KR100815133B1 - 반도체소자 푸싱장치 - Google Patents
반도체소자 푸싱장치 Download PDFInfo
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- KR100815133B1 KR100815133B1 KR1020060098485A KR20060098485A KR100815133B1 KR 100815133 B1 KR100815133 B1 KR 100815133B1 KR 1020060098485 A KR1020060098485 A KR 1020060098485A KR 20060098485 A KR20060098485 A KR 20060098485A KR 100815133 B1 KR100815133 B1 KR 100815133B1
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- semiconductor device
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 86
- 238000000465 moulding Methods 0.000 claims abstract description 11
- 239000011347 resin Substances 0.000 claims abstract description 11
- 229920005989 resin Polymers 0.000 claims abstract description 11
- 238000003825 pressing Methods 0.000 claims description 54
- 238000000034 method Methods 0.000 claims description 17
- 230000005389 magnetism Effects 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (10)
- 삭제
- 삭제
- 구동부가 구비된 지지체;상기 지지체의 상측에 설치되고, 상기 구동부의 동작에 따라 전후방향으로 슬라이딩되는 베이스;상기 베이스 상면에 고정 결합된 전방블럭;상기 전방블럭의 후면에 밀착된 상태로 설치되는 후방블럭;상기 후방블럭에 결합되고, 반도체소자를 가압하는 가압부재; 및상기 전방블럭에 설치되는 자성체와 상기 자성체와의 거리를 설정하고, 상기 후방블럭에 설치되는 조절스크류로 이루어진 자력부;를 포함하되,상기 조절스크류는,상기 전방블럭과 상기 후방블럭이 분리되는 자력의 세기를 조절하는 것을 특징으로 하는 상기 반도체소자 푸싱장치.
- 구동부가 구비된 지지체;상기 지지체의 상측에 설치되고, 상기 구동부의 동작에 따라 전후방향으로 슬라이딩되는 베이스;상기 베이스 상면에 고정 결합된 전방블럭;상기 전방블럭의 후면에 밀착된 상태로 설치되는 후방블럭;상기 후방블럭에 결합되고, 반도체소자를 가압하는 가압부재;상기 전방블럭과 상기 후방블럭 내부에 설치되는 자력부;상기 후방블럭 내부에 설치되고, 상기 전방블럭과의 밀착상태를 감지하는 센서; 및상기 센서의 신호에 의해서 상기 구동부의 동작을 제어하는 제어부;를 더 포함하는 것을 특징으로 하는 반도체소자 푸싱장치.
- 제 3항 또는 제 4항에 있어서,상기 반도체소자 푸싱장치는,반도체소자가 안착된 리드프레임을 매거진에 수납시키는 장치인 것을 특징으로 하는 상기 반도체소자 푸싱장치.
- 제 5항에 있어서,상기 반도체소자 푸싱장치는,매거진에 수납된 리드프레임을 수지몰딩부로 공급하는 장치인 것을 특징으로 하는 상기 반도체소자 푸싱장치.
- (a) 구동부의 동작에 따라 베이스와 전방블럭을 전방으로 슬라이딩시키는 단 계;(b) 상기 전방블럭과 자력에 의해 밀착된 후방블럭이 상기 전방으로 위치이동되는 단계;(c) 상기 후방블럭에 결합된 가압부재가 반도체소자를 적재시킨 리드프레임을 푸싱하는 단계; 및(d) 상기 가압부재의 푸싱 에러 발생시 상기 전방블럭과 상기 후방블럭이 분리되어 자력이 해제되는 단계;를 포함하는 것을 특징으로 하는 반도체소자 푸싱방법.
- 제 7항에 있어서,상기 (a),(b),(c)의 단계는, 구동부로 인해서 동일하게 동작되는 것을 특징으로 하는 상기 반도체소자용 푸싱방법.
- 제 7항 또는 제 8항에 있어서,상기 반도체소자 푸싱방법은,상기 (d) 단계 후, 센서가 상기 전방블럭과 상기 후방블럭이 분리된 상태를 감지하는 단계; 및감지된 신호를 제어부에 전달하여 상기 구동부의 동작을 초기 상태로 복귀시키는 단계;를 더 포함하는 것을 특징으로 하는 상기 반도체소자 푸싱방법.
- 제 9항에 있어서,상기 반도체소자 푸싱방법은,상기 전방블럭과 상기 후방블럭 내부에 설치된 자력부의 거리를 조절하여 상기 블럭들의 자력 세기를 조절하는 단계;를 더 포함하는 것을 특징으로 하는 상기 반도체소자 푸싱방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020060098485A KR100815133B1 (ko) | 2006-10-10 | 2006-10-10 | 반도체소자 푸싱장치 |
Applications Claiming Priority (1)
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KR1020060098485A KR100815133B1 (ko) | 2006-10-10 | 2006-10-10 | 반도체소자 푸싱장치 |
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KR100815133B1 true KR100815133B1 (ko) | 2008-03-20 |
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KR1020060098485A KR100815133B1 (ko) | 2006-10-10 | 2006-10-10 | 반도체소자 푸싱장치 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101042889B1 (ko) | 2009-05-22 | 2011-06-21 | 주식회사 테라젠이텍스 | Lcd글래스 캐리어의 푸서 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR980012390A (ko) * | 1996-07-15 | 1998-04-30 | 문정환 | 리드프레임 푸싱장치 |
JPH10144767A (ja) | 1996-11-13 | 1998-05-29 | Tokyo Electron Ltd | 搬送アーム装置 |
JP2006049597A (ja) | 2004-08-05 | 2006-02-16 | Jel:Kk | 基板搬送装置 |
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- 2006-10-10 KR KR1020060098485A patent/KR100815133B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR980012390A (ko) * | 1996-07-15 | 1998-04-30 | 문정환 | 리드프레임 푸싱장치 |
JPH10144767A (ja) | 1996-11-13 | 1998-05-29 | Tokyo Electron Ltd | 搬送アーム装置 |
JP2006049597A (ja) | 2004-08-05 | 2006-02-16 | Jel:Kk | 基板搬送装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101042889B1 (ko) | 2009-05-22 | 2011-06-21 | 주식회사 테라젠이텍스 | Lcd글래스 캐리어의 푸서 |
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