KR100532796B1 - 디바이스의 형상 패턴화 방법 및 상기 방법에 의해 제조된 mems 디바이스 - Google Patents

디바이스의 형상 패턴화 방법 및 상기 방법에 의해 제조된 mems 디바이스 Download PDF

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Publication number
KR100532796B1
KR100532796B1 KR10-2003-7000506A KR20037000506A KR100532796B1 KR 100532796 B1 KR100532796 B1 KR 100532796B1 KR 20037000506 A KR20037000506 A KR 20037000506A KR 100532796 B1 KR100532796 B1 KR 100532796B1
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South Korea
Prior art keywords
patterning
shape
pattern
mems device
mems
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Expired - Fee Related
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KR10-2003-7000506A
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English (en)
Korean (ko)
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KR20030019573A (ko
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진 에딘 보우타고우
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시게이트 테크놀로지 엘엘씨
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00103—Structures having a predefined profile, e.g. sloped or rounded grooves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00388—Etch mask forming
    • B81C1/00404—Mask characterised by its size, orientation or shape
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00523—Etching material
    • B81C1/00547—Etching processes not provided for in groups B81C1/00531 - B81C1/00539
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B81C1/00626—Processes for achieving a desired geometry not provided for in groups B81C1/00563 - B81C1/00619
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
    • C04B41/5338—Etching
    • C04B41/5346—Dry etching
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/91—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
    • G11B5/4806—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed specially adapted for disk drive assemblies, e.g. assembly prior to operation, hard or flexible disk drives
    • G11B5/4813—Mounting or aligning of arm assemblies, e.g. actuator arm supported by bearings, multiple arm assemblies, arm stacks or multiple heads on single arm
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0323—Grooves
    • B81B2203/0346—Grooves not provided for in B81B2203/033 - B81B2203/0338
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0361—Tips, pillars
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0369—Static structures characterized by their profile
    • B81B2203/0376—Static structures characterized by their profile rounded profile
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128—Processes for removing material
    • B81C2201/013—Etching
    • B81C2201/0133—Wet etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Micromachines (AREA)
  • Moving Of Heads (AREA)
  • Supporting Of Heads In Record-Carrier Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR10-2003-7000506A 2000-07-13 2001-07-13 디바이스의 형상 패턴화 방법 및 상기 방법에 의해 제조된 mems 디바이스 Expired - Fee Related KR100532796B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21826300P 2000-07-13 2000-07-13
US60/218,263 2000-07-13
PCT/US2001/022037 WO2002006061A1 (en) 2000-07-13 2001-07-13 Method for topographical patterning of a device

Publications (2)

Publication Number Publication Date
KR20030019573A KR20030019573A (ko) 2003-03-06
KR100532796B1 true KR100532796B1 (ko) 2005-12-02

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2003-7000506A Expired - Fee Related KR100532796B1 (ko) 2000-07-13 2001-07-13 디바이스의 형상 패턴화 방법 및 상기 방법에 의해 제조된 mems 디바이스

Country Status (6)

Country Link
US (1) US7129179B2 (enExample)
JP (1) JP2004508946A (enExample)
KR (1) KR100532796B1 (enExample)
AU (1) AU2002222920A1 (enExample)
GB (1) GB2381383A (enExample)
WO (1) WO2002006061A1 (enExample)

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US6786420B1 (en) 1997-07-15 2004-09-07 Silverbrook Research Pty. Ltd. Data distribution mechanism in the form of ink dots on cards
US6618117B2 (en) 1997-07-12 2003-09-09 Silverbrook Research Pty Ltd Image sensing apparatus including a microcontroller
US6985207B2 (en) * 1997-07-15 2006-01-10 Silverbrook Research Pty Ltd Photographic prints having magnetically recordable media
US6690419B1 (en) 1997-07-15 2004-02-10 Silverbrook Research Pty Ltd Utilising eye detection methods for image processing in a digital image camera
AUPO802797A0 (en) 1997-07-15 1997-08-07 Silverbrook Research Pty Ltd Image processing method and apparatus (ART54)
AUPO850597A0 (en) 1997-08-11 1997-09-04 Silverbrook Research Pty Ltd Image processing method and apparatus (art01a)
US6879341B1 (en) 1997-07-15 2005-04-12 Silverbrook Research Pty Ltd Digital camera system containing a VLIW vector processor
US6624848B1 (en) 1997-07-15 2003-09-23 Silverbrook Research Pty Ltd Cascading image modification using multiple digital cameras incorporating image processing
US7110024B1 (en) 1997-07-15 2006-09-19 Silverbrook Research Pty Ltd Digital camera system having motion deblurring means
US20040119829A1 (en) 1997-07-15 2004-06-24 Silverbrook Research Pty Ltd Printhead assembly for a print on demand digital camera system
AUPP702098A0 (en) 1998-11-09 1998-12-03 Silverbrook Research Pty Ltd Image creation method and apparatus (ART73)
AUPQ056099A0 (en) 1999-05-25 1999-06-17 Silverbrook Research Pty Ltd A method and apparatus (pprint01)
US7119511B2 (en) * 2003-04-11 2006-10-10 International Business Machines Corporation Servo system for a two-dimensional micro-electromechanical system (MEMS)-based scanner and method therefor

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US4035062A (en) * 1975-12-30 1977-07-12 Nasa Method and apparatus for producing an image from a transparent object
US5078771A (en) * 1989-02-07 1992-01-07 Canyon Materials, Inc. Method of making high energy beam sensitive glasses
US4894303A (en) * 1983-06-24 1990-01-16 Canyon Materials Research & Engineering High energy beam-sensitive glasses
US5285517A (en) * 1983-06-24 1994-02-08 Canyon Materials, Inc. High energy beam sensitive glasses
US4670366A (en) 1983-06-24 1987-06-02 Canyon Materials Research & Engineering High energy beam sensitive glasses
US4567104A (en) * 1983-06-24 1986-01-28 Canyon Materials Research & Engineering High energy beam colored glasses exhibiting insensitivity to actinic radiation
US4719498A (en) * 1984-05-18 1988-01-12 Fujitsu Limited Optoelectronic integrated circuit
DE3429665A1 (de) * 1984-08-11 1986-02-20 Bayer Ag, 5090 Leverkusen Waschbestaendige, antimikrobiell wirksame fasern und faeden und ihre herstellung
US4581814A (en) * 1984-12-13 1986-04-15 At&T Bell Laboratories Process for fabricating dielectrically isolated devices utilizing heating of the polycrystalline support layer to prevent substrate deformation
US5145757A (en) * 1989-06-23 1992-09-08 Schott Glass Technologies, Inc. Method of forming stable images in electron beam writable glass compositions
US5114813A (en) * 1989-06-23 1992-05-19 Schott Glass Technologies, Inc. Method of forming stable images in electron beam writable glass compositions
US5079130A (en) * 1990-05-25 1992-01-07 At&T Bell Laboratories Partially or fully recessed microlens fabrication
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US5242707A (en) * 1990-12-21 1993-09-07 Regents Of The University Of California System and method for producing electro-optic components integrable with silicon-on-sapphire circuits
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Also Published As

Publication number Publication date
GB0301024D0 (en) 2003-02-19
US7129179B2 (en) 2006-10-31
JP2004508946A (ja) 2004-03-25
AU2002222920A1 (en) 2002-01-30
US20020135266A1 (en) 2002-09-26
WO2002006061A1 (en) 2002-01-24
GB2381383A (en) 2003-04-30
KR20030019573A (ko) 2003-03-06

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