KR100944444B1 - 기판과의 양립성이 향상된 무암모니아 알칼리 마이크로일렉트로닉 세정 조성물 - Google Patents

기판과의 양립성이 향상된 무암모니아 알칼리 마이크로일렉트로닉 세정 조성물 Download PDF

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Publication number
KR100944444B1
KR100944444B1 KR1020097008556A KR20097008556A KR100944444B1 KR 100944444 B1 KR100944444 B1 KR 100944444B1 KR 1020097008556 A KR1020097008556 A KR 1020097008556A KR 20097008556 A KR20097008556 A KR 20097008556A KR 100944444 B1 KR100944444 B1 KR 100944444B1
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South Korea
Prior art keywords
cleaning composition
weight percent
cleaning
weight
dielectric constant
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Expired - Lifetime
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KR1020097008556A
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English (en)
Korean (ko)
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KR20090076934A (ko
Inventor
치엔-핀 셔만 허수
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말린크로트 베이커, 인코포레이티드
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Assigned to 아반토 퍼포먼스 머티리얼즈, 엘엘씨 reassignment 아반토 퍼포먼스 머티리얼즈, 엘엘씨 권리의 전부이전등록 Assignors: 아반토르 퍼포먼스 머티리얼스, 인크.
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/28—Heterocyclic compounds containing nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/0005—Other compounding ingredients characterised by their effect
    • C11D3/0073—Anticorrosion compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/33—Amino carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3263—Amides or imides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
KR1020097008556A 2001-07-09 2002-07-08 기판과의 양립성이 향상된 무암모니아 알칼리 마이크로일렉트로닉 세정 조성물 Expired - Lifetime KR100944444B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US30431201P 2001-07-09 2001-07-09
US60/304,312 2001-07-09

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR20047000266A Division KR20040018437A (ko) 2001-07-09 2002-07-08 기판과의 양립성이 향상된 무암모니아 알칼리마이크로일렉트로닉 세정 조성물

Publications (2)

Publication Number Publication Date
KR20090076934A KR20090076934A (ko) 2009-07-13
KR100944444B1 true KR100944444B1 (ko) 2010-02-26

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020097008556A Expired - Lifetime KR100944444B1 (ko) 2001-07-09 2002-07-08 기판과의 양립성이 향상된 무암모니아 알칼리 마이크로일렉트로닉 세정 조성물
KR20047000266A Ceased KR20040018437A (ko) 2001-07-09 2002-07-08 기판과의 양립성이 향상된 무암모니아 알칼리마이크로일렉트로닉 세정 조성물

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR20047000266A Ceased KR20040018437A (ko) 2001-07-09 2002-07-08 기판과의 양립성이 향상된 무암모니아 알칼리마이크로일렉트로닉 세정 조성물

Country Status (17)

Country Link
EP (1) EP1404796B1 (https=)
JP (1) JP4177758B2 (https=)
KR (2) KR100944444B1 (https=)
CN (2) CN1526007A (https=)
AT (1) ATE545695T1 (https=)
AU (1) AU2002320305A1 (https=)
BR (1) BR0211054A (https=)
CA (1) CA2452884C (https=)
IL (2) IL159761A0 (https=)
IN (1) IN2004CH00042A (https=)
MY (1) MY139607A (https=)
NO (1) NO20040067L (https=)
PL (1) PL199501B1 (https=)
RS (1) RS904A (https=)
TW (1) TWI292437B (https=)
WO (1) WO2003006597A1 (https=)
ZA (1) ZA200400064B (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
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US20040192938A1 (en) 2003-03-24 2004-09-30 Manzer Leo Ernest Production of 5-mehyl-N-aryl-2-pyrrolidone and 5-methyl-N-alkyl-2-pyrrolidone by reductive of levulinic acid esters with aryl and alkyl amines
KR101056544B1 (ko) 2003-08-19 2011-08-11 아반토르 퍼포먼스 머티리얼스, 인크. 마이크로전자 기판용 박리 및 세정 조성물
US7922823B2 (en) * 2005-01-27 2011-04-12 Advanced Technology Materials, Inc. Compositions for processing of semiconductor substrates
US7632796B2 (en) 2005-10-28 2009-12-15 Dynaloy, Llc Dynamic multi-purpose composition for the removal of photoresists and method for its use
US9329486B2 (en) 2005-10-28 2016-05-03 Dynaloy, Llc Dynamic multi-purpose composition for the removal of photoresists and method for its use
US8263539B2 (en) 2005-10-28 2012-09-11 Dynaloy, Llc Dynamic multi-purpose composition for the removal of photoresists and methods for its use
KR101446368B1 (ko) * 2007-02-14 2014-10-01 아반토르 퍼포먼스 머티리얼스, 인크. 퍼옥사이드에 의해 활성화된 옥소메탈레이트계, 에칭 잔류물 제거용 제제
KR101486116B1 (ko) 2008-10-09 2015-01-28 아반토르 퍼포먼스 머티리얼스, 인크. 산화구리 에칭 잔여물 제거 및 구리 전착 방지용 수성 산성 배합물
US8298751B2 (en) 2009-11-02 2012-10-30 International Business Machines Corporation Alkaline rinse agents for use in lithographic patterning
WO2012161790A1 (en) * 2011-02-24 2012-11-29 John Moore Concentrated chemical composition and method for removing photoresist during microelectric fabrication
US9158202B2 (en) * 2012-11-21 2015-10-13 Dynaloy, Llc Process and composition for removing substances from substrates
US10072237B2 (en) * 2015-08-05 2018-09-11 Versum Materials Us, Llc Photoresist cleaning composition used in photolithography and a method for treating substrate therewith
JP7530048B2 (ja) * 2019-02-15 2024-08-07 日産化学株式会社 洗浄剤組成物及び洗浄方法
CN113439324B (zh) * 2019-02-15 2025-03-04 日产化学株式会社 清洗剂组合物以及清洗方法
US20220326620A1 (en) * 2019-08-30 2022-10-13 Dow Global Technologies Llc Photoresist stripping composition
CN111519190B (zh) * 2020-05-27 2022-03-18 湖北兴福电子材料有限公司 一种铜制程面板中稳定蚀刻锥角的蚀刻液及稳定方法

