KR100948109B1 - 발광 다이오드 디바이스 - Google Patents
발광 다이오드 디바이스 Download PDFInfo
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- KR100948109B1 KR100948109B1 KR1020087000699A KR20087000699A KR100948109B1 KR 100948109 B1 KR100948109 B1 KR 100948109B1 KR 1020087000699 A KR1020087000699 A KR 1020087000699A KR 20087000699 A KR20087000699 A KR 20087000699A KR 100948109 B1 KR100948109 B1 KR 100948109B1
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- light
- thin film
- phosphor
- light emitting
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- 238000006243 chemical reaction Methods 0.000 title abstract description 16
- 239000010409 thin film Substances 0.000 claims abstract description 131
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 113
- 239000010408 film Substances 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims description 31
- 230000005855 radiation Effects 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 19
- 239000002019 doping agent Substances 0.000 abstract description 17
- 230000008859 change Effects 0.000 abstract description 3
- 239000003086 colorant Substances 0.000 abstract description 3
- 150000002500 ions Chemical class 0.000 abstract description 2
- 239000004593 Epoxy Substances 0.000 description 14
- 239000002245 particle Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 11
- 239000000975 dye Substances 0.000 description 8
- 239000000843 powder Substances 0.000 description 7
- 230000003595 spectral effect Effects 0.000 description 7
- 238000000151 deposition Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 238000003877 atomic layer epitaxy Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000001552 radio frequency sputter deposition Methods 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910019990 cerium-doped yttrium aluminum garnet Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000011664 signaling Effects 0.000 description 1
- 229910019655 synthetic inorganic crystalline material Inorganic materials 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
- H01L33/504—Elements with two or more wavelength conversion materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/918—Light emitting regenerative switching device, e.g. light emitting scr arrays, circuitry
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Device Packages (AREA)
- Led Devices (AREA)
Abstract
Description
Claims (12)
- 특정 색의 광을 생성하는 발광 다이오드 디바이스(a light emitting diode device)에 있어서,제 1 표면 및 상기 제 1 표면의 반대편에 존재하는 제 2 표면을 포함하는 기판과,상기 기판의 제 1 표면상에 배치되고, 상기 기판의 제 1 표면에 인접한 제 1 표면 및 그 반대편에 위치하는 제 2 표면을 가지며, 구동되었을 때에 1차 방사광(primary radiation)을 발생시키는 발광 구조물(a light emitting structure)과,상기 발광 구조물에 의해서 생성된 1차 방사광을 수신하도록 배치되며, 광학적으로 균일하게 공간 분포된 형광체를 포함하는 형광체 박막(a phosphor thin film)을 포함하되,상기 1차 방사광은 상기 형광체 박막 상에 부딪히며, 상기 1차 방사광의 제 1 부분은 상기 형광체 박막을 통과하고, 상기 1차 방사광의 제 2 부분은 상이한 파장의 광으로 변환되며, 상기 형광체 박막에 의해서 방사된 광은 상기 형광체 박막을 통과하는 상기 1차 방사광과 결합하여 상기 특정 색의 광을 생성하는발광 다이오드 디바이스.
- 제 1 항에 있어서,상기 형광체 박막은 상기 발광 구조물의 제 2 표면상에 위치하는 발광 다이오드 디바이스.
- 제 2 항에 있어서,상기 1차 방사광은 청색광인 발광 다이오드 디바이스.
- 제 1 항에 있어서,상기 기판은 투과성(transparent)이며, 상기 형광체 박막은 상기 기판의 제 2 표면상에 위치하며, 상기 발광 구조물로부터 방사된 상기 1차 방사광은 상기 형광체 박막상에 부딪히기 전에 상기 투과성 기판을 통과하는 발광 다이오드 디바이스.
