KR100909585B1 - 스테이지장치 - Google Patents

스테이지장치 Download PDF

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Publication number
KR100909585B1
KR100909585B1 KR1020077028483A KR20077028483A KR100909585B1 KR 100909585 B1 KR100909585 B1 KR 100909585B1 KR 1020077028483 A KR1020077028483 A KR 1020077028483A KR 20077028483 A KR20077028483 A KR 20077028483A KR 100909585 B1 KR100909585 B1 KR 100909585B1
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KR
South Korea
Prior art keywords
support member
axis
wafer
support base
supporting
Prior art date
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KR1020077028483A
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English (en)
Korean (ko)
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KR20080014989A (ko
Inventor
류타 나카지마
Original Assignee
스미도모쥬기가이고교 가부시키가이샤
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Publication of KR20080014989A publication Critical patent/KR20080014989A/ko
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Publication of KR100909585B1 publication Critical patent/KR100909585B1/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/57—Mask-wafer alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Machine Tool Units (AREA)
KR1020077028483A 2005-07-21 2006-07-20 스테이지장치 Active KR100909585B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005211724A JP4664142B2 (ja) 2005-07-21 2005-07-21 ステージ装置
JPJP-P-2005-00211724 2005-07-21
PCT/JP2006/314356 WO2007010971A1 (ja) 2005-07-21 2006-07-20 ステージ装置

Publications (2)

Publication Number Publication Date
KR20080014989A KR20080014989A (ko) 2008-02-15
KR100909585B1 true KR100909585B1 (ko) 2009-07-24

Family

ID=37668843

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077028483A Active KR100909585B1 (ko) 2005-07-21 2006-07-20 스테이지장치

Country Status (6)

Country Link
US (1) US7997567B2 (https=)
JP (1) JP4664142B2 (https=)
KR (1) KR100909585B1 (https=)
CN (1) CN101194214B (https=)
TW (1) TW200715357A (https=)
WO (1) WO2007010971A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4976922B2 (ja) * 2007-05-29 2012-07-18 株式会社オーク製作所 基板搬送装置
JP4750090B2 (ja) * 2007-09-14 2011-08-17 住友重機械工業株式会社 ステージ装置
JP4917050B2 (ja) * 2008-01-23 2012-04-18 住友重機械工業株式会社 ステージ装置
KR101316804B1 (ko) * 2008-12-25 2013-10-11 가부시키가이샤 알박 정전척용의 척 플레이트의 제조 방법
US8084896B2 (en) * 2008-12-31 2011-12-27 Electro Scientific Industries, Inc. Monolithic stage positioning system and method
JP5137218B1 (ja) * 2011-08-30 2013-02-06 株式会社ソディック 工作機械
CN102501226B (zh) * 2011-10-31 2014-02-19 西安理工大学 一种宏微驱动变形导轨精密回转装置
CN104028944B (zh) * 2013-03-08 2016-08-10 鸿准精密模具（昆山）有限公司 整形装置及其定位机构
US10192773B2 (en) * 2016-06-20 2019-01-29 Nexperia B.V. Semiconductor device positioning system and method for semiconductor device positioning
CN107081607B (zh) * 2017-02-22 2019-01-18 浙江江山福鑫工艺品有限公司 一种加工工件用加工台装置
CN113606440B (zh) * 2021-08-05 2022-08-26 唐山师范学院 一种物联网用计算机支撑台
CN117597737A (zh) * 2022-06-15 2024-02-23 株式会社村田制作所 层叠装置以及层叠系统
KR102688248B1 (ko) * 2022-11-29 2024-07-25 이노로보틱스 주식회사 Zt 스테이지

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0180925B1 (ko) * 1994-02-18 1999-04-15 미타라이 하지메 스테이지장치
JP2003028973A (ja) * 2001-07-13 2003-01-29 Sumitomo Heavy Ind Ltd ステージ装置
JP2003028974A (ja) * 2001-07-13 2003-01-29 Sumitomo Heavy Ind Ltd ステージ装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2903958B2 (ja) * 1993-06-23 1999-06-14 キヤノン株式会社 位置決め装置及びそれを用いた半導体素子の製造方法
JP3196798B2 (ja) * 1993-10-12 2001-08-06 キヤノン株式会社 自重支持装置
US5609332A (en) * 1995-11-14 1997-03-11 Hassell; Clayton Device for lifting and holding cabinets
US5682658A (en) * 1996-03-04 1997-11-04 Utica Enterprises, Inc. Rotary index table assembly
US6485248B1 (en) * 2000-10-10 2002-11-26 Applied Materials, Inc. Multiple wafer lift apparatus and associated method
JP4223714B2 (ja) * 2001-11-30 2009-02-12 住友重機械工業株式会社 ステージ装置
CN1588556A (zh) * 2004-07-30 2005-03-02 中国科学院上海光学精密机械研究所 五自由度精密定位平台
US7869000B2 (en) * 2004-11-02 2011-01-11 Nikon Corporation Stage assembly with lightweight fine stage and low transmissibility
JP4927338B2 (ja) * 2005-02-21 2012-05-09 住友重機械工業株式会社 ステージ装置及びガントリ型ステージ装置及びステージ装置の制御方法
KR100667598B1 (ko) * 2005-02-25 2007-01-12 주식회사 아이피에스 반도체 처리 장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0180925B1 (ko) * 1994-02-18 1999-04-15 미타라이 하지메 스테이지장치
JP2003028973A (ja) * 2001-07-13 2003-01-29 Sumitomo Heavy Ind Ltd ステージ装置
JP2003028974A (ja) * 2001-07-13 2003-01-29 Sumitomo Heavy Ind Ltd ステージ装置

Also Published As

Publication number Publication date
JP2007027659A (ja) 2007-02-01
JP4664142B2 (ja) 2011-04-06
TW200715357A (en) 2007-04-16
US7997567B2 (en) 2011-08-16
CN101194214A (zh) 2008-06-04
CN101194214B (zh) 2010-09-29
WO2007010971A1 (ja) 2007-01-25
US20080087791A1 (en) 2008-04-17
TWI307916B (https=) 2009-03-21
KR20080014989A (ko) 2008-02-15

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