29 1999-01-12 Cognex Corporation Mark quality inspection apparatus and method
JP3634558B2 (ja) 1996-06-13 2005-03-30 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JP3569626B2 (ja) * 1998-05-11 2004-09-22 日本電信電話株式会社 図形抽出方法及びそのプログラムを記録した記録媒体
JP2000269700A (ja) * 1999-03-16 2000-09-29 Matsushita Electric Ind Co Ltd パターンマッチング認識方法
US7130466B2 (en) * 2000-12-21 2006-10-31 Cobion Ag System and method for compiling images from a database and comparing the compiled images with known images
JP4165871B2 (ja) 2002-03-15 2008-10-15 キヤノン株式会社 位置検出方法、位置検出装置及び露光装置
EP1482375B1 (en) 2003-05-30 2014-09-17 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7580560B2 (en) * 2005-07-18 2009-08-25 Mitutoyo Corporation System and method for fast template matching by adaptive template decomposition
JP2007094689A (ja) * 2005-09-28 2007-04-12 Sharp Corp 画像照合装置、画像照合方法、画像照合プログラムおよび画像照合プログラムを記録したコンピュータ読取り可能な記録媒体
JP4908867B2 (ja) * 2005-11-01 2012-04-04 株式会社日立ソリューションズ 地理画像処理システム

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005116561A (ja) 2003-10-02 2005-04-28 Nikon Corp テンプレート作成方法及び装置、位置検出方法及び装置、並びに露光方法及び装置
JP2006214816A (ja) 2005-02-02 2006-08-17 Nikon Corp 半導体検査装置

Also Published As

Publication number Publication date
US20090110264A1 (en) 2009-04-30
US8369604B2 (en) 2013-02-05
JP5351409B2 (ja) 2013-11-27
KR20090045133A (ko) 2009-05-07
TWI408330B (zh) 2013-09-11
TW200938801A (en) 2009-09-16
JP2009109413A (ja) 2009-05-21

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