KR20080014989A - 스테이지장치 - Google Patents
스테이지장치Info
- Publication number
- KR20080014989A KR20080014989A KR1020077028483A KR20077028483A KR20080014989A KR 20080014989 A KR20080014989 A KR 20080014989A KR 1020077028483 A KR1020077028483 A KR 1020077028483A KR 20077028483 A KR20077028483 A KR 20077028483A KR 20080014989 A KR20080014989 A KR 20080014989A
- Authority
- KR
- South Korea
- Prior art keywords
- support member
- axis
- support base
- wafer
- supporting
- Prior art date
Links
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Machine Tool Units (AREA)
Abstract
Description
Claims (6)
- 대상물을 지지하는 지지부재와,이 지지부재를 승강 가능하게 지지하는 승강 지지부재와,이 승강 지지부재를 Z축 둘레로 회전 가능하게 지지하는 회전 지지부재와,상기 지지부재를 Z축 방향으로 승강하는 Z축 구동수단을 가지는 스테이지장치에 있어서,상기 Z축 구동수단을 상기 회전 지지부재 상에 설치하여, 상기 지지부재를 상기 회전 지지부재에 대하여 승강시키는 것을 특징으로 하는 스테이지장치.
- 청구항 1에 있어서,상기 회전 지지부재는, 수평방향으로 이동하는 스테이지에 탑재된 것을 특징으로 하는 스테이지장치.
- 청구항 1에 있어서,상기 Z축 구동수단은, 상기 지지부재의 복수(複數) 부위를 구동시키도록 설치된 것을 특징으로 하는 스테이지장치.
- 청구항 1에 있어서,상기 Z축 구동수단은, 상기 회전 지지부재의 상면(上面)에 고정된 고정자(固 定子)와, 상기 지지부재에 결합되어 상기 고정자에 대하여 승강하는 가동자(可動子)를 가지는 것을 특징으로 하는 스테이지장치.
- 청구항 1에 있어서,상기 승강 지지부재는, 상기 회전 지지부재 상의 베어링에 의하여 Z축 둘레로 회전 가능하게 지지된 것을 특징으로 하는 스테이지장치.
- 청구항 1에 있어서,상기 지지부재는, 하면(下面) 중앙에 상기 승강 지지부재에 형성된 비(非)원형의 가이드 구멍에 승강 가능하게 끼워지는 Z축 부재를 가지는 것을 특징으로 하는 스테이지장치.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00211724 | 2005-07-21 | ||
JP2005211724A JP4664142B2 (ja) | 2005-07-21 | 2005-07-21 | ステージ装置 |
PCT/JP2006/314356 WO2007010971A1 (ja) | 2005-07-21 | 2006-07-20 | ステージ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080014989A true KR20080014989A (ko) | 2008-02-15 |
KR100909585B1 KR100909585B1 (ko) | 2009-07-24 |
Family
ID=37668843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020077028483A KR100909585B1 (ko) | 2005-07-21 | 2006-07-20 | 스테이지장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7997567B2 (ko) |
JP (1) | JP4664142B2 (ko) |
KR (1) | KR100909585B1 (ko) |
CN (1) | CN101194214B (ko) |
TW (1) | TW200715357A (ko) |
WO (1) | WO2007010971A1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190019088A (ko) * | 2016-06-20 | 2019-02-26 | 넥스페리아 비 브이 | 반도체 디바이스 위치 결정을 위한 반도체 디바이스 위치 결정 시스템과 방법 |
KR20240079390A (ko) * | 2022-11-29 | 2024-06-05 | 이노로보틱스 주식회사 | Zt 스테이지 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4976922B2 (ja) * | 2007-05-29 | 2012-07-18 | 株式会社オーク製作所 | 基板搬送装置 |
JP4750090B2 (ja) * | 2007-09-14 | 2011-08-17 | 住友重機械工業株式会社 | ステージ装置 |
JP4917050B2 (ja) * | 2008-01-23 | 2012-04-18 | 住友重機械工業株式会社 | ステージ装置 |
WO2010073514A1 (ja) * | 2008-12-25 | 2010-07-01 | 株式会社アルバック | 静電チャック用のチャックプレートの製造方法 |
US8084896B2 (en) * | 2008-12-31 | 2011-12-27 | Electro Scientific Industries, Inc. | Monolithic stage positioning system and method |
JP5137218B1 (ja) * | 2011-08-30 | 2013-02-06 | 株式会社ソディック | 工作機械 |