- 제 4 항에 있어서,반사 전극(a reflective electrode)이 상기 발광 구조물의 제 2 표면상에 위치하며, 상기 발광 구조물에 의해서 방사되어 상기 반사 전극에 부딪히는 1차 방사광은 상기 반사 전극에 의해서 상기 발광 구조물을 향하여 반사되는 발광 다이오드 디바이스.
- 제 5 항에 있어서,상기 1차 방사광은 청색광인 발광 다이오드 디바이스.
- 특정 색의 광을 생성하는 발광 다이오드 디바이스에 있어서,제 1 표면 및 상기 제 1 표면의 반대편에 존재하는 제 2 표면을 포함하는 기판과,상기 기판의 제 1 표면상에 배치되고, 상기 기판의 제 1 표면에 인접한 제 1 표면 및 그 반대편에 위치하는 제 2 표면을 가지며, 구동되었을 때에 1차 방사광(primary radiation)을 발생시키는 발광 구조물(a light emitting structure)과상기 발광 구조물에 의해서 생성된 1차 방사광을 수신하도록 배치되며, 광학적으로 균일하게 공간 분포된 형광체를 포함하는 제 1 형광체 박막(a first phosphor thin film) - 상기 1차 방사광은 상기 제 1 형광체 박막 상에 부딪히며, 상기 1차 방사광의 제 1 부분은 상기 제 1 형광체 박막을 통과하고, 상기 1차 방사광의 제 2 부분은 제 1 파장의 광으로 변환됨-과,상기 발광 구조물에 의해서 생성된 1차 방사광의 제 3 및 제 4 부분을 수신하도록 배치되며, 광학적으로 균일하게 공간 분포된 형광체를 포함하는 제 2 형광체 박막(a second phosphor thin film) - 상기 1차 방사광의 제 4 부분은 제 2 파장의 광으로 변환되며, 상기 1차 방사광의 제 1 및 제 3 부분은 변환되지 않은 상 태로 남아서 제 1 및 제 2 형광체 박막에 의해서 각기 방사된 제 1 및 제 2 파장의 광과 결합하여 상기 특정 색의 광을 생성함-을 포함하는 발광 다이오드 디바이스.
- 제 7 항에 있어서,상기 제 1 형광체 박막은 상기 기판의 제 2 표면상에 위치하며, 상기 발광 다이오드 디바이스는 반사 전극(a reflective electrode)을 더 포함하며, 상기 반사 전극은 상기 발광 구조물의 제 2 표면상에 위치하며, 상기 발광 구조물에 의해서 방사되어, 상기 반사 전극상에 부딪히는 1차 방사광은 상기 발광 구조물을 향하여 반사되는 발광 다이오드 디바이스.
- 제 8 항에 있어서,상기 1차 방사광은 청색광인 발광 다이오드 디바이스.
- 특정 색의 광을 생성하는 발광 다이오드 디바이스에 있어서,적어도 제 1 표면 및 상기 제 1 표면의 반대편에 존재하는 제 2 표면을 가지는 기판과,상기 기판의 제 1 표면상에 배치되며, 상기 기판의 제 1 표면과 접촉하는 제 1 표면 및 그 반대편에 존재하는 제 2 표면을 갖는 발광 구조물과,상기 발광 다이오드 디바이스 상에 배치되며, 광학적으로 균일하게 공간 분포된 형광체를 포함하는 제 1 형광체 박막 - 상기 발광 구조물은 구동될 때에 1차 광을 방사하고, 상기 1차 방사광은 상기 제 1 형광체 박막 상에 부딪히며, 상기 제 1 형광체 박막 상에 부딪히는 모든 1차 방사광은 청색광으로 변환되고, 상기 청색광은 상기 제 1 형광체 박막에 의해서 방사됨 - 과,상기 제 1 형광체 박막 상에 배치되며, 광학적으로 균일하게 공간 분포된 형광체를 포함하는 제 2 형광체 박막 - 상기 청색광의 일부는 상기 제 2 형광체 박막을 통과하고, 상기 제 2 형광체 박막에 부딪히는 상기 청색광의 일부는 황색광으로 변환되며, 상기 제 2 형광체 박막을 통과하는 상기 청색광의 일부는 상기 제 2 형광체 박막으로부터 방사된 상기 황색광과 결합하여 상기 특정 색의 광을 생성함-을 포함하는 발광 다이오드 디바이스.
