KR100880725B1 - Ｐｄｐ 전극용 감광성 페이스트 조성물, ｐｄｐ 전극, 및이를 포함하는 플라즈마 디스플레이 패널 - Google Patents

Ｐｄｐ 전극용 감광성 페이스트 조성물, ｐｄｐ 전극, 및이를 포함하는 플라즈마 디스플레이 패널 Download PDF

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KR100880725B1
KR100880725B1 KR1020070053742A KR20070053742A KR100880725B1 KR 100880725 B1 KR100880725 B1 KR 100880725B1 KR 1020070053742 A KR1020070053742 A KR 1020070053742A KR 20070053742 A KR20070053742 A KR 20070053742A KR 100880725 B1 KR100880725 B1 KR 100880725B1
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KR
South Korea
Prior art keywords
paste composition
photosensitive paste
weight
electrode
inorganic binder
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020070053742A
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English (en)
Korean (ko)
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KR20080105747A (ko
Inventor
이병철
남희인
김용현
김현돈
Original Assignee
제일모직주식회사
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Publication date
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Priority to KR1020070053742A priority Critical patent/KR100880725B1/ko
Priority to US12/451,790 priority patent/US8383013B2/en
Priority to JP2010510199A priority patent/JP2010529487A/ja
Priority to PCT/KR2008/002770 priority patent/WO2008147063A1/en
Priority to CN200880018132XA priority patent/CN101681098B/zh
Priority to TW097119985A priority patent/TWI374336B/zh
Publication of KR20080105747A publication Critical patent/KR20080105747A/ko
Application granted granted Critical
Publication of KR100880725B1 publication Critical patent/KR100880725B1/ko
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/22—Electrodes, e.g. special shape, material or configuration

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Organic Chemistry (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Conductive Materials (AREA)
KR1020070053742A 2007-06-01 2007-06-01 Ｐｄｐ 전극용 감광성 페이스트 조성물, ｐｄｐ 전극, 및이를 포함하는 플라즈마 디스플레이 패널 Expired - Fee Related KR100880725B1 (ko)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1020070053742A KR100880725B1 (ko) 2007-06-01 2007-06-01 Ｐｄｐ 전극용 감광성 페이스트 조성물, ｐｄｐ 전극, 및이를 포함하는 플라즈마 디스플레이 패널
US12/451,790 US8383013B2 (en) 2007-06-01 2008-05-16 Photosensitive paste composition for fabricating the plasma display panel electrode, plasma display panel electrode and plasma display panel thereby
JP2010510199A JP2010529487A (ja) 2007-06-01 2008-05-16 プラズマディスプレイパネル電極用感光性ペースト組成物、プラズマディスプレイパネル電極及びこれを備えるプラズマディスプレイパネル
PCT/KR2008/002770 WO2008147063A1 (en) 2007-06-01 2008-05-16 Photosensitive paste composition for fabricating the plasma display panel electrode, plasma display panel electrode and plasma display panel thereby
CN200880018132XA CN101681098B (zh) 2007-06-01 2008-05-16 制造等离子显示面板电极的光敏性浆料组合物、由此的等离子显示面板电极以及等离子显示面板
TW097119985A TWI374336B (en) 2007-06-01 2008-05-30 Photosensitive paste composition for fabricating the plasma display panel electrode, plasma display panel electrode and plasma display panel thereby

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070053742A KR100880725B1 (ko) 2007-06-01 2007-06-01 Ｐｄｐ 전극용 감광성 페이스트 조성물, ｐｄｐ 전극, 및이를 포함하는 플라즈마 디스플레이 패널

Publications (2)

Publication Number Publication Date
KR20080105747A KR20080105747A (ko) 2008-12-04
KR100880725B1 true KR100880725B1 (ko) 2009-02-02

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070053742A Expired - Fee Related KR100880725B1 (ko) 2007-06-01 2007-06-01 Ｐｄｐ 전극용 감광성 페이스트 조성물, ｐｄｐ 전극, 및이를 포함하는 플라즈마 디스플레이 패널

Country Status (6)

