ATE545695T1 - Ammoniakfreie alkalische mikroelektronische reinigungszusammensetzung mit verbesserter substratverträglickeit - Google Patents
Ammoniakfreie alkalische mikroelektronische reinigungszusammensetzung mit verbesserter substratverträglickeitInfo
- Publication number
- ATE545695T1 ATE545695T1 AT02749817T AT02749817T ATE545695T1 AT E545695 T1 ATE545695 T1 AT E545695T1 AT 02749817 T AT02749817 T AT 02749817T AT 02749817 T AT02749817 T AT 02749817T AT E545695 T1 ATE545695 T1 AT E545695T1
- Authority
- AT
- Austria
- Prior art keywords
- cleaning
- ammonia
- cleaning composition
- improved substrate
- free alkaline
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 8
- 239000000203 mixture Substances 0.000 title abstract 5
- 238000004377 microelectronic Methods 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 title abstract 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- 150000001408 amides Chemical class 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 239000003989 dielectric material Substances 0.000 abstract 1
- 150000002484 inorganic compounds Chemical class 0.000 abstract 1
- 229910010272 inorganic material Inorganic materials 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 238000001465 metallisation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000000269 nucleophilic effect Effects 0.000 abstract 1
- 150000002894 organic compounds Chemical class 0.000 abstract 1
- 150000002902 organometallic compounds Chemical class 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/28—Heterocyclic compounds containing nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/0005—Other compounding ingredients characterised by their effect
- C11D3/0073—Anticorrosion compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/33—Amino carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3218—Alkanolamines or alkanolimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3263—Amides or imides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5013—Organic solvents containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/34—Organic compounds containing sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US30431201P | 2001-07-09 | 2001-07-09 | |
| PCT/US2002/021374 WO2003006597A1 (en) | 2001-07-09 | 2002-07-08 | Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE545695T1 true ATE545695T1 (de) | 2012-03-15 |
Family
ID=23175967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02749817T ATE545695T1 (de) | 2001-07-09 | 2002-07-08 | Ammoniakfreie alkalische mikroelektronische reinigungszusammensetzung mit verbesserter substratverträglickeit |
Country Status (17)
| Country | Link |
|---|---|
| EP (1) | EP1404796B1 (de) |
| JP (1) | JP4177758B2 (de) |
| KR (2) | KR20040018437A (de) |
| CN (2) | CN102399651A (de) |
| AT (1) | ATE545695T1 (de) |
| AU (1) | AU2002320305A1 (de) |
| BR (1) | BR0211054A (de) |
| CA (1) | CA2452884C (de) |
| IL (2) | IL159761A0 (de) |
| IN (1) | IN2004CH00042A (de) |
| MY (1) | MY139607A (de) |
| NO (1) | NO20040067L (de) |
| PL (1) | PL199501B1 (de) |
| RS (1) | RS904A (de) |
| TW (1) | TWI292437B (de) |
| WO (1) | WO2003006597A1 (de) |
| ZA (1) | ZA200400064B (de) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040192938A1 (en) | 2003-03-24 | 2004-09-30 | Manzer Leo Ernest | Production of 5-mehyl-N-aryl-2-pyrrolidone and 5-methyl-N-alkyl-2-pyrrolidone by reductive of levulinic acid esters with aryl and alkyl amines |
| CN1839355B (zh) * | 2003-08-19 | 2012-07-11 | 安万托特性材料股份有限公司 | 用于微电子设备的剥离和清洁组合物 |
| TWI538033B (zh) * | 2005-01-27 | 2016-06-11 | 安堤格里斯公司 | 半導體基板處理用之組成物 |
| US7632796B2 (en) | 2005-10-28 | 2009-12-15 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| US8263539B2 (en) | 2005-10-28 | 2012-09-11 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and methods for its use |
| US9329486B2 (en) | 2005-10-28 | 2016-05-03 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| JP2010518242A (ja) * | 2007-02-14 | 2010-05-27 | マリンクロット ベーカー， インコーポレイテッド | エッチング残留物を除去するための、過酸化物によって活性化されたオキソメタレートベース調合物 |
| KR101521066B1 (ko) * | 2008-10-09 | 2015-05-18 | 아반토르 퍼포먼스 머티리얼스, 인크. | 산화구리 에칭 잔여물 제거 및 구리 전착 방지용 수성 산성 배합물 |
| US8298751B2 (en) | 2009-11-02 | 2012-10-30 | International Business Machines Corporation | Alkaline rinse agents for use in lithographic patterning |
