KR100883739B1 - 안과 측정에서의 사용을 포함하는 웨이브프론트 센서용다이내믹영역 확장 기법 - Google Patents
안과 측정에서의 사용을 포함하는 웨이브프론트 센서용다이내믹영역 확장 기법 Download PDFInfo
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- KR100883739B1 KR100883739B1 KR1020027010362A KR20027010362A KR100883739B1 KR 100883739 B1 KR100883739 B1 KR 100883739B1 KR 1020027010362 A KR1020027010362 A KR 1020027010362A KR 20027010362 A KR20027010362 A KR 20027010362A KR 100883739 B1 KR100883739 B1 KR 100883739B1
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
- A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
- A61B3/14—Arrangements specially adapted for eye photography
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
- A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
- A61B3/103—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions for determining refraction, e.g. refractometers, skiascopes
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
- A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
- A61B3/14—Arrangements specially adapted for eye photography
- A61B3/15—Arrangements specially adapted for eye photography with means for aligning, spacing or blocking spurious reflection ; with means for relaxing
- A61B3/156—Arrangements specially adapted for eye photography with means for aligning, spacing or blocking spurious reflection ; with means for relaxing for blocking
- A61B3/158—Arrangements specially adapted for eye photography with means for aligning, spacing or blocking spurious reflection ; with means for relaxing for blocking of corneal reflection
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- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/02—Lenses; Lens systems ; Methods of designing lenses
- G02C7/024—Methods of designing ophthalmic lenses
- G02C7/027—Methods of designing ophthalmic lenses considering wearer's parameters
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Abstract
Description
Claims (25)
- 광을 발생시켜 눈(40)의 망막 위로 입사되도록 하는 투영 광학계(12, 14, 16, 18)와;상기 투영 광학계와 상기 눈(40) 사이에 위치하면서, 상기 광을 눈(40) 안에서의 굴절 오차만큼 보상하여 눈 안으로 입사되도록 하는 선보정 시스템(30)과;망막에 의해 산란되는 광을 집광하는 이미징 시스템(30)과;상기 망막에 의해 상기 이미징 시스템으로부터 되돌아오는 광을 수광하고 수광된 광의 웨이브프론트의 진폭과 위상을 검출하는 웨이브프론트 센서(50);로 이루어지는 웨이브프론트 분석 시스템에 있어서, 상기 웨이브프론트 분석 시스템은 상기 웨이브프론트 분석 시스템의 다이내믹 각도 영역을 제한하는 다이내믹 영역 제한 구멍(36)을 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항에 있어서, 상기 웨이브프론트 센서(50)는 샤크-하트만 웨이브프론트 센서, 또는 층밀림 간섭계, 또는 모와 디플렉토미터인 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 상기 선보정 시스템(30)은 적어도 하나의 이동 렌즈(32)를 구비한 망원경, 또는 중간 이미지 평면에 삽입되는 고정 렌즈(51)를 구비하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 3 항에 있어서, 상기 선보정 시스템은 적어도 하나의 가동 렌즈를 갖는 망원경을 구비하고, 상기 망원경은 망원경의 고정 렌즈(34)가 눈(40)으로부터 한 초점 거리만큼 벗어나도록 배열되어 있는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 선보정 시스템(30)은 눈(40)에서의 초점 오차, 또는 초점 및 비점수차를 보정하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 눈(40)과 상기 웨이브프론트 센서(50) 사이에 편광 빔 스플릿터(22)를 추가로 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 상기 웨이브프론트 분석 시스템의 눈(40)의 정렬을 결정짓는 정렬기 시스템(80, 82, 84, 86)를 추가로 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 상기 투영 광학계(12, 14, 16, 18)는 상기 광을 상기 눈(40)의 중앙축에 대해 일정 각도로 상기 눈으로 공급하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 상기 웨이브프론트 센서와 상기 눈(40) 사이에 광학계(51)를 추가로 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 눈(40)의 망막 위로 입사되는 광의 파워를 