KR100789124B1 - 발열 제조된 고순도 이산화규소, 이의 제조방법 및 이를 이용하여 수득한 실리카 유리 및 성형품 - Google Patents
발열 제조된 고순도 이산화규소, 이의 제조방법 및 이를 이용하여 수득한 실리카 유리 및 성형품 Download PDFInfo
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- KR100789124B1 KR100789124B1 KR1020067005468A KR20067005468A KR100789124B1 KR 100789124 B1 KR100789124 B1 KR 100789124B1 KR 1020067005468 A KR1020067005468 A KR 1020067005468A KR 20067005468 A KR20067005468 A KR 20067005468A KR 100789124 B1 KR100789124 B1 KR 100789124B1
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- KR
- South Korea
- Prior art keywords
- less
- ppb
- silicon dioxide
- metal content
- sol
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/02—Pretreated ingredients
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Description
이렇게 수득한 졸을 가수분해시키고,
본 발명에 따르는, 금속 함량이 9ppm 미만임을 특징으로 하는, 발열 제조된 고순도 콜로이드성 이산화규소를 첨가하고,
Claims (11)
- 금속 함량이 9ppm 미만임을 특징으로 하는, 발열 제조된 이산화규소.
- 제1항에 있어서, 다음과 같은 금속 함량을 특징으로 하는, 발열 제조된 이산화규소.Li 10ppb 이하,Na 80ppb 이하,K 80ppb 이하,Mg 20ppb 이하,Ca 300ppb 이하,Fe 800ppb 이하,Cu 10ppb 이하,Ni 800ppb 이하,Cr 250ppb 이하,Mn 20ppb 이하,Ti 200ppb 이하,Al 600ppb 이하,Zr 80ppb 이하 및V 5ppb 이하.
- 금속 함량이 30ppb 미만인 사염화규소를 화염 속에서 고온 가수분해에 의해 반응시켜 이산화규소를 수득함을 특징으로 하는, 제1항 또는 제2항에 따르는 발열 제조된 이산화규소의 제조방법.
- 제3항에 있어서, 다음과 같은 금속 함량을 갖는 사염화규소를 화염 속에서 고온 가수분해에 의해 반응시켜 이산화규소를 수득함을 특징으로 하는, 발열 제조된 이산화규소의 제조방법.Al 1ppb 미만,B 3ppb 미만,Ca 5ppb 미만,Co 0.1ppb 미만,Cr 0.2ppb 미만,Cu 0.1ppb 미만,Fe 0.5ppb 미만,K 1ppb 미만,Mg 1ppb 미만,Mn 0.1ppb 미만,Mo 0.2ppb 미만,Na 1ppb 미만,Ni 0.2ppb 미만,Ti 0.5ppb 미만,Zn 1ppb 미만 및Zr 0.5ppb 미만.
- 제1항에 따르는 발열 제조된 이산화규소를 사용하여 제조한 유리.
- 제5항에 있어서, 졸-겔 공정으로 제조되는 유리.
- 금속 함량이 9ppm 미만인 발열 제조된 이산화규소를 사용하여 치밀화가 달성되는 동안 미량의 물을 함유하는 대기하에서 처리함을 특징으로 하는 졸-겔 공정에 따라 제조한 실리카 유리로서,185 내지 193㎚ 파장에서의 내부 광 투과율이 85%를 초과하고,193 내지 2600㎚ 파장에서의 내부 광 투과율이 99.5%를 초과하며,2600 내지 2730㎚ 파장에서의 내부 광 투과율이 99%를 초과하고,2730 내지 3200㎚ 파장에서의 내부 광 투과율이 85%를 초과하며,표준 DIN ISO 10110-4에 따르는 등급 4 이상의 줄무늬가 없는 재료이고,스트립이 없으며,음영 그래프(shadography) 내의 신호가 없음(음영 또는 강도 변화가 없음)을 특징으로 하는 실리카 유리.
- 실리콘 알콕사이드 또는 실리콘 알콕사이드와 적어도, 하나 이상의 첨가 성분의 전구체로부터 출발하여 졸을 제조하고,이렇게 수득한 졸을 가수분해시키고,본 발명에 따르는, 금속 함량이 9ppm 미만임을 특징으로 하는, 발열 제조된 콜로이드성 이산화규소를 첨가하고,생성된 혼합물을 목적하는 금형으로 주입하고,졸을 겔화시키고 고체 생성물을 신속하게 분리하고,겔을 건조시키고,겔을 900 내지 1500℃의 온도 범위에서의 열 처리로 치밀화시킴을 포함하는 방법에 따라 실온 성형으로 제조한, 산화규소로 구성된 성형품.
- 제8항에 있어서, 광섬유 방사용 예비성형품으로서 사용되는 성형품.
