KR100331771B1 - 노광장치 - Google Patents
노광장치 Download PDFInfo
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- KR100331771B1 KR100331771B1 KR1019990023874A KR19990023874A KR100331771B1 KR 100331771 B1 KR100331771 B1 KR 100331771B1 KR 1019990023874 A KR1019990023874 A KR 1019990023874A KR 19990023874 A KR19990023874 A KR 19990023874A KR 100331771 B1 KR100331771 B1 KR 100331771B1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B5/00—Anti-hunting arrangements
- G05B5/01—Anti-hunting arrangements electric
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Abstract
Description
Claims (69)
- 의사무작위신호를 생성하여, 운동기구의 운동을 제어하기 위한 액츄에이터에 해당 의사무작위신호를 인가하는 의사무작위신호생성수단(10)과;상기 의사무작위신호의 시계열데이터와 함께 상기 운동기구의 운동상태를 계측하는 센서에 의해 얻어진 시계열데이터를 수집하는 데이터기억수단(12)과;상기 데이터기억수단내에 기억된 시계열데이터를 필터링하는 예비필터링수단(13)과;상기 예비필터링수단에 의해 처리된 데이터로부터 수학적 모델을 도출하는 시스템동정(同定)수단(14)과;상기 시스템동정수단에 의해 도출된 수학적 모델을 사용하여 상기 운동기구의 특성값을 도출하는 특성추출/자가진단수단(15)을 구비한 것을 특징으로 하는 노광장치.
- 제 1항에 있어서, 상기 의사무작위신호생성수단은, 상기 운동기구내에 제어를 위해 구비된 복수의 액츄에이터 각각과 1대 1로 대응하여 나타나는 복수의 무상관 의사무작위신호를 모든 액츄에이터에 동시에 인가하는 것을 특징으로 하는 노광장치.
- 제 1항에 있어서, 상기 의사무작위신호생성수단은, 상기 운동기구내에 제어를 위해 구비된 각 액츄에이터에 하나의 의사무작위신호를 인가하기 위한 절환수단을 구비한 것을 특징으로 하는 노광장치.
- 제 1항에 있어서, 상기 의사무작위신호생성수단은, 상기 운동기구의 운동의 자유도의 수와 동일한 수이고 서로 무상관의 복수의 의사무작위신호를, 운동의 자유도에 대응해서 동시에 인가하는 것을 특징으로 하는 노광장치.
- 제 1항에 있어서, 상기 의사무작위신호생성수단은 상기 운동기구의 동작의 자유도의 단위마다 하나의 의사무작위신호를 독립적으로 인가하기 위한 절환수단을 구비한 것을 특징으로 하는 노광장치.
- 제 1항 내지 제 5항중 어느 한 항에 있어서, 상기 특성값은 주파수응답, 상기 운동기구의 물리적 파라미터, 공진주파수, 댐핑률, 게인마진, 위상마진 및 상기 노광장치내에서 계측이 행해질 수 없는 부분의 물리적 정보중 적어도 하나 또는 모두를 포함하는 것을 특징으로 하는 노광장치.
- 제 1항 내지 5항중 어느 한 항에 있어서, 상기 액츄에이터는 전자모터인 것을 특징으로 하는 노광장치.
- 제 1항 내지 5항중 어느 한 항에 있어서, 상기 운동기구는 상기 노광장치의 본체구조를 댐핑/지지하기 위한 능동제진장치인 것을 특징으로 하는 노광장치.
- 제 1항 내지 5항중 어느 한 항에 있어서, 상기 운동기구는, 상기 노광장치에 대해서 시스템동정을 행하기 위해 외부에 부착되는 것을 특징으로 하는 노광장치.
- 제 1항 내지 5항중 어느 한 항에 있어서, 상기 의사무작위신호는 M-시퀀스신호인 것을 특징으로 하는 노광장치.