- 제 10 항에 있어서,상기 제 1 형광체 박막은 상기 기판의 제 2 표면상에 위치하며, 상기 발광 다이오드 디바이스는 반사 전극을 더 포함하며, 상기 반사 전극은 상기 발광 구조물의 제 2 표면상에 위치하며, 상기 발광 구조물에 의해서 방사되어 상기 반사 전극상에 부딪히는 1차 방사광은 상기 발광 구조물을 향하여 반사되는 발광 다이오드 디바이스.
- 제 11항에 있어서,상기 1차 방사광은 자외선 방사(ultraviolet radiation)인 발광 다이오드 디바이스.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/405,938 US6696703B2 (en) | 1999-09-27 | 1999-09-27 | Thin film phosphor-converted light emitting diode device |
US09/405,938 | 1999-09-27 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020017006555A Division KR100832927B1 (ko) | 1999-09-27 | 2000-09-25 | 발광 다이오드 디바이스 |
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KR20080009780A KR20080009780A (ko) | 2008-01-29 |
KR100948109B1 true KR100948109B1 (ko) | 2010-03-16 |
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KR1020017006555A KR100832927B1 (ko) | 1999-09-27 | 2000-09-25 | 발광 다이오드 디바이스 |
KR1020087000699A KR100948109B1 (ko) | 1999-09-27 | 2000-09-25 | 발광 다이오드 디바이스 |
Family Applications Before (1)
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KR1020017006555A KR100832927B1 (ko) | 1999-09-27 | 2000-09-25 | 발광 다이오드 디바이스 |
Country Status (7)
Country | Link |
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US (2) | US6696703B2 (ko) |
EP (1) | EP1142032B1 (ko) |
JP (1) | JP2001244507A (ko) |
KR (2) | KR100832927B1 (ko) |
AU (1) | AU7613700A (ko) |
DE (1) | DE60039961D1 (ko) |
WO (1) | WO2001024283A1 (ko) |
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- 2000-09-25 AU AU76137/00A patent/AU7613700A/en not_active Abandoned
- 2000-09-25 EP EP00965416A patent/EP1142032B1/en not_active Expired - Lifetime
- 2000-09-25 DE DE60039961T patent/DE60039961D1/de not_active Expired - Lifetime
- 2000-09-25 WO PCT/US2000/026325 patent/WO2001024283A1/en active Application Filing
- 2000-09-25 KR KR1020017006555A patent/KR100832927B1/ko active IP Right Grant
- 2000-09-25 KR KR1020087000699A patent/KR100948109B1/ko active IP Right Grant
- 2000-09-27 JP JP2000335224A patent/JP2001244507A/ja active Pending
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JPH10163535A (ja) * | 1996-11-27 | 1998-06-19 | Kasei Optonix Co Ltd | 白色発光素子 |
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US6696703B2 (en) | 2004-02-24 |
WO2001024283A1 (en) | 2001-04-05 |
DE60039961D1 (de) | 2008-10-02 |
EP1142032B1 (en) | 2008-08-20 |
KR20010089504A (ko) | 2001-10-06 |
AU7613700A (en) | 2001-04-30 |
KR20080009780A (ko) | 2008-01-29 |
US20020030444A1 (en) | 2002-03-14 |
US7183577B2 (en) | 2007-02-27 |
US20040164307A1 (en) | 2004-08-26 |
KR100832927B1 (ko) | 2008-05-27 |
JP2001244507A (ja) | 2001-09-07 |
EP1142032A1 (en) | 2001-10-10 |
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