모니터하는 파워 모니터(46)를 추가로 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 눈(40) 위에 투영되는 타겟(90)과, 상기 눈(40)을 감지하는 위치 검출기(86)와, 상기 웨이브프론트 분석 시스템의 위치를, 눈(40)이 웨이브프론트 센서(50) 위에 초점이 맞춰질 때까지, 눈(40)에 대하여 조정하는 조정 시스템(72)을 포함하는 눈 위치 검출 시스템(72, 80, 82, 84, 86, 90, 92, 94)을 추가로 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 상기 선보정 시스템(30)은 원통형 망원경인 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항 또는 제2항에 있어서, 상기 선보정 시스템(30) 내에서 사용되는 구성요소들이 상기 이미징 시스템(30)에서도 사용되는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항에 있어서, 상기 선보정 시스템(30)에 의해 공급될 선보정을 결정짓는 피드백 루프(60, 68, 72)를 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제14항에 있어서, 상기 피드백 루프(60, 68, 72)는, 망막으로부터 되돌아오는 광을 수광하는 검출기(60)와, 검출광을 망막 위의 최소 스폿 크기와 비교하고 그 비교에 따라 선보정의 적어도 하나의 파라미터를 조정하는 프로세서(68)를 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 15 항에 있어서, 상기 피드백 루프는, 망막으로부터의 광을 수집하기 위한 복귀 광학계(return optical system)를 추가로 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 16 항에 있어서, 상기 복귀 광학계(30)는 상기 선보정 시스템(30)을 포함하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 삭제
- 제 17 항에 있어서, 상기 웨이브프론트 센서(50)는 최적 망원경 위치를 찾는데 사용되는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 17 항에 있어서, 상기 웨이브프론트 센서(50)는 상기 다이내믹 영역 제한 구멍(36)과 함께 사용되어 상기 웨이브프론트 센서(50)가 웨이브프론트 센서(50)의 다이내믹 영역 내의 데이터를 볼 수 있도록 하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 삭제
- 제 1 항에 있어서, 상기 선보정 시스템(30)은 적어도 하나의 이동 렌즈(32)를 구비하고, 상기 웨이브프론트 분석 시스템은:눈(40)에 투영되는 고정 타겟(90)과,상기 웨이브프론트 센서(50)와, 상기 고정 타겟(90) 및 상기 이동 렌즈(32)가 장착된 이동 스테이지(72)를 구비하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항에 있어서, 상기 선보정 시스템(30)은 눈에서 상기 웨이브프론트 센서(50) 사이의 경로에 위치된 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항에 있어서, 상기 선보정 시스템(30)은 눈에서 상기 웨이브프론트 센서(50) 사이의 광학 경로 및 광원(12)에서 눈까지의 광학 경로 내에 위치된 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
- 제 1 항에 있어서, 상기 선보정 시스템(30)은 상기 다이내믹 영역 제한 구멍(36)을 구비하는 것을 특징으로 하는 눈에서의 수차를 측정하기 위한 웨이브프론트 분석 시스템.
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US18208800P | 2000-02-11 | 2000-02-11 | |
US60/182088 | 2000-02-11 | ||
US09/692483 | 2000-10-20 | ||
US09/692,483 US6550917B1 (en) | 2000-02-11 | 2000-10-20 | Dynamic range extension techniques for a wavefront sensor including use in ophthalmic measurement |
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KR1020087016170A Division KR20080069716A (ko) | 2000-02-11 | 2001-02-08 | 안과 측정에서의 사용을 포함하는 웨이브프론트 센서용다이내믹영역 확장 기법 |
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KR1020027010362A KR100883739B1 (ko) | 2000-02-11 | 2001-02-08 | 안과 측정에서의 사용을 포함하는 웨이브프론트 센서용다이내믹영역 확장 기법 |
KR1020087016170A KR20080069716A (ko) | 2000-02-11 | 2001-02-08 | 안과 측정에서의 사용을 포함하는 웨이브프론트 센서용다이내믹영역 확장 기법 |
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US (2) | US6550917B1 (ko) |
EP (2) | EP2952954A1 (ko) |
JP (1) | JP5191622B2 (ko) |
KR (2) | KR100883739B1 (ko) |
AU (1) | AU5168101A (ko) |
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WO2001058339A3 (en) | 2002-07-04 |
KR20020086519A (ko) | 2002-11-18 |
JP2004500195A (ja) | 2004-01-08 |
JP5191622B2 (ja) | 2013-05-08 |
KR20080069716A (ko) | 2008-07-28 |
AU5168101A (en) | 2001-08-20 |
EP2952954A1 (en) | 2015-12-09 |
WO2001058339A2 (en) | 2001-08-16 |
WO2001058339A9 (en) | 2003-02-06 |
EP1255483A2 (en) | 2002-11-13 |
EP1255483B1 (en) | 2015-08-05 |
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