JP2007027659A - ステージ装置 - Google Patents
ステージ装置 Download PDFInfo
- Publication number
- JP2007027659A JP2007027659A JP2005211724A JP2005211724A JP2007027659A JP 2007027659 A JP2007027659 A JP 2007027659A JP 2005211724 A JP2005211724 A JP 2005211724A JP 2005211724 A JP2005211724 A JP 2005211724A JP 2007027659 A JP2007027659 A JP 2007027659A
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- JP
- Japan
- Prior art keywords
- axis
- support member
- support base
- wafer
- holding member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
Abstract
【解決手段】 ステージ装置10は、ウエハ12が載置されるウエハ保持部材14と、ウエハ保持部材14のZ軸部材16を昇降可能に支持するZ軸支持ベース18と、ベアリング20を介してZ軸支持ベース18を回動可能に支持するθz支持ベース22と、θz支持ベース22が搭載されたXYテーブル24とを有する。Z軸アクチュエータ36の固定子36aがθz支持ベース22の平面部34上に固定されており、可動子36bがウエハ保持部材14の横架部材14bの両端に固定されている。従って、一対のZ軸アクチュエータ36は、ウエハ保持部材14の横架部材14bに対して同時に駆動力を付与するように制御される。その際、Z軸アクチュエータ36の駆動力の反力は、θz支持ベース22及びXYテーブル24で受けるので、反力による振動発生が抑制される。
【選択図】 図1
Description
14 ウエハ保持部材
18 Z軸支持ベース
20 θz支持ベース
24 XYテーブル
32 θz駆動アクチュエータ
36 Z軸アクチュエータ
50 マグネットヨーク
52 マグネット
54 コイル
Claims (4)
- 対象物を保持する保持部材と、
該保持部材を昇降可能に支持する昇降支持部材と、
該昇降支持部材をZ軸回りに回動可能に支持する回動支持部材と、
前記保持部材をZ軸方向に昇降するZ軸駆動手段と、
を有するステージ装置において、
前記Z軸駆動手段を前記回動支持部材上に設け、前記保持部材を前記回動支持部材に対して昇降させることを特徴とするステージ装置。 - 前記回動支持部材は、水平方向に移動するXYステージに搭載されたことを特徴とする請求項1記載のステージ装置。
- 前記Z軸駆動手段は、前記保持部材の複数箇所を駆動するように設けられたことを特徴とする請求項1記載のステージ装置。
- 前記昇降支持部材は、前記回動支持部材上のベアリングによりZ軸回りに回動可能に支持されたことを特徴とする請求項1記載のステージ装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005211724A JP4664142B2 (ja) | 2005-07-21 | 2005-07-21 | ステージ装置 |
TW095124692A TW200715357A (en) | 2005-07-21 | 2006-07-06 | Stage device |
PCT/JP2006/314356 WO2007010971A1 (ja) | 2005-07-21 | 2006-07-20 | ステージ装置 |
CN2006800204661A CN101194214B (zh) | 2005-07-21 | 2006-07-20 | 载物台装置 |
KR1020077028483A KR100909585B1 (ko) | 2005-07-21 | 2006-07-20 | 스테이지장치 |
US11/984,170 US7997567B2 (en) | 2005-07-21 | 2007-11-14 | Stage apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005211724A JP4664142B2 (ja) | 2005-07-21 | 2005-07-21 | ステージ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007027659A true JP2007027659A (ja) | 2007-02-01 |
JP4664142B2 JP4664142B2 (ja) | 2011-04-06 |
Family
ID=37668843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005211724A Active JP4664142B2 (ja) | 2005-07-21 | 2005-07-21 | ステージ装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7997567B2 (ja) |
JP (1) | JP4664142B2 (ja) |
KR (1) | KR100909585B1 (ja) |
CN (1) | CN101194214B (ja) |
TW (1) | TW200715357A (ja) |
WO (1) | WO2007010971A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009071178A (ja) * | 2007-09-14 | 2009-04-02 | Sumitomo Heavy Ind Ltd | ステージ装置 |
JP2009174959A (ja) * | 2008-01-23 | 2009-08-06 | Sumitomo Heavy Ind Ltd | ステージ装置 |
CN107081607A (zh) * | 2017-02-22 | 2017-08-22 | 史东海 | 一种加工工件用加工台装置 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4976922B2 (ja) * | 2007-05-29 | 2012-07-18 | 株式会社オーク製作所 | 基板搬送装置 |
SG171819A1 (en) * | 2008-12-25 | 2011-07-28 | Ulvac Inc | Method of manufacturing chuck plate for use in electrostatic chuck |
US8084896B2 (en) * | 2008-12-31 | 2011-12-27 | Electro Scientific Industries, Inc. | Monolithic stage positioning system and method |
JP5137218B1 (ja) * | 2011-08-30 | 2013-02-06 | 株式会社ソディック | 工作機械 |
CN102501226B (zh) | 2011-10-31 | 2014-02-19 | 西安理工大学 | 一种宏微驱动变形导轨精密回转装置 |
CN104028944B (zh) * | 2013-03-08 | 2016-08-10 | 鸿准精密模具(昆山)有限公司 | 整形装置及其定位机构 |
