KR100725672B1 - 단결정 인상장치에서의 탕루 수용대 - Google Patents
단결정 인상장치에서의 탕루 수용대 Download PDFInfo
- Publication number
- KR100725672B1 KR100725672B1 KR1020017013980A KR20017013980A KR100725672B1 KR 100725672 B1 KR100725672 B1 KR 100725672B1 KR 1020017013980 A KR1020017013980 A KR 1020017013980A KR 20017013980 A KR20017013980 A KR 20017013980A KR 100725672 B1 KR100725672 B1 KR 100725672B1
- Authority
- KR
- South Korea
- Prior art keywords
- single crystal
- molten
- crucible
- molten pool
- melt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B15/00—Drawing glass upwardly from the melt
- C03B15/02—Drawing glass sheets
- C03B15/10—Drawing glass sheets multi-layer glass sheets or glass sheets coated with coloured layers
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1052—Seed pulling including a sectioned crucible [e.g., double crucible, baffle]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Description
Claims (8)
- 쵸크랄스키법에 의한 단결정인상장치의 챔버 저부(底部)에서 도가니의 하부로 배설된 탕루(湯漏) 수용대(受皿)에 있어서,적어도 상기 탕루 수용대가 저부(底部)와 통부(筒部)로 구성되고, 저부와 통부의 접합이 나사결합 또는 고정 볼트(stud bolt)로 되어 있는 것을 특징으로 하는 단결정인상장치의 탕루 수용대.
- 제 1항에 있어서, 상기 탕루 수용대가 흑연재제(黑鉛材製) 수용대 본체와 본체내벽에 발려진 단열재로 구성되어 있는 것을 특징으로 하는 단결정인상장치의 탕루 수용대.
- 제 2항에 있어서, 상기 흑연재가 등방성 흑연이고, 단열재가 탄소섬유제(製) 성형재(成形材)인 것을 특징으로 하는 단결정인상장치의 탕루 수용대.
- 제 1항에 있어서, 상기 탕루 수용대가 적어도 용융원료의 전량을 수용할 수 있는 내용적을 가지고 있는 것을 특징으로 하는 단결정인상장치의 탕루 수용대.
- 제 2항에 있어서, 상기 탕루 수용대가 적어도 용융원료의 전량을 수용할 수 있는 내용적을 가지고 있는 것을 특징으로 하는 단결정인상장치의 탕루 수용대.
- 제 3항에 있어서, 상기 탕루 수용대가 적어도 용융원료의 전량을 수용할 수 있는 내용적을 가지고 있는 것을 특징으로 하는 단결정인상장치의 탕루 수용대.
- 쵸크랄스키법에 의한 실리콘 단결정 인상장치로서, 챔버의 저부에서 도가니의 하부에 배설된 탕루 수용대를 구비하고, 이 탕루 수용대는 제1항 내지 제6항 중 어느 한 항에 기재된 탕루 수용대인 것을 특징으로 하는 단결정인상장치.
- 쵸크랄스키법에 의한 실리콘 단결정 인상방법에 있어서, 청구항 7항에 기재된 단결정인상장치를 사용하여 단결정을 인상하는 것을 특징으로 하는 단결정인상방법.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2000-00059400 | 2000-03-03 | ||
| JP2000059400 | 2000-03-03 | ||
| PCT/JP2001/001371 WO2001064976A1 (en) | 2000-03-03 | 2001-02-23 | Saucer for escaped melt in apparatus for pulling up single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20020008171A KR20020008171A (ko) | 2002-01-29 |
| KR100725672B1 true KR100725672B1 (ko) | 2007-06-08 |
Family
ID=18579855
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020017013980A Expired - Fee Related KR100725672B1 (ko) | 2000-03-03 | 2001-02-23 | 단결정 인상장치에서의 탕루 수용대 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6605152B2 (ko) |
| EP (1) | EP1191130B1 (ko) |
| JP (1) | JP3741043B2 (ko) |
| KR (1) | KR100725672B1 (ko) |
| DE (1) | DE60140507D1 (ko) |
| TW (1) | TW527449B (ko) |
| WO (1) | WO2001064976A1 (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101327991B1 (ko) * | 2011-08-31 | 2013-11-13 | 한국화학연구원 | 실리콘 누출방지 시스템을 갖춘 실리콘 잉곳 제조 장치 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7955433B2 (en) * | 2007-07-26 | 2011-06-07 | Calisolar, Inc. | Method and system for forming a silicon ingot using a low-grade silicon feedstock |
| TW200930851A (en) * | 2008-01-03 | 2009-07-16 | Green Energy Technology Inc | Crystal growth furnace having guiding structure for overflow slurry |
