KR100763982B1 - 생산관리방법 및 tft 기판의 제조방법 - Google Patents
생산관리방법 및 tft 기판의 제조방법 Download PDFInfo
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- KR100763982B1 KR100763982B1 KR1020000060717A KR20000060717A KR100763982B1 KR 100763982 B1 KR100763982 B1 KR 100763982B1 KR 1020000060717 A KR1020000060717 A KR 1020000060717A KR 20000060717 A KR20000060717 A KR 20000060717A KR 100763982 B1 KR100763982 B1 KR 100763982B1
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- 238000000034 method Methods 0.000 title claims abstract description 418
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- 238000000195 production control method Methods 0.000 claims abstract description 8
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- 238000011282 treatment Methods 0.000 claims description 7
- 238000011156 evaluation Methods 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/80—Management or planning
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Factory Administration (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
- Thin Film Transistor (AREA)
Abstract
Description
Claims (5)
- 장치군(群)을 공정군(工程群)으로 공용하고 있고, 장치의 공용관계에 의해서 서로 능력의 수수(授受)가 가능한 공정군에서, 상기 공정군의 각 공정의 제품처리능력에 대한 상기 각 공정의 필요제품처리 수의 비율인 부하율을, 중기 생산계획의 대상이 되는 조업기간 전체에서의 상기 각 공정의 누적능력에 대한 상기 각 공정의 누적생산예정의 비율로서 구하는 부하율 산출 단계,상기 부하율 산출 단계에서 산출된 상기 부하율이 상기 공정군의 각 공정에서 똑같아지도록 각 장치의 상기 각 공정에 대한 최적사용비율을 계산하는 최적사용비율 계산 단계, 및상기 최적사용비율 계산 단계에서 계산된 상기 최적사용비율을 단기 생산계획에 반영시키는 단계를 포함하는 것을 특징으로 하는 생산관리방법.
- 제1항에 있어서,상기 조업기간 전체에서의 상기 각 장치의 상기 각 공정에 대한 사용비율을 상기 최적사용비율에 똑같이 하여 상기 각 공정의 처리 예정량을 일의적으로 정하는 처리 예정량 결정 단계,상기 중기 생산계획에 대응하는 평준화된 출하예정량과 투입예정량에 대하여, 임의의 시점에서의 상기 각 공정의 실제의 재공품(work in-process)을 기초로 상기 조업기간 전체에서의 라인 전체에 걸친 재공품 추이를 계산하는 재공품 추이 계산 단계,상기 재공품 추이 계산 단계에서의 계산 결과 상기 재공품의 과부족의 발생상황에 기초하여 투입계획이나 메인티넌스 예정의 양호 여부를 평가하는 단계, 및상기 평가에 기초하여 상기 중기 생산계획에 대응하는 최적의 일당계획과, 필요에 따라서 상기 일당계획과 연동하는 상기 단기 생산계획을 작성하는 단계를 포함하는 것을 특징으로 하는 생산관리방법.
- 장치군(群)을 공정군(工程群)으로 공용하고 있고, 중기 생산계획에서의 출하예정 및 수율계획과 라인의 출하실적 및 재공품과 각 공정의 처리 예정에 기초한 처리 예정량에 대한 처리를 어떤 공정이 중단한 것을 인식하는 공정 중단 인식 단계, 및상기 공정 중단 인식 단계에서 인식된 그 공정과 장치를 공용하는 후의 공정에 상기 인식된 그 공정의 능력을 전용(轉用)하고, 상기 후의 공정의 상기 처리 예정량의 처리가 종료된 후에, 전용된 상기 능력에 상당하는 능력을 상기 인식된 그 공정으로 되돌림으로써, 납기준수를 위한 출하우선을 조절하는 단계를 포함하는 것을 특징으로 하는 생산관리방법.
- 장치군을 공정군으로 공용하고 있고, 장치의 공용관계에 의해서 서로 능력의 수수가 가능한 공정군을 포함한 라인을 2종류 이상의 품종이 흐르는 경우, 상기 공정군 중 하나의 공정에서의 하나의 품종의 제품의 가공에 사용한 장치의 이력(履歷)에, 상기 공정군 중 다른 공정에서 상기 하나의 품종의 제품의 가공에 사용할 수 있는 기기를 제약하는 사용한정조건이 존재하는 경우에,상기 공정군의 각 공정의 제품처리능력에 대한 상기 각 공정의 필요제품처리 수의 비율인 부하율이 중기 생산계획의 대상이 되는 조업기간의 누적처리에 대하여 똑같아지도록 상기 각 장치의 상기 각 공정과 상기 품종에 대한 최적사용비율을 계산하는 최적사용비율 계산 단계, 및상기 최적사용비율 계산 단계에서 계산된 상기 최적사용비율을 단기 생산계획에 반영시키는 단계를 포함하는 것을 특징으로 하는 생산관리방법.
