KR100985377B1 - 화학적 증기침투에 의한 기판의 치밀화 방법 및 이의 장치 - Google Patents

화학적 증기침투에 의한 기판의 치밀화 방법 및 이의 장치 Download PDF

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KR100985377B1
KR100985377B1 KR1020037014158A KR20037014158A KR100985377B1 KR 100985377 B1 KR100985377 B1 KR 100985377B1 KR 1020037014158 A KR1020037014158 A KR 1020037014158A KR 20037014158 A KR20037014158 A KR 20037014158A KR 100985377 B1 KR100985377 B1 KR 100985377B1
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South Korea
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chamber
duct
reaction gas
substrate
loading
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KR20040095145A (ko
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브뤼노 베르나르
스테판 구쟈르
세바스뗑 베르뜨랑
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에스엔에쎄엠아 프로폴지옹 솔리드
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/71—Ceramic products containing macroscopic reinforcing agents
    • C04B35/78—Ceramic products containing macroscopic reinforcing agents containing non-metallic materials
    • C04B35/80—Fibres, filaments, whiskers, platelets, or the like
    • C04B35/83—Carbon fibres in a carbon matrix
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/10—Chemical vapor infiltration, i.e. CVI

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Braking Arrangements (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Reinforced Plastic Materials (AREA)
KR1020037014158A 2002-01-15 2003-01-14 화학적 증기침투에 의한 기판의 치밀화 방법 및 이의 장치 Expired - Fee Related KR100985377B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0200412A FR2834713B1 (fr) 2002-01-15 2002-01-15 Procede et installation pour la densification de substrats par infiltration chimique en phase vapeur
FR02/00412 2002-01-15
PCT/FR2003/000097 WO2003060183A1 (fr) 2002-01-15 2003-01-14 Procede et installation pour la densification de substrats par infiltration chimique en phase vapeur

Publications (2)

Publication Number Publication Date
KR20040095145A KR20040095145A (ko) 2004-11-12
KR100985377B1 true KR100985377B1 (ko) 2010-10-04

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KR1020037014158A Expired - Fee Related KR100985377B1 (ko) 2002-01-15 2003-01-14 화학적 증기침투에 의한 기판의 치밀화 방법 및 이의 장치

Country Status (13)

Country Link
US (1) US7691440B2 (enExample)
EP (1) EP1466031B1 (enExample)
JP (1) JP4495970B2 (enExample)
KR (1) KR100985377B1 (enExample)
CN (1) CN1244714C (enExample)
AT (1) ATE488616T1 (enExample)
AU (1) AU2003216719A1 (enExample)
CA (1) CA2445501A1 (enExample)
DE (1) DE60334970D1 (enExample)
FR (1) FR2834713B1 (enExample)
RU (1) RU2293795C2 (enExample)
UA (1) UA76987C2 (enExample)
WO (1) WO2003060183A1 (enExample)