- 삭제
- 삭제
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10342828A DE10342828A1 (de) | 2003-09-17 | 2003-09-17 | Hochreines, pyrogen hergestelltes Siliciumdioxid |
DE10342828.3 | 2003-09-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060087570A KR20060087570A (ko) | 2006-08-02 |
KR100789124B1 true KR100789124B1 (ko) | 2007-12-28 |
Family
ID=34305816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020067005468A KR100789124B1 (ko) | 2003-09-17 | 2004-09-16 | 발열 제조된 고순도 이산화규소, 이의 제조방법 및 이를 이용하여 수득한 실리카 유리 및 성형품 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20070003770A1 (ko) |
EP (1) | EP1663888A2 (ko) |
JP (1) | JP4903045B2 (ko) |
KR (1) | KR100789124B1 (ko) |
CN (1) | CN1863733A (ko) |
DE (1) | DE10342828A1 (ko) |
WO (1) | WO2005026068A2 (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5524449B2 (ja) | 2004-10-25 | 2014-06-18 | チバ ホールディング インコーポレーテッド | 機能性ナノ粒子 |
EP1700824A1 (en) * | 2005-03-09 | 2006-09-13 | Degussa AG | Granules based on pyrogenically prepared silicon dioxide, method for their preparation and use thereof |
EP1700830A1 (en) | 2005-03-09 | 2006-09-13 | Novara Technology S.R.L. | Process for the production of monoliths by means of the invert sol-gel process |
EP1700829A1 (en) | 2005-03-09 | 2006-09-13 | Degussa AG | Process for the production of glass-monoliths by means of the sol-gel process |
PT1700831E (pt) | 2005-03-09 | 2008-01-24 | Gegussa Novara Technology Spa | Processo para a produção de monólitos por meio do processo sol-gel |
EP1717202A1 (en) * | 2005-04-29 | 2006-11-02 | Degussa AG | Sintered silicon dioxide materials |
CN102167334A (zh) * | 2011-03-18 | 2011-08-31 | 中国恩菲工程技术有限公司 | 多晶硅副产物四氯化硅处理方法 |
JP5737265B2 (ja) * | 2012-10-23 | 2015-06-17 | 信越化学工業株式会社 | 珪素酸化物及びその製造方法、負極、ならびにリチウムイオン二次電池及び電気化学キャパシタ |
CN105492110B (zh) * | 2013-07-11 | 2017-05-03 | 赢创德固赛有限公司 | 具有可变增稠效果的硅酸的制备方法 |
CN104568535A (zh) * | 2013-10-29 | 2015-04-29 | 中芯国际集成电路制造(上海)有限公司 | Vpd样品收集方法 |
FR3097802B1 (fr) | 2019-06-27 | 2021-07-02 | Qwarzo | Machine et procede pour la production de touillettes ou de batonnets de melange pour boissons |
CN110790489A (zh) * | 2019-11-28 | 2020-02-14 | 福建工程学院 | 一种低维材料掺杂的无水解凝胶玻璃的制备方法 |
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US3391997A (en) | 1964-12-21 | 1968-07-09 | Cabot Corp | Pyrogenic silica production |
US4681615A (en) | 1982-12-23 | 1987-07-21 | Seiko Epson Kabushiki Kaisha | Silica glass formation process |
WO2003078321A1 (de) * | 2002-03-18 | 2003-09-25 | Wacker-Chemie Gmbh | Hochreines silica-pulver, verfahren und vorrichtung zu seiner herstellung |
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CS223494B1 (cs) * | 1982-02-09 | 1983-10-28 | Jaromir Plesek | Způsob čištění kovalentníeh anorganických halogenidů pro optická vlakna |
DE3703079A1 (de) * | 1987-02-03 | 1988-08-11 | Rolf Dipl Chem Dr Rer Bruening | Verfahren zur herstellung von wasserfreiem synthetischem siliciumdioxid |
US4961767A (en) * | 1987-05-20 | 1990-10-09 | Corning Incorporated | Method for producing ultra-high purity, optical quality, glass articles |
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WO2003008332A1 (fr) * | 2001-07-19 | 2003-01-30 | Mitsubishi Chemical Corporation | Poudre de quartz de grande purete, procede de fabrication et article obtenu a partir de cette poudre |
JP3970692B2 (ja) * | 2002-05-31 | 2007-09-05 | 信越化学工業株式会社 | プリフォーム製造方法 |
-
2003
- 2003-09-17 DE DE10342828A patent/DE10342828A1/de not_active Withdrawn
-
2004
- 2004-09-16 CN CNA2004800268452A patent/CN1863733A/zh active Pending
- 2004-09-16 EP EP04786950A patent/EP1663888A2/en not_active Withdrawn
- 2004-09-16 KR KR1020067005468A patent/KR100789124B1/ko active IP Right Grant
- 2004-09-16 US US10/571,332 patent/US20070003770A1/en not_active Abandoned
- 2004-09-16 WO PCT/EP2004/010335 patent/WO2005026068A2/en active Application Filing
- 2004-09-16 JP JP2006526581A patent/JP4903045B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3391997A (en) | 1964-12-21 | 1968-07-09 | Cabot Corp | Pyrogenic silica production |
US4681615A (en) | 1982-12-23 | 1987-07-21 | Seiko Epson Kabushiki Kaisha | Silica glass formation process |
WO2003078321A1 (de) * | 2002-03-18 | 2003-09-25 | Wacker-Chemie Gmbh | Hochreines silica-pulver, verfahren und vorrichtung zu seiner herstellung |
Also Published As
Publication number | Publication date |
---|---|
EP1663888A2 (en) | 2006-06-07 |
DE10342828A1 (de) | 2005-04-14 |
US20070003770A1 (en) | 2007-01-04 |
CN1863733A (zh) | 2006-11-15 |
JP4903045B2 (ja) | 2012-03-21 |
WO2005026068A2 (en) | 2005-03-24 |
WO2005026068A3 (en) | 2006-04-06 |
KR20060087570A (ko) | 2006-08-02 |
JP2007505808A (ja) | 2007-03-15 |
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