- 매트릭스 형상의 복수의 화소영역의 각각에 박막 트랜지스터를 형성하는 TFT기판의 제조방법에 있어서,청구항 1 내지 4 중 어느 한 항에 기재된 생산관리방법을 사용하는 것을 특징으로 하는 TFT기판의 제조방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2000-85434 | 2000-03-24 | ||
JP2000085434A JP4455720B2 (ja) | 2000-03-24 | 2000-03-24 | 生産管理方法およびtft基板の製造方法 |
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Publication Number | Publication Date |
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KR20010092646A KR20010092646A (ko) | 2001-10-26 |
KR100763982B1 true KR100763982B1 (ko) | 2007-10-08 |
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KR1020000060717A Expired - Fee Related KR100763982B1 (ko) | 2000-03-24 | 2000-10-16 | 생산관리방법 및 tft 기판의 제조방법 |
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JP (1) | JP4455720B2 (ko) |
KR (1) | KR100763982B1 (ko) |
TW (1) | TW503346B (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4546654B2 (ja) * | 2001-02-14 | 2010-09-15 | シャープ株式会社 | 生産管理方法 |
JP2003271230A (ja) | 2002-03-19 | 2003-09-26 | Fujitsu Display Technologies Corp | 生産管理方法および電子機器の製造方法 |
JP2005316934A (ja) | 2004-03-30 | 2005-11-10 | Sharp Corp | 生産管理方法及び工業製品の製造方法 |
JP4181522B2 (ja) | 2004-04-12 | 2008-11-19 | 沖電気工業株式会社 | 製造工程管理方法 |
JP4598562B2 (ja) * | 2005-03-01 | 2010-12-15 | シャープ株式会社 | 生産管理方法及び工業製品の製造方法 |
JP5015829B2 (ja) * | 2008-03-13 | 2012-08-29 | ルネサスエレクトロニクス株式会社 | 設備負荷率算出システム、プログラム、及び方法 |
TWI447596B (zh) * | 2010-12-31 | 2014-08-01 | Zhen Ding Technology Co Ltd | 損耗計算系統及損耗計算方法 |
DE202016100429U1 (de) | 2016-01-29 | 2016-02-16 | Cheng Chung Ho | Steuergerät für eine Fahrzeugbeleuchtung |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05108114A (ja) * | 1991-10-15 | 1993-04-30 | Nec Corp | 生産ライン工程着手制御方式 |
KR19980702691A (ko) * | 1995-03-10 | 1998-08-05 | 디터크리스트 | 생산 시스템의 제어 방법 |
KR19990050850A (ko) * | 1997-12-17 | 1999-07-05 | 윤종용 | 반도체 생산제어 시스템의 공정 제어방법 |
JPH11328267A (ja) * | 1998-05-14 | 1999-11-30 | Toshiba Corp | 工程管理装置、製造システム及びその工程管理方法 |
-
2000
- 2000-03-24 JP JP2000085434A patent/JP4455720B2/ja not_active Expired - Fee Related
- 2000-10-05 TW TW089120789A patent/TW503346B/zh not_active IP Right Cessation
- 2000-10-16 KR KR1020000060717A patent/KR100763982B1/ko not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05108114A (ja) * | 1991-10-15 | 1993-04-30 | Nec Corp | 生産ライン工程着手制御方式 |
KR19980702691A (ko) * | 1995-03-10 | 1998-08-05 | 디터크리스트 | 생산 시스템의 제어 방법 |
KR19990050850A (ko) * | 1997-12-17 | 1999-07-05 | 윤종용 | 반도체 생산제어 시스템의 공정 제어방법 |
JPH11328267A (ja) * | 1998-05-14 | 1999-11-30 | Toshiba Corp | 工程管理装置、製造システム及びその工程管理方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20010092646A (ko) | 2001-10-26 |
JP2001273023A (ja) | 2001-10-05 |
JP4455720B2 (ja) | 2010-04-21 |
TW503346B (en) | 2002-09-21 |
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