KR100882045B1 - 그루브형 서브패드를 구비한 폴리싱 장치 - Google Patents

그루브형 서브패드를 구비한 폴리싱 장치

Info

Publication number
KR100882045B1
KR100882045B1 KR1020070016242A KR20070016242A KR100882045B1 KR 100882045 B1 KR100882045 B1 KR 100882045B1 KR 1020070016242 A KR1020070016242 A KR 1020070016242A KR 20070016242 A KR20070016242 A KR 20070016242A KR 100882045 B1 KR100882045 B1 KR 100882045B1
Authority
KR
South Korea
Prior art keywords
polishing
delete delete
subpad
sheet
platen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020070016242A
Other languages
English (en)
Korean (ko)
Other versions
KR20070082573A (ko
Inventor
벤자민 에이. 본너
피터 맥레이놀즈
그레고리 이. 멘크
고파라크리쉬나 비. 프라바우
아난드 엔. 아이어
갈렌 씨. 레웅
스티븐 엠. 주니가
에릭 에스. 론둠
헨리 에이치. 오우
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 어플라이드 머티어리얼스, 인코포레이티드
Publication of KR20070082573A publication Critical patent/KR20070082573A/ko
Application granted granted Critical
Publication of KR100882045B1 publication Critical patent/KR100882045B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
    • B24B21/06—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces involving members with limited contact area pressing the belt against the work, e.g. shoes sweeping across the whole area to be ground
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
    • B24B21/12—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces involving a contact wheel or roller pressing the belt against the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/12—Lapping plates for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
KR1020070016242A 2006-02-15 2007-02-15 그루브형 서브패드를 구비한 폴리싱 장치 Active KR100882045B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77395006P 2006-02-15 2006-02-15
US60/773,950 2006-02-15

Related Child Applications (2)

Application Number Title Priority Date Filing Date
KR1020080072266A Division KR20080075470A (ko) 2006-02-15 2008-07-24 창 스트라이프를 갖는 폴리싱 부재
KR1020080072243A Division KR20080075468A (ko) 2006-02-15 2008-07-24 리세스를 갖는 서브패드를 이용한 디척킹

Publications (2)

Publication Number Publication Date
KR20070082573A KR20070082573A (ko) 2007-08-21
KR100882045B1 true KR100882045B1 (ko) 2009-02-09

Family

ID=38549354

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020070016242A Active KR100882045B1 (ko) 2006-02-15 2007-02-15 그루브형 서브패드를 구비한 폴리싱 장치
KR1020080072243A Ceased KR20080075468A (ko) 2006-02-15 2008-07-24 리세스를 갖는 서브패드를 이용한 디척킹
KR1020080072266A Ceased KR20080075470A (ko) 2006-02-15 2008-07-24 창 스트라이프를 갖는 폴리싱 부재

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020080072243A Ceased KR20080075468A (ko) 2006-02-15 2008-07-24 리세스를 갖는 서브패드를 이용한 디척킹
KR1020080072266A Ceased KR20080075470A (ko) 2006-02-15 2008-07-24 창 스트라이프를 갖는 폴리싱 부재

Country Status (5)

Country Link
US (7) US20070197145A1 (enExample)
JP (1) JP5339680B2 (enExample)
KR (3) KR100882045B1 (enExample)
CN (2) CN101244535B (enExample)
TW (1) TWI357845B (enExample)

