KR100729061B1 - 특정골격을 갖는 디알킬아미노기 함유 중합체 및 유기유황화합물을 첨가제로서 포함하는 구리전해액 및 이것에 의해제조되는 전해구리박 - Google Patents

특정골격을 갖는 디알킬아미노기 함유 중합체 및 유기유황화합물을 첨가제로서 포함하는 구리전해액 및 이것에 의해제조되는 전해구리박 Download PDF

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Publication number
KR100729061B1
KR100729061B1 KR1020067000706A KR20067000706A KR100729061B1 KR 100729061 B1 KR100729061 B1 KR 100729061B1 KR 1020067000706 A KR1020067000706 A KR 1020067000706A KR 20067000706 A KR20067000706 A KR 20067000706A KR 100729061 B1 KR100729061 B1 KR 100729061B1
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KR
South Korea
Prior art keywords
copper foil
group
compound
dialkylamino group
electrolytic
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KR1020067000706A
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English (en)
Korean (ko)
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KR20060026963A (ko
Inventor
가쓰유키 쓰치다
마사시 구마가이
미키오 하나후사
Original Assignee
닛코킨조쿠 가부시키가이샤
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Application filed by 닛코킨조쿠 가부시키가이샤 filed Critical 닛코킨조쿠 가부시키가이샤
Publication of KR20060026963A publication Critical patent/KR20060026963A/ko
Application granted granted Critical
Publication of KR100729061B1 publication Critical patent/KR100729061B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C3/00—Electrolytic production, recovery or refining of metals by electrolysis of melts
    • C25C3/06—Electrolytic production, recovery or refining of metals by electrolysis of melts of aluminium
    • C25C3/18—Electrolytes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Laminated Bodies (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
KR1020067000706A 2003-07-29 2004-06-16 특정골격을 갖는 디알킬아미노기 함유 중합체 및 유기유황화합물을 첨가제로서 포함하는 구리전해액 및 이것에 의해제조되는 전해구리박 KR100729061B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003202920 2003-07-29
JPJP-P-2003-00202920 2003-07-29

Publications (2)

Publication Number Publication Date
KR20060026963A KR20060026963A (ko) 2006-03-24
KR100729061B1 true KR100729061B1 (ko) 2007-06-14

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Application Number Title Priority Date Filing Date
KR1020067000706A KR100729061B1 (ko) 2003-07-29 2004-06-16 특정골격을 갖는 디알킬아미노기 함유 중합체 및 유기유황화합물을 첨가제로서 포함하는 구리전해액 및 이것에 의해제조되는 전해구리박

Country Status (5)

Country Link
JP (1) JP4255130B2 (zh)
KR (1) KR100729061B1 (zh)
CN (1) CN1806067B (zh)
TW (1) TWI250226B (zh)
WO (1) WO2005010239A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130256140A1 (en) 2010-11-15 2013-10-03 Jx Nippon Mining & Metals Corporation Electrolytic copper foil
EP2735627A1 (en) * 2012-11-26 2014-05-28 ATOTECH Deutschland GmbH Copper plating bath composition
JP5810197B2 (ja) * 2013-09-11 2015-11-11 古河電気工業株式会社 電解銅箔、フレキシブル配線板及び電池
KR102377286B1 (ko) 2017-03-23 2022-03-21 에스케이넥실리스 주식회사 리튬 이온 2차전지, 이 2차전지의 음극 전극을 구성하는 집전체 및 이 음극 집전체를 구성하는 전해동박

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040076847A (ko) * 2002-12-25 2004-09-03 가부시키 가이샤 닛코 마테리알즈 특정골격을 갖는 4급아민화합물 중합체 및유기유황화합물을 첨가제로서 포함하는 동전해액 및그것에 의하여 제조되는 전해동박

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57114685A (en) * 1981-01-07 1982-07-16 Kuraray Co Ltd Brightener for plating bath
JP3313277B2 (ja) * 1995-09-22 2002-08-12 古河サーキットフォイル株式会社 ファインパターン用電解銅箔とその製造方法
US5863410A (en) * 1997-06-23 1999-01-26 Circuit Foil Usa, Inc. Process for the manufacture of high quality very low profile copper foil and copper foil produced thereby
JP3506411B2 (ja) * 1997-12-29 2004-03-15 日本表面化学株式会社 亜鉛めっき方法
LU90532B1 (en) * 2000-02-24 2001-08-27 Circuit Foil Luxembourg Trading Sarl Comosite copper foil and manufacturing method thereof
KR100389061B1 (ko) * 2002-11-14 2003-06-25 일진소재산업주식회사 전해 동박 제조용 전해액 및 이를 이용한 전해 동박 제조방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040076847A (ko) * 2002-12-25 2004-09-03 가부시키 가이샤 닛코 마테리알즈 특정골격을 갖는 4급아민화합물 중합체 및유기유황화합물을 첨가제로서 포함하는 동전해액 및그것에 의하여 제조되는 전해동박

Also Published As

Publication number Publication date
WO2005010239A1 (ja) 2005-02-03
TW200506097A (en) 2005-02-16
CN1806067B (zh) 2010-06-16
CN1806067A (zh) 2006-07-19
TWI250226B (en) 2006-03-01
JP4255130B2 (ja) 2009-04-15
KR20060026963A (ko) 2006-03-24
JPWO2005010239A1 (ja) 2006-09-07

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