| WO2012161790A1 (en) * | 2011-02-24 | 2012-11-29 | John Moore | Concentrated chemical composition and method for removing photoresist during microelectric fabrication |
| US9158202B2 (en) * | 2012-11-21 | 2015-10-13 | Dynaloy, Llc | Process and composition for removing substances from substrates |
| US10072237B2 (en) * | 2015-08-05 | 2018-09-11 | Versum Materials Us, Llc | Photoresist cleaning composition used in photolithography and a method for treating substrate therewith |
| JP7530048B2 (ja) * | 2019-02-15 | 2024-08-07 | 日産化学株式会社 | 洗浄剤組成物及び洗浄方法 |
| KR20210126667A (ko) * | 2019-02-15 | 2021-10-20 | 닛산 가가쿠 가부시키가이샤 | 세정제 조성물 및 세정 방법 |
| US20220326620A1 (en) * | 2019-08-30 | 2022-10-13 | Dow Global Technologies Llc | Photoresist stripping composition |
| CN111519190B (zh) * | 2020-05-27 | 2022-03-18 | 湖北兴福电子材料有限公司 | 一种铜制程面板中稳定蚀刻锥角的蚀刻液及稳定方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4744834A (en) * | 1986-04-30 | 1988-05-17 | Noor Haq | Photoresist stripper comprising a pyrrolidinone, a diethylene glycol ether, a polyglycol and a quaternary ammonium hydroxide |
| JPH01502059A (ja) * | 1987-02-05 | 1989-07-13 | マクダーミツド インコーポレーテツド | フォトレジストストリッパー組成物 |
| US5091103A (en) * | 1990-05-01 | 1992-02-25 | Alicia Dean | Photoresist stripper |
| US6110881A (en) * | 1990-11-05 | 2000-08-29 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| JP3048207B2 (ja) * | 1992-07-09 | 2000-06-05 | イー．ケー．シー．テクノロジー．インコーポレイテッド | 還元及び酸化電位を有する求核アミン化合物を含む洗浄剤組成物およびこれを使用した基板の洗浄方法 |
| JPH0959689A (ja) * | 1995-08-29 | 1997-03-04 | Mitsubishi Chem Corp | 研削剤除去用洗浄剤 |
| JP4565741B2 (ja) * | 1998-05-18 | 2010-10-20 | マリンクロッド・ベイカー・インコーポレイテッド | マイクロエレクトロニクス基板洗浄用珪酸塩含有アルカリ組成物 |
| PT1105778E (pt) | 1998-05-18 | 2009-09-23 | Mallinckrodt Baker Inc | Composições alcalinas contendo silicato para limpeza de substratos microelectrónicos |
| US6558879B1 (en) * | 2000-09-25 | 2003-05-06 | Ashland Inc. | Photoresist stripper/cleaner compositions containing aromatic acid inhibitors |
-
2002
- 2002-07-05 MY MYPI20022558A patent/MY139607A/en unknown
- 2002-07-08 CN CN2010102990065A patent/CN102399651A/zh active Pending
- 2002-07-08 RS YUP-9/04A patent/RS904A/sr unknown
- 2002-07-08 KR KR20047000266A patent/KR20040018437A/ko not_active Ceased
- 2002-07-08 IL IL15976102A patent/IL159761A0/xx active IP Right Grant
- 2002-07-08 EP EP02749817A patent/EP1404796B1/de not_active Expired - Lifetime
- 2002-07-08 BR BR0211054-7A patent/BR0211054A/pt not_active IP Right Cessation
- 2002-07-08 KR KR1020097008556A patent/KR100944444B1/ko not_active Expired - Lifetime
- 2002-07-08 AU AU2002320305A patent/AU2002320305A1/en not_active Abandoned
- 2002-07-08 AT AT02749817T patent/ATE545695T1/de active
- 2002-07-08 CN CNA028138759A patent/CN1526007A/zh active Pending
- 2002-07-08 CA CA2452884A patent/CA2452884C/en not_active Expired - Fee Related
- 2002-07-08 WO PCT/US2002/021374 patent/WO2003006597A1/en not_active Ceased
- 2002-07-08 JP JP2003512356A patent/JP4177758B2/ja not_active Expired - Fee Related
- 2002-07-08 PL PL367838A patent/PL199501B1/pl not_active IP Right Cessation
- 2002-07-09 TW TW091115168A patent/TWI292437B/zh not_active IP Right Cessation
-
2004
- 2004-01-06 ZA ZA200400064A patent/ZA200400064B/en unknown
- 2004-01-07 IL IL159761A patent/IL159761A/en not_active IP Right Cessation
- 2004-01-08 IN IN42CH2004 patent/IN2004CH00042A/en unknown
- 2004-01-08 NO NO20040067A patent/NO20040067L/no not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1404796B1 (de) | 2012-02-15 |
| EP1404796A1 (de) | 2004-04-07 |
| BR0211054A (pt) | 2004-07-20 |
| AU2002320305A1 (en) | 2003-01-29 |
| KR20090076934A (ko) | 2009-07-13 |
| IL159761A0 (en) | 2004-06-20 |
| JP2004536181A (ja) | 2004-12-02 |
| KR100944444B1 (ko) | 2010-02-26 |
| IN2004CH00042A (de) | 2005-12-02 |
| WO2003006597A1 (en) | 2003-01-23 |
| CN1526007A (zh) | 2004-09-01 |
| IL159761A (en) | 2006-12-10 |
| JP4177758B2 (ja) | 2008-11-05 |
| CA2452884C (en) | 2010-12-07 |
| PL199501B1 (pl) | 2008-09-30 |
| NO20040067L (no) | 2004-03-05 |
| ZA200400064B (en) | 2004-10-27 |
| CN102399651A (zh) | 2012-04-04 |
| MY139607A (en) | 2009-10-30 |
| PL367838A1 (en) | 2005-03-07 |
| RS904A (sr) | 2007-02-05 |
| CA2452884A1 (en) | 2003-01-23 |
| KR20040018437A (ko) | 2004-03-03 |
| TWI292437B (en) | 2008-01-11 |
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