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US9017140B2 (en) 2010-01-13 2015-04-28 Nexplanar Corporation CMP pad with local area transparency
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DE102011082777A1 (de) * 2011-09-15 2012-02-09 Siltronic Ag Verfahren zum beidseitigen Polieren einer Halbleiterscheibe
US8845394B2 (en) 2012-10-29 2014-09-30 Wayne O. Duescher Bellows driven air floatation abrading workholder
US9011207B2 (en) 2012-10-29 2015-04-21 Wayne O. Duescher Flexible diaphragm combination floating and rigid abrading workholder
US9233452B2 (en) 2012-10-29 2016-01-12 Wayne O. Duescher Vacuum-grooved membrane abrasive polishing wafer workholder
US9604339B2 (en) 2012-10-29 2017-03-28 Wayne O. Duescher Vacuum-grooved membrane wafer polishing workholder
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US8998677B2 (en) 2012-10-29 2015-04-07 Wayne O. Duescher Bellows driven floatation-type abrading workholder
US9199354B2 (en) 2012-10-29 2015-12-01 Wayne O. Duescher Flexible diaphragm post-type floating and rigid abrading workholder
US8998678B2 (en) 2012-10-29 2015-04-07 Wayne O. Duescher Spider arm driven flexible chamber abrading workholder
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JP2014113644A (ja) * 2012-12-06 2014-06-26 Toyo Tire & Rubber Co Ltd 研磨パッド
JP6209088B2 (ja) * 2013-01-25 2017-10-04 株式会社荏原製作所 研磨方法および装置
TWI599447B (zh) 2013-10-18 2017-09-21 卡博特微電子公司 具有偏移同心溝槽圖樣之邊緣排除區的ｃｍｐ拋光墊
US9475168B2 (en) * 2015-03-26 2016-10-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad window
CN109641342A (zh) * 2016-08-31 2019-04-16 应用材料公司 具有环形工作台或抛光垫的抛光系统
US10864612B2 (en) * 2016-12-14 2020-12-15 Taiwan Semiconductor Manufacturing Company, Ltd. Polishing pad and method of using
JP7227137B2 (ja) 2017-01-20 2023-02-21 アプライド マテリアルズ インコーポレイテッド Ｃｍｐ用途向けの薄いプラスチック研磨物品
CN109562506B (zh) * 2017-02-06 2021-11-12 株式会社大辉 抛光垫的凹部形成方法以及抛光垫
US10926378B2 (en) 2017-07-08 2021-02-23 Wayne O. Duescher Abrasive coated disk islands using magnetic font sheet
US11717936B2 (en) 2018-09-14 2023-08-08 Applied Materials, Inc. Methods for a web-based CMP system
TWI686857B (zh) * 2019-07-09 2020-03-01 華邦電子股份有限公司 化學機械研磨製程
US11691241B1 (en) * 2019-08-05 2023-07-04 Keltech Engineering, Inc. Abrasive lapping head with floating and rigid workpiece carrier
JP7341918B2 (ja) * 2020-02-06 2023-09-11 株式会社荏原製作所 基板処理装置および基板処理方法
CN111673607B (zh) * 2020-04-28 2021-11-26 北京烁科精微电子装备有限公司 一种化学机械平坦化设备
CN111805410A (zh) * 2020-06-01 2020-10-23 长江存储科技有限责任公司 研磨系统
CN114952539B (zh) * 2022-07-27 2022-10-18 新沂市鼎丽塑胶制品有限公司 一种瓶盖表面拉丝处理装置
CN115256062B (zh) * 2022-08-29 2024-10-15 中国计量大学 一种光流变-光化学-空化协同作用的抛光系统
CN116175397A (zh) * 2022-12-13 2023-05-30 西安奕斯伟材料科技有限公司 一种用于研磨硅片的设备和方法
JP2024094565A (ja) * 2022-12-28 2024-07-10 株式会社荏原製作所 処理装置

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Also Published As

Publication number Publication date
KR20080075468A (ko) 2008-08-18
US20070197145A1 (en) 2007-08-23
US20070197134A1 (en) 2007-08-23
US20070197132A1 (en) 2007-08-23
TW200734119A (en) 2007-09-16
JP2007227915A (ja) 2007-09-06
TWI357845B (en) 2012-02-11
US7553214B2 (en) 2009-06-30
US7841925B2 (en) 2010-11-30
KR20080075470A (ko) 2008-08-18
CN101244535A (zh) 2008-08-20
CN101058169A (zh) 2007-10-24
US20090253358A1 (en) 2009-10-08
CN101244535B (zh) 2012-06-13
JP5339680B2 (ja) 2013-11-13
US20070197133A1 (en) 2007-08-23
KR20070082573A (ko) 2007-08-21
US20070197141A1 (en) 2007-08-23
US20070197147A1 (en) 2007-08-23
US7601050B2 (en) 2009-10-13

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