KR100813320B1 - 다광자 감광 시스템 - Google Patents

다광자 감광 시스템 Download PDF

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Publication number
KR100813320B1
KR100813320B1 KR1020027017095A KR20027017095A KR100813320B1 KR 100813320 B1 KR100813320 B1 KR 100813320B1 KR 1020027017095 A KR1020027017095 A KR 1020027017095A KR 20027017095 A KR20027017095 A KR 20027017095A KR 100813320 B1 KR100813320 B1 KR 100813320B1
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South Korea
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multiphoton
salts
electron
acid
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KR1020027017095A
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Korean (ko)
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KR20030011354A (ko
Inventor
데보로버트제이
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 캄파니
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Glass Compositions (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
KR1020027017095A 2000-06-15 2001-06-14 다광자 감광 시스템 Expired - Fee Related KR100813320B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21170300P 2000-06-15 2000-06-15
US60/211,703 2000-06-15
PCT/US2001/019164 WO2001096409A2 (en) 2000-06-15 2001-06-14 Multiphoton photosensitization system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020077025222A Division KR20070118164A (ko) 2000-06-15 2001-06-14 다광자 감광 시스템

Publications (2)

Publication Number Publication Date
KR20030011354A KR20030011354A (ko) 2003-02-07
KR100813320B1 true KR100813320B1 (ko) 2008-03-12

Family

ID=22788007

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020027017095A Expired - Fee Related KR100813320B1 (ko) 2000-06-15 2001-06-14 다광자 감광 시스템
KR1020077025222A Ceased KR20070118164A (ko) 2000-06-15 2001-06-14 다광자 감광 시스템

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020077025222A Ceased KR20070118164A (ko) 2000-06-15 2001-06-14 다광자 감광 시스템

Country Status (7)

Country Link
EP (1) EP1297021B1 (enExample)
JP (1) JP5059273B2 (enExample)
KR (2) KR100813320B1 (enExample)
AT (1) ATE425993T1 (enExample)
AU (1) AU2001268443A1 (enExample)
DE (1) DE60138021D1 (enExample)
WO (1) WO2001096409A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170002937U (ko) 2016-02-12 2017-08-22 주식회사 오엠티 수납장용 레일 조립체

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US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
EP1295180B1 (en) * 2000-06-15 2013-05-22 3M Innovative Properties Company Process for producing microfluidic articles
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US6716995B2 (en) 2000-08-17 2004-04-06 Lumera Corporation Design and synthesis of advanced NLO materials for electro-optic applications
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
JP4001118B2 (ja) 2003-03-24 2007-10-31 ソニー株式会社 有機電界発光素子及びアミノモノスチリルナフタレン化合物
US20050046915A1 (en) * 2003-08-22 2005-03-03 Fuji Photo Film Co., Ltd. Hologram recording material composition, hologram recording material and hologram recording method
EP1510862A3 (en) 2003-08-25 2006-08-09 Fuji Photo Film Co., Ltd. Hologram recording method and hologram recording material
JP4556531B2 (ja) * 2003-09-09 2010-10-06 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JP2008181143A (ja) * 2003-09-09 2008-08-07 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
US7655376B2 (en) 2003-12-05 2010-02-02 3M Innovative Properties Company Process for producing photonic crystals and controlled defects therein
DE602004018483D1 (de) * 2004-07-30 2009-01-29 Agfa Graphics Nv Fotopolymerisierbare Zusammensetzung.
DE102004055733B3 (de) * 2004-11-18 2006-05-04 Kodak Polychrome Graphics Gmbh Lithographie-Druckplattenvorläufer mit oligomeren oder polymeren Sensibilisatoren
US7297374B1 (en) 2004-12-29 2007-11-20 3M Innovative Properties Company Single- and multi-photon polymerizable pre-ceramic polymeric compositions
WO2006071907A1 (en) 2004-12-29 2006-07-06 3M Innovative Properties Company Multi-photon polymerizable pre-ceramic polymeric compositions
JP2006289613A (ja) * 2005-04-05 2006-10-26 Fuji Photo Film Co Ltd ２光子吸収光記録材料、２光子吸収光記録媒体及びその記録再生方法、並びに２光子吸収光記録再生装置
JP2007078894A (ja) * 2005-09-12 2007-03-29 Fujifilm Corp 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
WO2007112309A2 (en) * 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
JP5229521B2 (ja) * 2006-09-15 2013-07-03 株式会社リコー π共役系化合物とその用途、およびそれらを用いた素子、装置
JP5162511B2 (ja) * 2009-03-25 2013-03-13 富士フイルム株式会社 非共鳴２光子吸収重合用組成物及びそれを用いた３次元光記録媒体
PH12013501817A1 (en) * 2011-03-07 2013-10-14 Sanyo Chemical Ind Ltd Photosensitive composition, cured article, and method for producing actinically cured article
EP2699965A2 (en) * 2011-04-22 2014-02-26 3M Innovative Properties Company Enhanced multi-photon imaging resolution method
CN102768466A (zh) * 2011-05-05 2012-11-07 中国科学院理化技术研究所 化学增幅型正性光刻胶、制备方法及其在双光子精细加工中的应用
TWI475321B (zh) * 2013-03-06 2015-03-01 Chi Mei Corp 感光性樹脂組成物及其應用
CN105917275B (zh) * 2013-12-06 2018-01-16 3M创新有限公司 液体光反应性组合物以及制造结构的方法
CN107223121B (zh) * 2014-12-19 2020-10-27 科思创德国股份有限公司 湿稳定的全息介质
CN110240615A (zh) * 2018-03-09 2019-09-17 首都师范大学 新型有机小分子材料的合成方法、微晶的制备方法及其应用

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WO1998021521A1 (en) * 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use

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JPH0675374A (ja) * 1992-07-02 1994-03-18 Showa Denko Kk 光硬化性材料及び硬化方法
US5747550A (en) * 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
JPH09160238A (ja) * 1995-12-05 1997-06-20 Toyobo Co Ltd 光重合性組成物、それを用いた感光性原版およびその露光方法
JPH11116611A (ja) * 1997-10-13 1999-04-27 Tokuyama Sekiyu Kagaku Kk 光重合性組成物
JP3674336B2 (ja) * 1998-10-02 2005-07-20 凸版印刷株式会社 可視光重合性組成物

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998021521A1 (en) * 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170002937U (ko) 2016-02-12 2017-08-22 주식회사 오엠티 수납장용 레일 조립체

Also Published As

Publication number Publication date
WO2001096409A2 (en) 2001-12-20
KR20030011354A (ko) 2003-02-07
JP2004503616A (ja) 2004-02-05
EP1297021B1 (en) 2009-03-18
ATE425993T1 (de) 2009-04-15
KR20070118164A (ko) 2007-12-13
WO2001096409A3 (en) 2002-04-04
AU2001268443A1 (en) 2001-12-24
DE60138021D1 (enExample) 2009-04-30
EP1297021A2 (en) 2003-04-02
JP5059273B2 (ja) 2012-10-24

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