| EP2748355B1 (en) * | 2011-08-26 | 2016-08-10 | Consarc Corporation | Purification of a metalloid by consumable electrode vacuum arc remelt process |
| CN102400231A (zh) * | 2011-11-15 | 2012-04-04 | 宁夏日晶新能源装备股份有限公司 | 单晶炉热场中轴挡料罩结构 |
| JP5891959B2 (ja) | 2012-06-04 | 2016-03-23 | 信越半導体株式会社 | 単結晶製造装置 |
| JP2014091656A (ja) * | 2012-11-05 | 2014-05-19 | Shin Etsu Handotai Co Ltd | 単結晶製造装置の湯漏れ検出器 |
| JP6610226B2 (ja) * | 2015-12-08 | 2019-11-27 | 信越半導体株式会社 | 半導体単結晶棒の製造装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0312299U (ko) * | 1989-06-21 | 1991-02-07 | ||
| JP3012299U (ja) * | 1994-12-09 | 1995-06-13 | 東洋炭素株式会社 | シリコン単結晶引上げ用黒鉛ルツボ |
| JPH08259378A (ja) * | 1995-03-27 | 1996-10-08 | Ibiden Co Ltd | 単結晶引上装置用ヒーター |
| JP2551383Y2 (ja) * | 1990-09-18 | 1997-10-22 | 日本カーボン株式会社 | メルトレシーブ容器 |
| JPH10182288A (ja) * | 1996-12-26 | 1998-07-07 | Ibiden Co Ltd | シリコン単結晶引き上げ装置用の炭素製受皿 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5382419A (en) * | 1992-09-28 | 1995-01-17 | Advanced Silicon Materials, Inc. | Production of high-purity polycrystalline silicon rod for semiconductor applications |
| JP2937104B2 (ja) * | 1996-02-13 | 1999-08-23 | 住友金属工業株式会社 | 単結晶引き上げ装置 |
| WO1997049844A1 (en) * | 1996-06-27 | 1997-12-31 | Toyo Tanso Co., Ltd. | Crucible for crystal pulling and method of manufacturing same |
| US6308767B1 (en) * | 1999-12-21 | 2001-10-30 | General Electric Company | Liquid metal bath furnace and casting method |
-
2001
- 2001-02-23 WO PCT/JP2001/001371 patent/WO2001064976A1/ja not_active Ceased
- 2001-02-23 JP JP2001563658A patent/JP3741043B2/ja not_active Expired - Fee Related
- 2001-02-23 US US09/959,593 patent/US6605152B2/en not_active Expired - Lifetime
- 2001-02-23 KR KR1020017013980A patent/KR100725672B1/ko not_active Expired - Fee Related
- 2001-02-23 DE DE60140507T patent/DE60140507D1/de not_active Expired - Lifetime
- 2001-02-23 EP EP01906268A patent/EP1191130B1/en not_active Expired - Lifetime
- 2001-03-02 TW TW090104853A patent/TW527449B/zh not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0312299U (ko) * | 1989-06-21 | 1991-02-07 | ||
| JP2551383Y2 (ja) * | 1990-09-18 | 1997-10-22 | 日本カーボン株式会社 | メルトレシーブ容器 |
| JP3012299U (ja) * | 1994-12-09 | 1995-06-13 | 東洋炭素株式会社 | シリコン単結晶引上げ用黒鉛ルツボ |
| JPH08259378A (ja) * | 1995-03-27 | 1996-10-08 | Ibiden Co Ltd | 単結晶引上装置用ヒーター |
| JPH10182288A (ja) * | 1996-12-26 | 1998-07-07 | Ibiden Co Ltd | シリコン単結晶引き上げ装置用の炭素製受皿 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101327991B1 (ko) * | 2011-08-31 | 2013-11-13 | 한국화학연구원 | 실리콘 누출방지 시스템을 갖춘 실리콘 잉곳 제조 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20020157602A1 (en) | 2002-10-31 |
| WO2001064976A1 (en) | 2001-09-07 |
| JP3741043B2 (ja) | 2006-02-01 |
| EP1191130A1 (en) | 2002-03-27 |
| TW527449B (en) | 2003-04-11 |
| US6605152B2 (en) | 2003-08-12 |
| EP1191130A4 (en) | 2008-02-27 |
| DE60140507D1 (de) | 2009-12-31 |
| KR20020008171A (ko) | 2002-01-29 |
| EP1191130B1 (en) | 2009-11-18 |
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