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JPH06266119A (ja) * 1992-07-09 1994-09-22 Ekc Technol Inc 還元及び酸化電位を有する求核アミン化合物を含む洗浄剤
JPH0959689A (ja) * 1995-08-29 1997-03-04 Mitsubishi Chem Corp 研削剤除去用洗浄剤
JP2003526111A (ja) * 1998-05-18 2003-09-02 マリンクロッド・インコーポレイテッド マイクロエレクトロニクス基板洗浄用珪酸塩含有アルカリ組成物

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US4744834A (en) * 1986-04-30 1988-05-17 Noor Haq Photoresist stripper comprising a pyrrolidinone, a diethylene glycol ether, a polyglycol and a quaternary ammonium hydroxide
WO1988005813A1 (en) * 1987-02-05 1988-08-11 Macdermid, Incorporated Photoresist stripper composition
US5091103A (en) * 1990-05-01 1992-02-25 Alicia Dean Photoresist stripper
US6110881A (en) * 1990-11-05 2000-08-29 Ekc Technology, Inc. Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
DE69941088D1 (de) 1998-05-18 2009-08-20 Mallinckrodt Baker Inc Alkalische, silikat enthaltende reinigungslösungen für mikroelektronische substrate
US6558879B1 (en) * 2000-09-25 2003-05-06 Ashland Inc. Photoresist stripper/cleaner compositions containing aromatic acid inhibitors

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JPH06266119A (ja) * 1992-07-09 1994-09-22 Ekc Technol Inc 還元及び酸化電位を有する求核アミン化合物を含む洗浄剤
JPH11194505A (ja) * 1992-07-09 1999-07-21 Ekc Technol Inc 還元及び酸化電位を有する求核アミン化合物を含む洗浄剤組成物およびこれを使用した基板の洗浄方法
JPH0959689A (ja) * 1995-08-29 1997-03-04 Mitsubishi Chem Corp 研削剤除去用洗浄剤
JP2003526111A (ja) * 1998-05-18 2003-09-02 マリンクロッド・インコーポレイテッド マイクロエレクトロニクス基板洗浄用珪酸塩含有アルカリ組成物

Also Published As

Publication number Publication date
KR20090076934A (ko) 2009-07-13
NO20040067L (no) 2004-03-05
RS904A (sr) 2007-02-05
TWI292437B (en) 2008-01-11
IL159761A0 (en) 2004-06-20
CA2452884C (en) 2010-12-07
BR0211054A (pt) 2004-07-20
IN2004CH00042A (https=) 2005-12-02
WO2003006597A1 (en) 2003-01-23
CN1526007A (zh) 2004-09-01
MY139607A (en) 2009-10-30
JP4177758B2 (ja) 2008-11-05
PL199501B1 (pl) 2008-09-30
EP1404796B1 (en) 2012-02-15
EP1404796A1 (en) 2004-04-07
ATE545695T1 (de) 2012-03-15
JP2004536181A (ja) 2004-12-02
ZA200400064B (en) 2004-10-27
CA2452884A1 (en) 2003-01-23
CN102399651A (zh) 2012-04-04
AU2002320305A1 (en) 2003-01-29
IL159761A (en) 2006-12-10
PL367838A1 (en) 2005-03-07
KR20040018437A (ko) 2004-03-03

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