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- 기준신호를 노광장치에 입력하는 수단(10)과;상기 입력된 신호에 의거해서 상기 장치를 여진시키는 수단(9, 10)과;상기 장치의 여진결과를 출력신호로서 얻는 수단(51, 52, 53)과;상기 기준신호 및 출력신호에 의거해서 상기 장치의 특성을 동정하는 수단(14)과;상기 동정된 특성을 시간의 경과에 따라 획득해서, 상기 장치의 특성의 변화를 자가진단하는 수단(15)을 구비한 것을 특징으로 하는 노광장치.
- 제 31항에 있어서, 상기 장치의 특성값이 자가진단에 대한 소정의 기준값을 초과한 경우 비정상을 통지하는 수단을 부가하여 구비한 것을 특징으로 하는 노광장치.
- 제 31항에 있어서, 상기 장치의 특성은 주파수응답, 공진주파수, 댐핑률, 게인마진 및 위상마진중 적어도 하나에 의해 정의되는 것을 특징으로 하는 노광장치.
- 제 31항에 있어서, 상기 출력신호를 얻기 위한 상기 수단은, 상기 장치의 여진과 동일한 좌표축방향으로 배치된 것을 특징으로 하는 노광장치.
- 제 32항에 있어서, 상기 출력신호를 얻기 위한 상기 수단은, 가속도센서, 위치센서 및 압력센서중 적어도 하나를 포함하는 것을 특징으로 하는 노광장치.
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- 시스템동정장치를 사용하여 시계열방식으로 노광장치의 특성의 변화를 자가진단하는 수단(10,14)과;상기 자기진단결과에 의거해서 노광성능을 유지하기 위해 요구되는 제어법칙을 생성하는 수단(5,6)을 구비한 노광장치에 있어서,상기 노광장치의 기계적 및 전기적 구성요소의 특성의 시간의 경과에 따른 변화를 보상함으로써 성능이 유지되고;상기 시스템동정장치는,대상시스템의 특성을 동정하기 위해 해당 대상시스템에 인가될 기준이 되는 입력신호를 생성하는 신호생성수단(10)과;상기 입력신호를 배분함으로써 상기 대상시스템을 구동하는 구동수단(9, 11)과;상기 대상시스템의 운동상태를 계측하는 센서(51)와;상기 신호생성수단에 의해 생성된 신호와 상기 센서로부터의 출력신호를 시계열데이터로서 기억하는 데이터수집수단(12)과;상기 입력신호 및 출력신호에 의거해서 상기 대상시스템의 특성을 모델링하는 동정연산수단(14)을 구비하고,상기 동정연산수단은 상기 데이터수집수단내에 기억된 시계열데이터에 의거해서 상기 대상시스템의 특성의 변화를 자가진단하는 것을 특징으로 하는 노광장치.
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Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1998-190968 | 1998-06-23 | ||
JP19096898 | 1998-06-23 | ||
JP1999-165369 | 1999-06-11 | ||
JP16536999A JP4272750B2 (ja) | 1998-06-23 | 1999-06-11 | 露光装置及び除振装置、システム同定装置及びその方法 |
Publications (2)
Publication Number | Publication Date |
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KR20000006401A KR20000006401A (ko) | 2000-01-25 |
KR100331771B1 true KR100331771B1 (ko) | 2002-04-09 |
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KR1019990023874A KR100331771B1 (ko) | 1998-06-23 | 1999-06-23 | 노광장치 |
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US (1) | US7072777B1 (ko) |
JP (1) | JP4272750B2 (ko) |
KR (1) | KR100331771B1 (ko) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
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TW500987B (en) * | 2000-06-14 | 2002-09-01 | Asm Lithography Bv | Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby |
JP3975812B2 (ja) * | 2001-08-17 | 2007-09-12 | 株式会社安川電機 | 電動機制御装置の共振周波数検出装置 |
JP4401609B2 (ja) * | 2001-10-19 | 2010-01-20 | キヤノン株式会社 | 情報処理装置、情報処理方法、プログラム、半導体製造システム及び半導体デバイスの製造方法 |
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JP3224489B2 (ja) | 1995-03-28 | 2001-10-29 | キヤノン株式会社 | 空気バネ式除振装置 |
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US7072777B1 (en) | 2006-07-04 |
JP4272750B2 (ja) | 2009-06-03 |
KR20000006401A (ko) | 2000-01-25 |
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