US10192773B2 (en) * | 2016-06-20 | 2019-01-29 | Nexperia B.V. | Semiconductor device positioning system and method for semiconductor device positioning |
CN113606440B (zh) * | 2021-08-05 | 2022-08-26 | 唐山师范学院 | 一种物联网用计算机支撑台 |
CN117597737A (zh) * | 2022-06-15 | 2024-02-23 | 株式会社村田制作所 | 层叠装置以及层叠系统 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07111238A (ja) * | 1993-10-12 | 1995-04-25 | Canon Inc | 自重支持装置 |
JPH07226354A (ja) * | 1993-06-23 | 1995-08-22 | Canon Inc | 位置決め装置及びそれを用いた半導体素子の製造方法 |
JP2003028974A (ja) * | 2001-07-13 | 2003-01-29 | Sumitomo Heavy Ind Ltd | ステージ装置 |
JP2003028973A (ja) * | 2001-07-13 | 2003-01-29 | Sumitomo Heavy Ind Ltd | ステージ装置 |
JP2003167082A (ja) * | 2001-11-30 | 2003-06-13 | Sumitomo Heavy Ind Ltd | ステージ装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3164960B2 (ja) * | 1994-02-18 | 2001-05-14 | キヤノン株式会社 | ステージ装置 |
US5609332A (en) * | 1995-11-14 | 1997-03-11 | Hassell; Clayton | Device for lifting and holding cabinets |
US5682658A (en) * | 1996-03-04 | 1997-11-04 | Utica Enterprises, Inc. | Rotary index table assembly |
US6485248B1 (en) * | 2000-10-10 | 2002-11-26 | Applied Materials, Inc. | Multiple wafer lift apparatus and associated method |
CN1588556A (zh) * | 2004-07-30 | 2005-03-02 | 中国科学院上海光学精密机械研究所 | 五自由度精密定位平台 |
US7869000B2 (en) * | 2004-11-02 | 2011-01-11 | Nikon Corporation | Stage assembly with lightweight fine stage and low transmissibility |
JP4927338B2 (ja) * | 2005-02-21 | 2012-05-09 | 住友重機械工業株式会社 | ステージ装置及びガントリ型ステージ装置及びステージ装置の制御方法 |
KR100667598B1 (ko) * | 2005-02-25 | 2007-01-12 | 주식회사 아이피에스 | 반도체 처리 장치 |
-
2005
- 2005-07-21 JP JP2005211724A patent/JP4664142B2/ja active Active
-
2006
- 2006-07-06 TW TW095124692A patent/TW200715357A/zh not_active IP Right Cessation
- 2006-07-20 WO PCT/JP2006/314356 patent/WO2007010971A1/ja active Application Filing
- 2006-07-20 KR KR1020077028483A patent/KR100909585B1/ko active IP Right Grant
- 2006-07-20 CN CN2006800204661A patent/CN101194214B/zh not_active Expired - Fee Related
-
2007
- 2007-11-14 US US11/984,170 patent/US7997567B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07226354A (ja) * | 1993-06-23 | 1995-08-22 | Canon Inc | 位置決め装置及びそれを用いた半導体素子の製造方法 |
JPH07111238A (ja) * | 1993-10-12 | 1995-04-25 | Canon Inc | 自重支持装置 |
JP2003028974A (ja) * | 2001-07-13 | 2003-01-29 | Sumitomo Heavy Ind Ltd | ステージ装置 |
JP2003028973A (ja) * | 2001-07-13 | 2003-01-29 | Sumitomo Heavy Ind Ltd | ステージ装置 |
JP2003167082A (ja) * | 2001-11-30 | 2003-06-13 | Sumitomo Heavy Ind Ltd | ステージ装置 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009071178A (ja) * | 2007-09-14 | 2009-04-02 | Sumitomo Heavy Ind Ltd | ステージ装置 |
KR101018643B1 (ko) * | 2007-09-14 | 2011-03-03 | 스미도모쥬기가이고교 가부시키가이샤 | 스테이지장치 |
US8019448B2 (en) | 2007-09-14 | 2011-09-13 | Sumitomo Heavy Industries, Ltd. | Stage device |
JP2009174959A (ja) * | 2008-01-23 | 2009-08-06 | Sumitomo Heavy Ind Ltd | ステージ装置 |
CN107081607A (zh) * | 2017-02-22 | 2017-08-22 | 史东海 | 一种加工工件用加工台装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI307916B (ja) | 2009-03-21 |
KR20080014989A (ko) | 2008-02-15 |
US7997567B2 (en) | 2011-08-16 |
JP4664142B2 (ja) | 2011-04-06 |
WO2007010971A1 (ja) | 2007-01-25 |
CN101194214B (zh) | 2010-09-29 |
CN101194214A (zh) | 2008-06-04 |
TW200715357A (en) | 2007-04-16 |
US20080087791A1 (en) | 2008-04-17 |
KR100909585B1 (ko) | 2009-07-24 |
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