KR100458407B1 - 고주파용 반도체 장치 - Google Patents
고주파용 반도체 장치 Download PDFInfo
- Publication number
- KR100458407B1 KR100458407B1 KR10-2002-7011814A KR20027011814A KR100458407B1 KR 100458407 B1 KR100458407 B1 KR 100458407B1 KR 20027011814 A KR20027011814 A KR 20027011814A KR 100458407 B1 KR100458407 B1 KR 100458407B1
- Authority
- KR
- South Korea
- Prior art keywords
- hbt
- emitter
- base
- basic
- stage
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 35
- 230000003321 amplification Effects 0.000 claims description 23
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 18
- 238000004891 communication Methods 0.000 abstract description 5
- 238000010295 mobile communication Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 20
- 230000007423 decrease Effects 0.000 description 15
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 9
- 230000006866 deterioration Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/20—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0605—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits made of compound material, e.g. AIIIBV
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/189—High-frequency amplifiers, e.g. radio frequency amplifiers
- H03F3/19—High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/20—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
- H03F3/21—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
- H03F3/211—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only using a combination of several amplifiers
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2203/00—Indexing scheme relating to amplifiers with only discharge tubes or only semiconductor devices as amplifying elements covered by H03F3/00
- H03F2203/20—Indexing scheme relating to power amplifiers, e.g. Class B amplifiers, Class C amplifiers
- H03F2203/21—Indexing scheme relating to power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
- H03F2203/211—Indexing scheme relating to power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only using a combination of several amplifiers
- H03F2203/21178—Power transistors are made by coupling a plurality of single transistors in parallel
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Amplifiers (AREA)
- Bipolar Transistors (AREA)
Abstract
Description
Claims (14)
- 헤테로 접합 구조의 제1 바이폴라 트랜지스터와 이 제1 바이폴라 트랜지스터의 에미터 전극에 직렬로 접속된 저항값이 RE1인 에미터 저항을 갖는 제1 기본 트랜지스터를, 복수개 병렬 접속하여 제1 반도체 기판 상에 배치되는, 하나의 공통된 출력을 갖는 증폭 회로의 제1 부분과,상기 제1 부분과 직렬로 접속되고, 상기 제1 부분의 하나의 공통된 출력 신호를 증폭하고 헤테로 접합 구조의 제2 바이폴라 트랜지스터와 이 제2 바이폴라 트랜지스터의 베이스 전극에 직렬로 접속된 저항값이 RB2인 베이스 저항을 갖는 제2 기본 트랜지스터를, 복수개 병렬 접속하여 제2 반도체 기판 상에 배치되는, 증폭 회로의 제2 부분을 포함하는 고주파용 반도체 장치.
- 삭제
- 삭제
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- 삭제
- 헤테로 접합 구조의 제1 바이폴라 트랜지스터와 이 제1 바이폴라 트랜지스터의 베이스 전극에 직렬로 접속된 저항값이 RB1인 베이스 저항과 상기 제1 바이폴라 트랜지스터의 에미터 전극에 직렬로 접속된 저항값이 RE1인 에미터 저항을 갖는 제1 기본 트랜지스터를, 이 제1 기본 트랜지스터의 에미터의 에미터 간격 W1으로, 복수개 병렬 접속하여 제1 반도체 기판 상에 배치되는, 하나의 공통된 출력을 갖는 증폭 회로의 제1 부분과,상기 제1 부분과 직렬로 연결되고, 상기 제1 부분의 하나의 공통된 출력 신호를 증폭함과 함께 헤테로 접합 구조의 제2 바이폴라 트랜지스터와 이 제2 바이폴라 트랜지스터의 베이스 전극에 직렬로 접속된 저항값이 RB2인 베이스 저항과 상기 제2 바이폴라 트랜지스터의 에미터 전극에 직렬로 접속된 저항값이 RE2인 에미터 저항을 갖는 제2 기본 트랜지스터를, 이 제2 기본 트랜지스터의 에미터의 에미터 간격 W2으로, 복수개 병렬 접속하여 제2 반도체 기판 상에 배치되는, 증폭 회로의 제2 부분을 포함하며,상기 에미터 간격 W1과 W2는,W1>W2로 하는 것을 특징으로 하는 고주파용 반도체 장치.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 에미터 밸러스트 저항과 접속되는 헤테로 접합 구조의 제1 바이폴라 트랜지스터 소자를 갖는 초단 증폭 회로가 포함되는, 하나의 공통된 출력을 갖는 제1 증폭 회로 부분과,이 제1 증폭 회로 부분에 직렬로 접속되고, 상기 제1 증폭회로 부분의 하나의 공통된 출력 신호를 증폭함과 함께 베이스 밸러스트 저항과 접속되는 헤테로 접합 구조의 제2 바이폴라 트랜지스터 소자를 갖는 최종단 증폭 회로가 포함되는 제2 증폭 회로 부분을 포함하는 고주파용 반도체 장치.
