KR100625320B1 - 기판 세정 설비의 기능수 공급 장치 - Google Patents

기판 세정 설비의 기능수 공급 장치 Download PDF

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Publication number
KR100625320B1
KR100625320B1 KR1020050022601A KR20050022601A KR100625320B1 KR 100625320 B1 KR100625320 B1 KR 100625320B1 KR 1020050022601 A KR1020050022601 A KR 1020050022601A KR 20050022601 A KR20050022601 A KR 20050022601A KR 100625320 B1 KR100625320 B1 KR 100625320B1
Authority
KR
South Korea
Prior art keywords
gas
functional water
liquid
injector
storage tank
Prior art date
Application number
KR1020050022601A
Other languages
English (en)
Korean (ko)
Inventor
최용남
배정용
Original Assignee
세메스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세메스 주식회사 filed Critical 세메스 주식회사
Priority to KR1020050022601A priority Critical patent/KR100625320B1/ko
Priority to JP2006071653A priority patent/JP4077845B2/ja
Priority to TW95108936A priority patent/TWI363382B/zh
Priority to US11/377,679 priority patent/US7617836B2/en
Priority to CNB2006100655121A priority patent/CN100451440C/zh
Application granted granted Critical
Publication of KR100625320B1 publication Critical patent/KR100625320B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020050022601A 2005-03-18 2005-03-18 기판 세정 설비의 기능수 공급 장치 KR100625320B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020050022601A KR100625320B1 (ko) 2005-03-18 2005-03-18 기판 세정 설비의 기능수 공급 장치
JP2006071653A JP4077845B2 (ja) 2005-03-18 2006-03-15 機能水供給システム、及び機能水供給方法
TW95108936A TWI363382B (en) 2005-03-18 2006-03-16 System and method for supplying functional water
US11/377,679 US7617836B2 (en) 2005-03-18 2006-03-17 System and method for supplying functional water
CNB2006100655121A CN100451440C (zh) 2005-03-18 2006-03-20 用于供应功能水的系统和方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050022601A KR100625320B1 (ko) 2005-03-18 2005-03-18 기판 세정 설비의 기능수 공급 장치

Publications (1)

Publication Number Publication Date
KR100625320B1 true KR100625320B1 (ko) 2006-09-20

Family

ID=37002380

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050022601A KR100625320B1 (ko) 2005-03-18 2005-03-18 기판 세정 설비의 기능수 공급 장치

Country Status (2)

Country Link
KR (1) KR100625320B1 (zh)
CN (1) CN100451440C (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100898049B1 (ko) * 2007-09-28 2009-05-19 세메스 주식회사 처리액 공급장치 및 그 방법
KR20150056182A (ko) * 2013-11-15 2015-05-26 한국기계연구원 오존 미세 기포를 이용한 유기물 세정 장치

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102345790A (zh) * 2011-06-29 2012-02-08 云南大红山管道有限公司 管道输送浆体的浓缩自循环系统及其控制方法
US20160290372A1 (en) * 2015-04-01 2016-10-06 Deere & Company Fluid circulation system
TWI576149B (zh) * 2016-04-01 2017-04-01 巫錦滄 氫水機
CN111998228A (zh) * 2020-08-27 2020-11-27 西藏华泰龙矿业开发有限公司 一种多进多出管道联通分配装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037080B2 (ja) * 1981-09-25 1985-08-23 日本化学工業株式会社 Ｃｒ２ｏ３ウイスカ−の製造方法
JPH09253173A (ja) * 1996-03-26 1997-09-30 Takenaka Denki:Kk オゾン水供給システム
US5971368A (en) * 1997-10-29 1999-10-26 Fsi International, Inc. System to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized
US6135433A (en) * 1998-02-27 2000-10-24 Air Liquide America Corporation Continuous gas saturation system and method
US6142458A (en) * 1998-10-29 2000-11-07 General Signal Corporation Mixing system for dispersion of gas into liquid media
JP2004148256A (ja) * 2002-10-31 2004-05-27 San Seal:Kk 循環水利用設備の殺菌脱臭方法及び殺菌脱臭装置
JP2004154260A (ja) * 2002-11-05 2004-06-03 Puequ Co Ltd 加圧式水供給装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100898049B1 (ko) * 2007-09-28 2009-05-19 세메스 주식회사 처리액 공급장치 및 그 방법
KR20150056182A (ko) * 2013-11-15 2015-05-26 한국기계연구원 오존 미세 기포를 이용한 유기물 세정 장치
KR101688638B1 (ko) * 2013-11-15 2016-12-21 한국기계연구원 오존 미세 기포를 이용한 유기물 세정 장치

Also Published As

Publication number Publication date
CN1834526A (zh) 2006-09-20
CN100451440C (zh) 2009-01-14

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