KR100474202B1 - 티아졸 유도체의 제조방법 및 이를 제조하기 위한 중간체 - Google Patents

티아졸 유도체의 제조방법 및 이를 제조하기 위한 중간체 Download PDF

Info

Publication number
KR100474202B1
KR100474202B1 KR10-2002-0024595A KR20020024595A KR100474202B1 KR 100474202 B1 KR100474202 B1 KR 100474202B1 KR 20020024595 A KR20020024595 A KR 20020024595A KR 100474202 B1 KR100474202 B1 KR 100474202B1
Authority
KR
South Korea
Prior art keywords
methyl
group
compound
reaction
trifluoromethyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR10-2002-0024595A
Other languages
English (en)
Korean (ko)
Other versions
KR20030086373A (ko
Inventor
강헌중
함정엽
Original Assignee
강헌중
함정엽
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to KR10-2002-0024595A priority Critical patent/KR100474202B1/ko
Application filed by 강헌중, 함정엽 filed Critical 강헌중
Priority to US10/513,408 priority patent/US7241901B2/en
Priority to EP03721130A priority patent/EP1501811B1/en
Priority to PCT/KR2003/000877 priority patent/WO2003106442A1/en
Priority to ES03721130T priority patent/ES2330095T3/es
Priority to DE60328376T priority patent/DE60328376D1/de
Priority to JP2004513274A priority patent/JP2005536480A/ja
Priority to CNB038100819A priority patent/CN100457744C/zh
Publication of KR20030086373A publication Critical patent/KR20030086373A/ko
Application granted granted Critical
Publication of KR100474202B1 publication Critical patent/KR100474202B1/ko
Priority to US11/730,658 priority patent/US20070179300A1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/20Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D277/32Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D277/36Sulfur atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/18Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/20Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton with singly-bound oxygen atoms bound to carbon atoms of the same non-condensed six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/20Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D277/22Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C07D277/26Radicals substituted by sulfur atoms
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Thiazole And Isothizaole Compounds (AREA)
KR10-2002-0024595A 2002-05-04 2002-05-04 티아졸 유도체의 제조방법 및 이를 제조하기 위한 중간체 Expired - Fee Related KR100474202B1 (ko)

Priority Applications (9)

Application Number Priority Date Filing Date Title
KR10-2002-0024595A KR100474202B1 (ko) 2002-05-04 2002-05-04 티아졸 유도체의 제조방법 및 이를 제조하기 위한 중간체
EP03721130A EP1501811B1 (en) 2002-05-04 2003-05-01 Process for preparing thiazole derivative and the intermediate compounds for preparing the same
PCT/KR2003/000877 WO2003106442A1 (en) 2002-05-04 2003-05-01 Process for preparing thiazole derivative and the intermediate compounds for preparing the same
ES03721130T ES2330095T3 (es) 2002-05-04 2003-05-01 Procedimiento para preparar un derivado de tiazol y compuestos intermedios para su preperacion.
US10/513,408 US7241901B2 (en) 2002-05-04 2003-05-01 Process for preparing thiazole derivative and the intermediate compounds for preparing the same
DE60328376T DE60328376D1 (de) 2002-05-04 2003-05-01 Verfahren zur herstellung eines thiazolderivats und zwischenprodukte für dessen herstellung
JP2004513274A JP2005536480A (ja) 2002-05-04 2003-05-01 チアゾール誘導体の製造方法及びこれを製造するための中間体
CNB038100819A CN100457744C (zh) 2002-05-04 2003-05-01 噻唑衍生物的制备方法和用于制备噻唑衍生物的中间体化合物
US11/730,658 US20070179300A1 (en) 2002-05-04 2007-04-03 Process for preparing thiazole derivative and the intermediate compounds for preparing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2002-0024595A KR100474202B1 (ko) 2002-05-04 2002-05-04 티아졸 유도체의 제조방법 및 이를 제조하기 위한 중간체

Publications (2)

Publication Number Publication Date
KR20030086373A KR20030086373A (ko) 2003-11-10
KR100474202B1 true KR100474202B1 (ko) 2005-03-08

Family

ID=29728605

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2002-0024595A Expired - Fee Related KR100474202B1 (ko) 2002-05-04 2002-05-04 티아졸 유도체의 제조방법 및 이를 제조하기 위한 중간체

Country Status (8)

