KR100434423B1 - 탄성 표면파 필터 및 이를 이용하는 통신 장치 - Google Patents
탄성 표면파 필터 및 이를 이용하는 통신 장치 Download PDFInfo
- Publication number
- KR100434423B1 KR100434423B1 KR10-2002-0001662A KR20020001662A KR100434423B1 KR 100434423 B1 KR100434423 B1 KR 100434423B1 KR 20020001662 A KR20020001662 A KR 20020001662A KR 100434423 B1 KR100434423 B1 KR 100434423B1
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- South Korea
- Prior art keywords
- acoustic wave
- surface acoustic
- electrode
- wave filter
- arm resonator
- Prior art date
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- 238000010897 surface acoustic wave method Methods 0.000 title claims abstract description 66
- 238000004891 communication Methods 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 claims description 20
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 9
- 230000008021 deposition Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 description 12
- 238000000151 deposition Methods 0.000 description 9
- 238000005530 etching Methods 0.000 description 9
- 230000007704 transition Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
- H03H9/6433—Coupled resonator filters
- H03H9/6483—Ladder SAW filters
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02929—Means for compensation or elimination of undesirable effects of ageing changes of characteristics, e.g. electro-acousto-migration
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims (9)
- 압전 기판; 및상기 압전 기판에 배치되고, 각각이 상기 압전 기판에 배치된 인터디지털 전극 및 상기 인터디지털 전극에 증착되어 부착되는 절연막을 포함하는 다수의 일-단자쌍 탄성 표면파 공진기를 포함하고,상기 다수의 일-단자쌍 탄성 표면파 공진기 중 적어도 하나는 직렬암이고, 나머지 일-단자쌍 탄성 표면파 공진기 중 적어도 하나는 병렬암 공진기이며,상기 직렬암 공진기 및 상기 병렬암 공진기는 사다리형 배열로 결합되고, 그리고상기 직렬암 공진기의 전극 듀티는 상기 병렬암 공진기의 전극 듀티보다 더 크며, 일-단자쌍 탄성 표면파 공진기의 전극 듀티는 다음의 수학식에 의해 정의되되고:전극 듀티 = 2 ×W/λ여기서, λ는 상기 일-단자쌍 탄성 표면파 공진기의 파장을 나타내고, W는 인터디지털 전극의 선폭을 나타내는 것을 특징으로 하는 탄성 표면파 필터.
- 제 1 항에 있어서, 상기 압전 기판은 36°회전 Y-커트 X-전파 LiTaO3기판인 것을 특징으로 하는 탄성 표면파 필터.
- 제 1 항에 있어서, 상기 SAW 공진기 각각에서 전극의 두께가 상기 직렬암 공진기 및 상기 병렬암 공진기의 평균 파장의 약 9.2%인 것을 특징으로 하는 탄성 표면파 필터.
- 제 1 항에 있어서, 상기 인터디지털 전극의 양단에 배열된 반사기를 추가로 포함하는 것을 특징으로 하는 탄성 표면파 필터.
- 제 1 항에 있어서, 상기 절연막은 SiO2인 것을 특징으로 하는 탄성 표면파 필터.
- 제 1 항에 있어서, 상기 탄성 표면파 필터는 수신기 RF 필터인 것을 특징으로 하는 탄성 표면파 필터.
- 제 1 항에 있어서, 상기 절연막의 두께는 소정의 주파수 특성을 이루는 크기를 가진 것을 특징으로 하는 탄성 표면파 필터.
- 제 1 항에 있어서, 적어도 하나의 직렬암 공진기의 전극 듀티가 약 0.5 이하인 것을 특징으로 하는 탄성 표면파 필터.
- 안테나;상기 안테나에 접속된 듀플렉서;상기 듀플렉서의 양단에 접속되는 수신측 믹서 및 송신측 믹서;상기 듀플렉서의 일단과 상기 수신측 믹서 사이에 접속되어 수신측 RF단을 구성하는 탄성 표면파 필터 및 증폭기;상기 듀플렉서의 타단과 상기 송신측 믹서 사이에 접속되어 송신측 RF단을 구성하는 증폭기 및 탄성 표면파 필터; 및상기 수신측 믹서에 접속되는 탄성 표면파 필터를 포함하는 통신 장치에 있어서,상기 탄성 표면파 필터들 중 적어도 하나는 제 1 항에 따른 탄성 표면파 필터인 것을 특징으로 하는 통신 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2001-00005644 | 2001-01-12 | ||
JP2001005644A JP3414384B2 (ja) | 2001-01-12 | 2001-01-12 | 弾性表面波フィルタ、およびそれを用いた通信機装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020061112A KR20020061112A (ko) | 2002-07-22 |
KR100434423B1 true KR100434423B1 (ko) | 2004-06-04 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-0001662A KR100434423B1 (ko) | 2001-01-12 | 2002-01-11 | 탄성 표면파 필터 및 이를 이용하는 통신 장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6717487B2 (ko) |
EP (1) | EP1227583B1 (ko) |
JP (1) | JP3414384B2 (ko) |
KR (1) | KR100434423B1 (ko) |
CN (1) | CN1225083C (ko) |
TW (1) | TWI257203B (ko) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10301934A1 (de) * | 2003-01-20 | 2004-07-29 | Epcos Ag | Elektrisches Bauelement mit verringerter Substratfläche |