Country Link
US (1) US8383013B2 (enExample)
JP (1) JP2010529487A (enExample)
KR (1) KR100880725B1 (enExample)
CN (1) CN101681098B (enExample)
TW (1) TWI374336B (enExample)
WO (1) WO2008147063A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8329066B2 (en) * 2008-07-07 2012-12-11 Samsung Sdi Co., Ltd. Paste containing aluminum for preparing PDP electrode, method of preparing the PDP electrode using the paste and PDP electrode prepared using the method
US8436537B2 (en) * 2008-07-07 2013-05-07 Samsung Sdi Co., Ltd. Substrate structure for plasma display panel, method of manufacturing the substrate structure, and plasma display panel including the substrate structure
CN102834472B (zh) * 2010-02-05 2015-04-22 凯博瑞奥斯技术公司 光敏墨组合物和透明导体以及它们的使用方法
KR101332435B1 (ko) * 2010-11-25 2013-11-22 제일모직주식회사 전극 페이스트 조성물
CN102568651A (zh) * 2012-01-19 2012-07-11 上海大洲电子材料有限公司 一种无卤素低含银量笔记本电脑键盘用银导线浆料及应用
EP2905787A1 (en) * 2014-02-07 2015-08-12 Heraeus Deutschland GmbH & Co. KG Electro-conductive paste comprising an aliphatic mono-alcohol
CN105259306B (zh) * 2015-10-13 2017-07-11 武汉工程大学 一种纳米过渡金属氧化物敏感浆料及其制备方法和应用

Citations (4)

* Cited by examiner, † Cited by third party
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KR20020088208A (ko) * 2001-05-18 2002-11-27 주식회사 엘지이아이 표시장치용 감광성 페이스트 조성물
KR20050122498A (ko) * 2004-06-24 2005-12-29 삼성에스디아이 주식회사 감광성 페이스트 조성물, 이를 이용하여 제조된 ｐｄｐ전극, 및 이를 포함하는 ｐｄｐ
KR20060029546A (ko) * 2004-10-02 2006-04-06 삼성에스디아이 주식회사 감광성 페이스트 조성물, 이를 이용하여 제조된 ｐｄｐ전극, 및 이를 포함하는 ｐｄｐ
KR20070034958A (ko) * 2005-09-26 2007-03-29 다이요 잉키 세이조 가부시키가이샤 유리 슬러리, 및 이것을 이용한 감광성 페이스트 및플라즈마 디스플레이 패널

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US4780371A (en) * 1986-02-24 1988-10-25 International Business Machines Corporation Electrically conductive composition and use thereof
JP2001249446A (ja) * 2000-03-06 2001-09-14 Sumitomo Bakelite Co Ltd 感光性銀ペースト及びそれを用いた画像表示装置
JP4369103B2 (ja) * 2002-09-30 2009-11-18 太陽インキ製造株式会社 感光性導電ペースト及びそれを用いて電極形成したプラズマディスプレイパネル
KR100996235B1 (ko) * 2004-06-01 2010-11-25 주식회사 동진쎄미켐 ＰＤＰ 어드레스 전극용 Ｐｂ 미함유 Ａｇ 페이스트 조성물
KR101363126B1 (ko) * 2006-08-21 2014-02-13 제이에스알 가부시끼가이샤 감광성 수지 조성물, 감광성 필름 및 패턴 형성 방법
KR100829667B1 (ko) * 2006-09-07 2008-05-16 엘지전자 주식회사 전극용 페이스트 조성물, 이를 이용하여 제조된 플라즈마디스플레이 패널의 상판구조 및 그 제조방법
KR100899197B1 (ko) * 2007-04-18 2009-05-26 제일모직주식회사 착색 유리프릿을 포함하는 전극 형성용 페이스트 조성물 및이를 이용하여 제조된 전극을 포함하는 플라즈마디스플레이 패널

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Publication number Priority date Publication date Assignee Title
KR20020088208A (ko) * 2001-05-18 2002-11-27 주식회사 엘지이아이 표시장치용 감광성 페이스트 조성물
KR20050122498A (ko) * 2004-06-24 2005-12-29 삼성에스디아이 주식회사 감광성 페이스트 조성물, 이를 이용하여 제조된 ｐｄｐ전극, 및 이를 포함하는 ｐｄｐ
KR20060029546A (ko) * 2004-10-02 2006-04-06 삼성에스디아이 주식회사 감광성 페이스트 조성물, 이를 이용하여 제조된 ｐｄｐ전극, 및 이를 포함하는 ｐｄｐ
KR20070034958A (ko) * 2005-09-26 2007-03-29 다이요 잉키 세이조 가부시키가이샤 유리 슬러리, 및 이것을 이용한 감광성 페이스트 및플라즈마 디스플레이 패널

Also Published As

Publication number Publication date
JP2010529487A (ja) 2010-08-26
US20100164357A1 (en) 2010-07-01
TW200912528A (en) 2009-03-16
US8383013B2 (en) 2013-02-26
CN101681098B (zh) 2013-07-03
KR20080105747A (ko) 2008-12-04
CN101681098A (zh) 2010-03-24
TWI374336B (en) 2012-10-11
WO2008147063A1 (en) 2008-12-04

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