Country Link
US (2) US7241901B2 (enExample)
EP (1) EP1501811B1 (enExample)
JP (1) JP2005536480A (enExample)
KR (1) KR100474202B1 (enExample)
CN (1) CN100457744C (enExample)
DE (1) DE60328376D1 (enExample)
ES (1) ES2330095T3 (enExample)
WO (1) WO2003106442A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101005020B1 (ko) 2006-12-13 2010-12-30 대전대학교 산학협력단 신규 쿠마린 유도체 및 이를 함유하는 항염증, 항알러지용조성물

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2598821C (en) * 2004-12-31 2011-05-31 Heonjoong Kang Organoselenium containing compounds and their use
KR100753860B1 (ko) * 2004-12-31 2007-08-31 재단법인서울대학교산학협력재단 유기 셀레늄 함유 화합물 및 이들 화합물의 용도
WO2006091047A1 (en) * 2005-02-25 2006-08-31 Heonjoong Kang Thiazole derivatives as ppar delta ligands and their manufacturing process
BRPI0606232A2 (pt) * 2005-02-25 2009-06-09 Kang Heonjoong derivados de tiazole como os ligantes delta ppar e seus processos de produção
US7982050B2 (en) 2005-05-07 2011-07-19 Seoul National University Industry Foundation Process for preparing ligands of PPARdelta and the intermediate compounds for preparing the same
CN101400663A (zh) * 2006-01-10 2009-04-01 史密丝克莱恩比彻姆公司 {2-甲基-4-[4-甲基-2-(4-三氟甲基苯基)噻唑-5-基甲硫基]苯氧基}-乙酸的多晶型
KR100954237B1 (ko) 2007-01-08 2010-04-21 재단법인서울대학교산학협력재단 퍼록시솜 증식자 활성화 수용체 델타 리간드 티아졸 화합물및 이를 함유하는 의약, 화장품 및 건강식품 조성물
CN107879994A (zh) * 2017-10-31 2018-04-06 广西师范大学 一种噻唑类化合物的合成方法
CN109897013B (zh) * 2019-03-31 2023-04-07 无锡科华生物科技有限公司 一种选择性PPARδ激动剂GW501516的制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001000603A1 (en) * 1999-06-25 2001-01-04 Glaxo Group Limited Thiazole and oxazole derivatives and their pharmaceutical use
US6204277B1 (en) * 1996-08-19 2001-03-20 Japan Tobacco Inc. Propionic acid derivatives and applications thereof
WO2001040207A1 (en) * 1999-12-02 2001-06-07 Glaxo Group Limited Substituted oxazoles and thiazoles derivatives as hppar alpha activators
US6506757B1 (en) * 1998-03-10 2003-01-14 Ono Pharmaceutical Co., Ltd. Carboxylic acid derivatives and drugs containing the same as the active ingredient

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4727187A (en) * 1984-06-15 1988-02-23 Ciba-Geigy Corporation Process for the preparation of α, α-difluoroalkyl phenyl ether derivatives
JPH06306005A (ja) * 1993-04-23 1994-11-01 Nippon Kayaku Co Ltd エーテル系化合物及びその製法
GB9817118D0 (en) * 1998-08-07 1998-10-07 Glaxo Group Ltd Pharmaceutical compounds
JP2001354671A (ja) * 2000-04-14 2001-12-25 Nippon Chemiphar Co Ltd ペルオキシソーム増殖剤応答性受容体δの活性化剤
ATE542805T1 (de) * 2000-08-11 2012-02-15 Nippon Chemiphar Co Ppar-delta aktivatoren
US7091225B2 (en) 2000-12-20 2006-08-15 Smithkline Beecham Corporation Substituted oxazoles and thiazoles as hPPAR alpha agonists
WO2002070011A2 (en) * 2001-02-02 2002-09-12 Smithkline Beecham Corporation Treatment of ppar mediated diseases
AU2003213281A1 (en) * 2002-02-28 2003-09-16 Smithkline Beecham Corporation Process and intermediates for preparing phenylthiomethyl-thiazoles or oxazoles

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6204277B1 (en) * 1996-08-19 2001-03-20 Japan Tobacco Inc. Propionic acid derivatives and applications thereof
US6506757B1 (en) * 1998-03-10 2003-01-14 Ono Pharmaceutical Co., Ltd. Carboxylic acid derivatives and drugs containing the same as the active ingredient
WO2001000603A1 (en) * 1999-06-25 2001-01-04 Glaxo Group Limited Thiazole and oxazole derivatives and their pharmaceutical use
WO2001040207A1 (en) * 1999-12-02 2001-06-07 Glaxo Group Limited Substituted oxazoles and thiazoles derivatives as hppar alpha activators