CN102501226B (zh) | 2011-10-31 | 2014-02-19 | 西安理工大学 | 一种宏微驱动变形导轨精密回转装置 |
CN104028944B (zh) * | 2013-03-08 | 2016-08-10 | 鸿准精密模具(昆山)有限公司 | 整形装置及其定位机构 |
CN107081607B (zh) * | 2017-02-22 | 2019-01-18 | 浙江江山福鑫工艺品有限公司 | 一种加工工件用加工台装置 |
CN113606440B (zh) * | 2021-08-05 | 2022-08-26 | 唐山师范学院 | 一种物联网用计算机支撑台 |
WO2023243135A1 (ja) * | 2022-06-15 | 2023-12-21 | 株式会社村田製作所 | 積層装置および積層システム |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2903958B2 (ja) * | 1993-06-23 | 1999-06-14 | キヤノン株式会社 | 位置決め装置及びそれを用いた半導体素子の製造方法 |
JP3196798B2 (ja) * | 1993-10-12 | 2001-08-06 | キヤノン株式会社 | 自重支持装置 |
JP3164960B2 (ja) | 1994-02-18 | 2001-05-14 | キヤノン株式会社 | ステージ装置 |
US5609332A (en) * | 1995-11-14 | 1997-03-11 | Hassell; Clayton | Device for lifting and holding cabinets |
US5682658A (en) * | 1996-03-04 | 1997-11-04 | Utica Enterprises, Inc. | Rotary index table assembly |
US6485248B1 (en) * | 2000-10-10 | 2002-11-26 | Applied Materials, Inc. | Multiple wafer lift apparatus and associated method |
JP3940277B2 (ja) * | 2001-07-13 | 2007-07-04 | 住友重機械工業株式会社 | ステージ装置 |
JP3732763B2 (ja) * | 2001-07-13 | 2006-01-11 | 住友重機械工業株式会社 | ステージ装置 |
JP4223714B2 (ja) * | 2001-11-30 | 2009-02-12 | 住友重機械工業株式会社 | ステージ装置 |
CN1588556A (zh) * | 2004-07-30 | 2005-03-02 | 中国科学院上海光学精密机械研究所 | 五自由度精密定位平台 |
US7869000B2 (en) * | 2004-11-02 | 2011-01-11 | Nikon Corporation | Stage assembly with lightweight fine stage and low transmissibility |
JP4927338B2 (ja) * | 2005-02-21 | 2012-05-09 | 住友重機械工業株式会社 | ステージ装置及びガントリ型ステージ装置及びステージ装置の制御方法 |
KR100667598B1 (ko) * | 2005-02-25 | 2007-01-12 | 주식회사 아이피에스 | 반도체 처리 장치 |
-
2005
- 2005-07-21 JP JP2005211724A patent/JP4664142B2/ja active Active
-
2006
- 2006-07-06 TW TW095124692A patent/TW200715357A/zh not_active IP Right Cessation
- 2006-07-20 KR KR1020077028483A patent/KR100909585B1/ko active IP Right Grant
- 2006-07-20 CN CN2006800204661A patent/CN101194214B/zh not_active Expired - Fee Related
- 2006-07-20 WO PCT/JP2006/314356 patent/WO2007010971A1/ja active Application Filing
-
2007
- 2007-11-14 US US11/984,170 patent/US7997567B2/en active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190019088A (ko) * | 2016-06-20 | 2019-02-26 | 넥스페리아 비 브이 | 반도체 디바이스 위치 결정을 위한 반도체 디바이스 위치 결정 시스템과 방법 |
KR20240079390A (ko) * | 2022-11-29 | 2024-06-05 | 이노로보틱스 주식회사 | Zt 스테이지 |
WO2024117283A1 (ko) * | 2022-11-29 | 2024-06-06 | 이노로보틱스 주식회사 | Zt 스테이지 |
Also Published As
Publication number | Publication date |
---|---|
US20080087791A1 (en) | 2008-04-17 |
JP4664142B2 (ja) | 2011-04-06 |
WO2007010971A1 (ja) | 2007-01-25 |
KR100909585B1 (ko) | 2009-07-24 |
TW200715357A (en) | 2007-04-16 |
TWI307916B (ko) | 2009-03-21 |
CN101194214B (zh) | 2010-09-29 |
JP2007027659A (ja) | 2007-02-01 |
CN101194214A (zh) | 2008-06-04 |
US7997567B2 (en) | 2011-08-16 |
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