JP2004254291A (ja) * | 2003-01-27 | 2004-09-09 | Murata Mfg Co Ltd | 弾性表面波装置 |
DE102004037819B4 (de) * | 2004-08-04 | 2021-12-16 | Snaptrack, Inc. | Elektroakustisches Bauelement mit geringen Verlusten |
CN1825759B (zh) * | 2005-02-24 | 2011-11-16 | 京瓷株式会社 | 声表面波元件、分波器和通信设备 |
JP4817875B2 (ja) * | 2005-02-24 | 2011-11-16 | 京セラ株式会社 | 分波器及び通信装置 |
JP4917396B2 (ja) * | 2006-09-25 | 2012-04-18 | 太陽誘電株式会社 | フィルタおよび分波器 |
JP2008131128A (ja) * | 2006-11-17 | 2008-06-05 | Matsushita Electric Ind Co Ltd | 弾性表面波フィルタ、アンテナ共用器、およびそれらの製造方法 |
DE102008045346B4 (de) * | 2008-09-01 | 2018-06-07 | Snaptrack Inc. | Duplexer und Verfahren zum Erhöhen der Isolation zwischen zwei Filtern |
KR101624957B1 (ko) * | 2008-10-31 | 2016-05-27 | 애플 인크. | 자기 정합 대역 소거 필터 |
FR2947398B1 (fr) * | 2009-06-30 | 2013-07-05 | Commissariat Energie Atomique | Dispositif resonant a ondes acoustiques guidees et procede de realisation du dispositif |
DE112011104736B4 (de) * | 2011-01-18 | 2016-03-24 | Murata Manufacturing Co., Ltd. | Oberflächenschallwellenfilterbauelement |
JP5672050B2 (ja) * | 2011-02-21 | 2015-02-18 | 株式会社村田製作所 | 弾性表面波フィルタ装置 |
CN104702239B (zh) | 2011-06-23 | 2017-09-22 | 天工滤波方案日本有限公司 | 梯型弹性波滤波器及使用该弹性波滤波器的天线双工器 |
JP6949552B2 (ja) * | 2017-05-18 | 2021-10-13 | 太陽誘電株式会社 | 弾性波フィルタおよびマルチプレクサ |
WO2019117106A1 (ja) * | 2017-12-13 | 2019-06-20 | 株式会社村田製作所 | フィルタ装置およびマルチプレクサ |
CN113922786A (zh) * | 2021-10-22 | 2022-01-11 | 中国电子科技集团公司第二十六研究所 | 一种超大带宽低损耗的saw滤波器杂波抑制方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2714200B1 (fr) * | 1993-11-25 | 1996-12-27 | Fujitsu Ltd | Dispositif à onde acoustique de surface et son procédé de fabrication. |
EP0738039B1 (en) * | 1995-04-12 | 2000-06-28 | Matsushita Electric Industrial Co., Ltd. | Resonator ladder surface acoustic wave filter |
US5632909A (en) * | 1995-06-19 | 1997-05-27 | Motorola, Inc. | Filter |
JP3442202B2 (ja) * | 1995-09-26 | 2003-09-02 | 富士通株式会社 | 表面弾性波フィルタ |
JP3077052B2 (ja) * | 1995-12-27 | 2000-08-14 | 株式会社村田製作所 | 弾性表面波共振子フィルタ装置 |
JPH09199974A (ja) * | 1996-01-19 | 1997-07-31 | Nec Corp | 弾性表面波装置 |
JPH10276062A (ja) * | 1997-03-31 | 1998-10-13 | Sanyo Electric Co Ltd | 弾性表面波デバイス |
JP3206548B2 (ja) * | 1998-05-14 | 2001-09-10 | 株式会社村田製作所 | 表面波フィルタ、共用器、通信機装置 |
JP3353742B2 (ja) * | 1999-05-07 | 2002-12-03 | 株式会社村田製作所 | 表面波共振子、表面波装置、通信機装置 |
JP3412611B2 (ja) * | 2000-09-25 | 2003-06-03 | 株式会社村田製作所 | 弾性表面波装置 |
-
2001
- 2001-01-12 JP JP2001005644A patent/JP3414384B2/ja not_active Expired - Lifetime
- 2001-11-29 US US09/995,557 patent/US6717487B2/en not_active Expired - Lifetime
- 2001-11-29 TW TW090129491A patent/TWI257203B/zh not_active IP Right Cessation
-
2002
- 2002-01-10 EP EP02290053.4A patent/EP1227583B1/en not_active Expired - Lifetime
- 2002-01-11 CN CNB021018251A patent/CN1225083C/zh not_active Expired - Lifetime
- 2002-01-11 KR KR10-2002-0001662A patent/KR100434423B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP1227583A3 (en) | 2009-04-08 |
JP2002217679A (ja) | 2002-08-02 |
JP3414384B2 (ja) | 2003-06-09 |
US20020093399A1 (en) | 2002-07-18 |
EP1227583A2 (en) | 2002-07-31 |
CN1365188A (zh) | 2002-08-21 |
EP1227583B1 (en) | 2018-03-28 |
US6717487B2 (en) | 2004-04-06 |
CN1225083C (zh) | 2005-10-26 |
KR20020061112A (ko) | 2002-07-22 |
TWI257203B (en) | 2006-06-21 |
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