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101005020B1 (ko) 2006-12-13 2010-12-30 대전대학교 산학협력단 신규 쿠마린 유도체 및 이를 함유하는 항염증, 항알러지용조성물

Also Published As

Publication number Publication date
US20050176785A1 (en) 2005-08-11
CN1649854A (zh) 2005-08-03
US20070179300A1 (en) 2007-08-02
CN100457744C (zh) 2009-02-04
KR20030086373A (ko) 2003-11-10
JP2005536480A (ja) 2005-12-02
ES2330095T3 (es) 2009-12-04
EP1501811A1 (en) 2005-02-02
WO2003106442A1 (en) 2003-12-24
DE60328376D1 (de) 2009-08-27
EP1501811A4 (en) 2006-02-08
EP1501811B1 (en) 2009-07-15
US7241901B2 (en) 2007-07-10

Similar Documents

Publication Publication Date Title
US20070179300A1 (en) Process for preparing thiazole derivative and the intermediate compounds for preparing the same
JP6393857B1 (ja) 新規四環式保護剤
JP2023052918A (ja) 5-[[4-[2-[5-(1-ヒドロキシエチル)-2-ピリジニル]エトキシ]フェニル]メチル]-2,4-チアゾリジンジオンおよびその塩を調製するためのプロセス
KR100797798B1 (ko) 퍼록시솜 증식자 활성화 수용체 델타 리간드 티아졸 유도체및 그의 제조방법
KR100691375B1 (ko) 페록시솜 증식자 활성화 수용체 델타 리간드의 제조방법 및 이를 제조하기 위한 중간체
JP2546559B2 (ja) ジイソピノカンフェイルクロロボランのインシトゥー製造
CN101830863B (zh) 制备PPARδ的配体的方法和用于制备该配体的中间化合物
JP4869338B2 (ja) ペルオキシソーム増殖因子活性化受容体δリガンドの製造方法及びこれを製造するための中間体
JP3146596B2 (ja) 3−ヒドロキシメチル−1−プロパルギルイミダゾリジン−2,4−ジオンの製造法
KR100632872B1 (ko) 페록시솜 증식자 활성화 수용체 델타 리간드의 제조방법 및이를 제조하기 위한 중간체
WO2017092977A1 (fr) Procédé de synthèse de dérivés n-(pyridin-4-yl)-2-hydroxy-alkylamides énantiomériquement purs
JPH029585B2 (enExample)
KR100315836B1 (ko) 부틸티오-이소퀴놀린의 제조방법 및 이를 위한 중간체
JP2590796B2 (ja) ヒドロキシシクロペンタノン類の製法
KR100320772B1 (ko) (s)-벤족사진 유도체의 제조방법 및 (r)-벤족사진 유도체의 라세미화 방법
JP2512451B2 (ja) ヒドロキシシクロペンタノン誘導体とその製法
KR100502833B1 (ko) 심바스타틴 및 이의 중간체 화합물들의 개선된 제조방법
JP2903805B2 (ja) 光学活性ベンジルグリシジルエーテルの製法
JP3777818B2 (ja) ハロゲン化合物、トリエン誘導体およびそれらの製造法
KR100699928B1 (ko) 퍼록시솜 증식자 활성화 수용체 알파 리간드를 제조하기위한 중간체의 제조방법
WO2005058918A1 (fr) Nouveaux derives d’acides phenyl-boronique et leurs procedes de preparation
JP2008517902A (ja) アルキルアリルサルファイド誘導体の製造方法及び新規なサルファイド化合物
JPS63130578A (ja) 有機セレン化合物
NZ248043A (en) 1-(4-hydroxy-3-oxo-2,6,6-trimethyl-1-cyclohexen-1-yl)-3-methy l-5-benzenesulphonyl-1,3-pentadiene derivatives; methods of preparation
FR2474499A2 (fr) Nouveaux derives du (pyridyl-2)-2 tetrahydrothiophene, leur preparation et les medicaments qui les contiennent

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R14-asn-PN2301

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20130612

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

FPAY Annual fee payment

Payment date: 20140212

Year of fee payment: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

FPAY Annual fee payment

Payment date: 20150212

Year of fee payment: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R14-asn-PN2301

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20160223

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20160223

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000