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FR2881145B1 (fr) * 2005-01-24 2007-11-23 Snecma Propulsion Solide Sa Procede d'infiltration chimique en phase gazeuse pour la densification de substrats poreux par du carbone pyrolytique
FR2882064B1 (fr) * 2005-02-17 2007-05-11 Snecma Propulsion Solide Sa Procede de densification de substrats poreux minces par infiltration chimique en phase vapeur et dispositif de chargement de tels substrats
CN1304912C (zh) * 2005-02-21 2007-03-14 西北工业大学 碳/碳复合材料热梯度化学气相渗透过程温度自动控制器
CN101671189B (zh) * 2009-09-23 2012-07-18 北京航空航天大学 国产炭纤维快速定向渗积制备高性能炭基复合材料的方法
CN102953049B (zh) * 2011-08-25 2015-07-08 沈阳金研机床工具有限公司 化学气相沉积法涂层装置
FR2980486B1 (fr) 2011-09-28 2013-10-11 Snecma Propulsion Solide Dispositif de chargement pour la densification par infiltration chimique en phase vapeur en flux dirige de substrats poreux de forme tridimensionnelle
FR2993044B1 (fr) * 2012-07-04 2014-08-08 Herakles Dispositif de chargement et installation pour la densification de preformes poreuses tronconiques et empilables
FR2993555B1 (fr) 2012-07-19 2015-02-20 Herakles Installation d'infiltration chimique en phase vapeur a haute capacite de chargement
CN102964144B (zh) * 2012-11-19 2014-04-02 西北工业大学 一种提高碳/碳复合材料表面涂层抗氧化性能的方法
FR3004732B1 (fr) * 2013-04-18 2015-05-08 Herakles Outillage de maintien, chargement et installation pour la densification de preformes poreuses de revolution
KR101589965B1 (ko) * 2014-02-26 2016-02-05 (주) 데크카본 밀도화 장비
FR3018526B1 (fr) * 2014-03-14 2021-06-11 Herakles Installation de densification cvi comprenant une zone de prechauffage a forte capacite
US9834842B2 (en) 2015-05-15 2017-12-05 Goodrich Corporation Slotted seal plates and slotted preforms for chemical vapor deposition densification
TWI624554B (zh) * 2015-08-21 2018-05-21 弗里松股份有限公司 蒸發源
MY190445A (en) 2015-08-21 2022-04-21 Flisom Ag Homogeneous linear evaporation source
US10407769B2 (en) * 2016-03-18 2019-09-10 Goodrich Corporation Method and apparatus for decreasing the radial temperature gradient in CVI/CVD furnaces
CN108088247B (zh) * 2017-12-28 2019-08-13 德淮半导体有限公司 炉管装置
US10731252B2 (en) * 2018-05-25 2020-08-04 Rolls-Royce High Temperature Composites Apparatus and method for coating specimens
FR3083229B1 (fr) 2018-06-27 2020-09-11 Safran Ceram Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux
FR3084672B1 (fr) 2018-08-03 2020-10-16 Safran Ceram Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux
FR3084892B1 (fr) * 2018-08-10 2020-11-06 Safran Ceram Procede de densification par infiltration chimique en phase gazeuse de substrats annulaire poreux
FR3095213B1 (fr) * 2019-04-19 2022-12-23 Safran Ceram Installation de densification CVI
FR3129954B1 (fr) * 2021-12-06 2023-12-15 Safran Ceram Installation d’infiltration chimique en phase gazeuse à double chambre de réaction
US12000046B1 (en) * 2021-12-29 2024-06-04 Rolls-Royce High Temperature Composites, Inc. Load assemblies for loading parts in a furnace
US12078417B1 (en) 2021-12-29 2024-09-03 Rolls-Royce High Temperature Composites, Inc. Load assemblies for loading parts in a furnace
US11932941B1 (en) 2021-12-29 2024-03-19 Rolls-Royce High Temperature Composites, Inc. Load assemblies for loading parts in a furnace
FR3132717B1 (fr) 2022-02-16 2024-02-16 Safran Landing Systems Outillage des plateaux multipiles pour un flux semi-forcé
FR3132718A1 (fr) * 2022-02-16 2023-08-18 Safran Landing Systems Procédé de densification par infiltration chimique en phase gazeuse avec des plateaux monopiles pour un flux semi-forcé
US12410520B2 (en) 2022-09-30 2025-09-09 Rtx Corporation Stacking tool fixture for forced flow chemical vapor infiltration
WO2025171270A1 (en) * 2024-02-09 2025-08-14 Rtx Corporation Chemical vapor infiltration gas inlet injector plate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4580524A (en) 1984-09-07 1986-04-08 The United States Of America As Represented By The United States Department Of Energy Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition
JP2001503725A (ja) * 1996-10-18 2001-03-21 ソシエテ・ナシオナル・デテユード・エ・ドウ・コンストリユクシオン・ドウ・モトール・ダヴイアシオン、“エス．エヌ．ウ．セ．エム．アー．” リング形状のスタックに配列した基体の温度勾配下における気相下での緻密化

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RU1580873C (ru) * 1988-05-23 1994-11-30 Колмакова Тамара Павловна Устройство для осаждения слоев из газовой фазы
JP2839621B2 (ja) * 1990-02-13 1998-12-16 株式会社東芝 半導体製造用熱拡散装置
US6022414A (en) * 1994-07-18 2000-02-08 Semiconductor Equipment Group, Llc Single body injector and method for delivering gases to a surface
US5480678A (en) 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes
ES2125058T3 (es) * 1994-11-16 1999-02-16 Goodrich Co B F Producto, procedimiento y aparato de infiltracion/deposito quimico en fase vapor con gradiente de presion.
FR2733254B1 (fr) * 1995-04-18 1997-07-18 Europ Propulsion Procede d'infiltration chimique en phase vapeur pour la densification de substrats poreux disposes en piles annulaires
KR100360401B1 (ko) * 2000-03-17 2002-11-13 삼성전자 주식회사 슬릿형 공정가스 인입부와 다공구조의 폐가스 배출부를포함하는 공정튜브 및 반도체 소자 제조장치
FR2818291B1 (fr) * 2000-12-19 2003-11-07 Snecma Moteurs Densification de substrats poreux creux par infiltration chimique en phase vapeur
US6953605B2 (en) * 2001-12-26 2005-10-11 Messier-Bugatti Method for densifying porous substrates by chemical vapour infiltration with preheated gas

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4580524A (en) 1984-09-07 1986-04-08 The United States Of America As Represented By The United States Department Of Energy Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition
JP2001503725A (ja) * 1996-10-18 2001-03-21 ソシエテ・ナシオナル・デテユード・エ・ドウ・コンストリユクシオン・ドウ・モトール・ダヴイアシオン、“エス．エヌ．ウ．セ．エム．アー．” リング形状のスタックに配列した基体の温度勾配下における気相下での緻密化

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Publication number Publication date
AU2003216719A1 (en) 2003-07-30
EP1466031A1 (fr) 2004-10-13
FR2834713A1 (fr) 2003-07-18
US20040237898A1 (en) 2004-12-02
JP4495970B2 (ja) 2010-07-07
FR2834713B1 (fr) 2004-04-02
CN1511198A (zh) 2004-07-07
US7691440B2 (en) 2010-04-06
UA76987C2 (en) 2006-10-16
CN1244714C (zh) 2006-03-08
KR20040095145A (ko) 2004-11-12
EP1466031B1 (fr) 2010-11-17
WO2003060183A1 (fr) 2003-07-24
CA2445501A1 (en) 2003-07-24
JP2005514524A (ja) 2005-05-19
RU2003131510A (ru) 2005-04-20
DE60334970D1 (de) 2010-12-30
RU2293795C2 (ru) 2007-02-20
ATE488616T1 (de) 2010-12-15

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