FR3129954B1 - Installation d’infiltration chimique en phase gazeuse à double chambre de réaction - Google Patents
Installation d’infiltration chimique en phase gazeuse à double chambre de réaction Download PDFInfo
- Publication number
- FR3129954B1 FR3129954B1 FR2112999A FR2112999A FR3129954B1 FR 3129954 B1 FR3129954 B1 FR 3129954B1 FR 2112999 A FR2112999 A FR 2112999A FR 2112999 A FR2112999 A FR 2112999A FR 3129954 B1 FR3129954 B1 FR 3129954B1
- Authority
- FR
- France
- Prior art keywords
- gas
- reaction chamber
- phase chemical
- gas phase
- chemical infiltration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001764 infiltration Methods 0.000 title abstract 3
- 230000008595 infiltration Effects 0.000 title abstract 3
- 238000009434 installation Methods 0.000 abstract 2
- 238000005234 chemical deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/71—Ceramic products containing macroscopic reinforcing agents
- C04B35/78—Ceramic products containing macroscopic reinforcing agents containing non-metallic materials
- C04B35/80—Fibres, filaments, whiskers, platelets, or the like
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/71—Ceramic products containing macroscopic reinforcing agents
- C04B35/78—Ceramic products containing macroscopic reinforcing agents containing non-metallic materials
- C04B35/80—Fibres, filaments, whiskers, platelets, or the like
- C04B35/83—Carbon fibres in a carbon matrix
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/60—Aspects relating to the preparation, properties or mechanical treatment of green bodies or pre-forms
- C04B2235/614—Gas infiltration of green bodies or pre-forms
Abstract
Installation d’infiltration chimique en phase gazeuse à double chambre de réaction Une installation d’infiltration chimique en phase gazeuse ou de dépôt chimique en phase gazeuse (100) comprend une enceinte (110) renfermant une première chambre de réaction (120) comprenant une première entrée de gaz (122), une première chambre de préchauffage (123), une première zone de chargement (124) et une première sortie de gaz (125), l’enceinte (110) étant reliée à au moins une conduite d’alimentation en gaz (150) et à au moins une conduite d’évacuation de gaz. L’enceinte (110) renferme en outre une deuxième chambre de réaction (130) comprenant une deuxième entrée de gaz (132), une deuxième chambre de préchauffage (133), une deuxième zone de chargement (134) et une deuxième sortie de gaz (135). Les première et deuxième entrées de gaz (122, 132) sont indépendantes l’une de l’autre. Figure pour l’abrégé : Fig. 1.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR2112999A FR3129954B1 (fr) | 2021-12-06 | 2021-12-06 | Installation d’infiltration chimique en phase gazeuse à double chambre de réaction |
PCT/FR2022/052200 WO2023105139A1 (fr) | 2021-12-06 | 2022-11-30 | Installation d'infiltration chimique en phase gazeuse a double chambre de reaction |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR2112999 | 2021-12-06 | ||
FR2112999A FR3129954B1 (fr) | 2021-12-06 | 2021-12-06 | Installation d’infiltration chimique en phase gazeuse à double chambre de réaction |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3129954A1 FR3129954A1 (fr) | 2023-06-09 |
FR3129954B1 true FR3129954B1 (fr) | 2023-12-15 |
Family
ID=80999616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR2112999A Active FR3129954B1 (fr) | 2021-12-06 | 2021-12-06 | Installation d’infiltration chimique en phase gazeuse à double chambre de réaction |
Country Status (2)
Country | Link |
---|---|
FR (1) | FR3129954B1 (fr) |
WO (1) | WO2023105139A1 (fr) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2733254B1 (fr) | 1995-04-18 | 1997-07-18 | Europ Propulsion | Procede d'infiltration chimique en phase vapeur pour la densification de substrats poreux disposes en piles annulaires |
FR2754813B1 (fr) * | 1996-10-18 | 1999-01-15 | Europ Propulsion | Densification de substrats poreux disposes en piles annulaires par infiltration chimique en phase vapeur a gradient de temperature |
FR2834713B1 (fr) * | 2002-01-15 | 2004-04-02 | Snecma Moteurs | Procede et installation pour la densification de substrats par infiltration chimique en phase vapeur |
US20100310769A1 (en) * | 2009-06-07 | 2010-12-09 | Veeco Compound Semiconductor, Inc. | Continuous Feed Chemical Vapor Deposition System |
US10837109B2 (en) * | 2018-11-15 | 2020-11-17 | United Technologies Corporation | CVI/CVD matrix densification process and apparatus |
-
2021
- 2021-12-06 FR FR2112999A patent/FR3129954B1/fr active Active
-
2022
- 2022-11-30 WO PCT/FR2022/052200 patent/WO2023105139A1/fr unknown
Also Published As
Publication number | Publication date |
---|---|
WO2023105139A1 (fr) | 2023-06-15 |
FR3129954A1 (fr) | 2023-06-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI625487B (zh) | 用於原子層沉積及化學氣相沉積反應器之使用點閥箱 | |
JP5280861B2 (ja) | 高温aldインレットマニホールド | |
MX2007009897A (es) | Metodo para la densificacion de sustratos porosos delgados por medio de infiltracion quimica de fase de vapor y dispositivo para cargar tales sustratos. | |
KR19990085442A (ko) | 연속기체분사에 의한 반도체 박막증착장치 | |
US7568495B2 (en) | Chemical delivery apparatus for CVD or ALD | |
TW357256B (en) | Method and apparatus for reducing deposition of material in the exhaust pipe of a reaction furnace | |
KR20010042196A (ko) | 고온 다층 합금 히터 어셈블리 및 관련 방법 | |
KR20200003098A (ko) | 밸브를 가진 장치 및 작동 방법 | |
TW336333B (en) | A substrate processing apparatus | |
FR3129954B1 (fr) | Installation d’infiltration chimique en phase gazeuse à double chambre de réaction | |
FR2379748A1 (fr) | Mecanisme d'etancheite pour joint pivotant | |
WO2002095788A2 (fr) | Commande de pression compacte independante et isolation sous vide pour chambre de reaction plasmatique a pompe turbomoleculaire | |
CN108022821A (zh) | 等离子体处理装置及气体通道的耐腐蚀防护方法 | |
US6702901B2 (en) | Chamber for chemical vapor deposition | |
KR20010049342A (ko) | 적어도 하나의 증기물질을 진공실 외벽을 통과하여 다른진공실로 이송시키는 방법 및 그 방법의 실시를 위한장치와 그의 이용 | |
KR102324637B1 (ko) | 균일한 유체를 공급하는 배관 장치 | |
JP2000252273A (ja) | 半導体製造装置 | |
FR3101078B1 (fr) | Outillage de conformation et installation pour l’infiltration chimique en phase gazeuse de préformes fibreuses | |
KR20050013618A (ko) | 기판 처리 장치 | |
FI20195335A1 (en) | Gas distribution unit in connection with an ALD reactor | |
EP4023989A1 (fr) | Canalisation de transport de fluides à haute température dans laquelle est installé un appareil d'échange de chaleur, appareil d'échange de chaleur approprié et procédé d'échange de chaleur | |
CN117244474A (zh) | 一种特气快速接入装置及其使用方法 | |
KR20040104040A (ko) | 화학기상증착 장치의 배기시스템 | |
WO2024031118A3 (fr) | Dispositif de préparation d'un plasma | |
ES2146077T3 (es) | Fondo de insuflado de gases para recipientes metalurgicos. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 2 |
|
PLSC | Publication of the preliminary search report |
Effective date: 20230609 |
|
PLFP | Fee payment |
Year of fee payment: 3 |