- 삭제
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001002476 | 2001-01-10 | ||
JPJP-P-2001-00002476 | 2001-01-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030011790A KR20030011790A (ko) | 2003-02-11 |
KR100458407B1 true KR100458407B1 (ko) | 2004-11-26 |
Family
ID=18870976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-7011814A KR100458407B1 (ko) | 2001-01-10 | 2001-05-11 | 고주파용 반도체 장치 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6861906B2 (ko) |
EP (1) | EP1351379B1 (ko) |
JP (1) | JP3952400B2 (ko) |
KR (1) | KR100458407B1 (ko) |
CN (1) | CN1255939C (ko) |
DE (1) | DE60122381T2 (ko) |
WO (1) | WO2002056461A1 (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004260364A (ja) * | 2003-02-25 | 2004-09-16 | Renesas Technology Corp | 半導体装置及び高出力電力増幅装置並びにパソコンカード |
JP4248338B2 (ja) * | 2003-08-05 | 2009-04-02 | パナソニック株式会社 | 半導体装置 |
US7453320B2 (en) * | 2003-09-17 | 2008-11-18 | Nec Corporation | Amplifier |
TW200522507A (en) * | 2003-12-25 | 2005-07-01 | Richwave Technology Corp | Power amplifying module |
US7268627B2 (en) * | 2004-11-03 | 2007-09-11 | Theta Microelectronics, Inc. | Pre-matching of distributed and push-pull power transistors |
KR100660118B1 (ko) * | 2005-04-06 | 2006-12-21 | 한국과학기술원 | 차동증폭장치 및 이의 컴퓨터 시뮬레이션 모델 생성 방법 |
DE102006035793B8 (de) * | 2006-07-28 | 2011-01-05 | Global Beam Technologies Ag | Elektronenstrahlanlage zur Materialbearbeitung und Stromaddieranordnung zur schnellen Ansteuerung einer Induktivität |
JP5631607B2 (ja) * | 2009-08-21 | 2014-11-26 | 株式会社東芝 | マルチチップモジュール構造を有する高周波回路 |
JP2011155482A (ja) * | 2010-01-27 | 2011-08-11 | Tdk Corp | 電力増幅器 |
JP5655526B2 (ja) * | 2010-11-29 | 2015-01-21 | 住友電気工業株式会社 | 電子回路 |
JP6057145B2 (ja) | 2012-04-04 | 2017-01-11 | 株式会社村田製作所 | トランジスタ |
WO2015002294A1 (ja) * | 2013-07-05 | 2015-01-08 | 株式会社村田製作所 | 電力増幅モジュール |
WO2021157152A1 (ja) * | 2020-02-07 | 2021-08-12 | 株式会社村田製作所 | 電力増幅回路、高周波回路、及び通信装置 |
JP2021132100A (ja) | 2020-02-19 | 2021-09-09 | 株式会社村田製作所 | 高周波電力増幅素子 |
WO2022118560A1 (ja) * | 2020-12-04 | 2022-06-09 | 株式会社村田製作所 | 電力増幅器 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3042875A (en) * | 1960-01-29 | 1962-07-03 | Martin Marietta Corp | D.c.-a.c. transistor amplifier |
JPH07118621B2 (ja) | 1985-08-08 | 1995-12-18 | シ−メンス、アクチエンゲゼルシヤフト | パワ−トランジスタ装置 |
US5321279A (en) | 1992-11-09 | 1994-06-14 | Texas Instruments Incorporated | Base ballasting |
US5608353A (en) * | 1995-03-29 | 1997-03-04 | Rf Micro Devices, Inc. | HBT power amplifier |
JPH08279561A (ja) | 1995-04-07 | 1996-10-22 | Mitsubishi Electric Corp | バイポーラトランジスタ並びに該バイポーラトランジスタを用いた増幅器および集積回路 |
JPH08307159A (ja) * | 1995-04-27 | 1996-11-22 | Sony Corp | 高周波増幅回路、送信装置、及び受信装置 |
JPH1098336A (ja) | 1996-09-20 | 1998-04-14 | Hitachi Ltd | 高周波増幅回路 |
JPH10135750A (ja) | 1996-11-01 | 1998-05-22 | Mitsubishi Electric Corp | マイクロ波帯アンプ |
JP3641184B2 (ja) * | 2000-03-28 | 2005-04-20 | 株式会社東芝 | バイポーラトランジスタを用いた高周波電力増幅器 |
-
2001
- 2001-05-11 JP JP2002557009A patent/JP3952400B2/ja not_active Expired - Lifetime
- 2001-05-11 KR KR10-2002-7011814A patent/KR100458407B1/ko active IP Right Grant
- 2001-05-11 EP EP01930078A patent/EP1351379B1/en not_active Expired - Lifetime
- 2001-05-11 US US10/204,446 patent/US6861906B2/en not_active Expired - Lifetime
- 2001-05-11 DE DE60122381T patent/DE60122381T2/de not_active Expired - Lifetime
- 2001-05-11 WO PCT/JP2001/003953 patent/WO2002056461A1/ja active IP Right Grant
- 2001-05-11 CN CNB018063675A patent/CN1255939C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1351379A4 (en) | 2004-12-22 |
EP1351379A1 (en) | 2003-10-08 |
CN1255939C (zh) | 2006-05-10 |
DE60122381D1 (de) | 2006-09-28 |
JP3952400B2 (ja) | 2007-08-01 |
CN1416616A (zh) | 2003-05-07 |
DE60122381T2 (de) | 2007-08-16 |
KR20030011790A (ko) | 2003-02-11 |
JPWO2002056461A1 (ja) | 2004-05-20 |
EP1351379B1 (en) | 2006-08-16 |
US20030011435A1 (en) | 2003-01-16 |
WO2002056461A1 (fr) | 2002-07-18 |
US6861906B2 (en) | 2005-03-01 |
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