KR100299264B1 - 광중합성조성물 - Google Patents

광중합성조성물 Download PDF

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Publication number
KR100299264B1
KR100299264B1 KR1019940015453A KR19940015453A KR100299264B1 KR 100299264 B1 KR100299264 B1 KR 100299264B1 KR 1019940015453 A KR1019940015453 A KR 1019940015453A KR 19940015453 A KR19940015453 A KR 19940015453A KR 100299264 B1 KR100299264 B1 KR 100299264B1
Authority
KR
South Korea
Prior art keywords
weight
acrylate
photopolymerizable composition
composition
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019940015453A
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English (en)
Korean (ko)
Other versions
KR950003920A (ko
Inventor
로저피에르엘리살빈
마틴로쓰
Original Assignee
베르너 훽스트, 지크프리트 포트호프
반티코 아게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 베르너 훽스트, 지크프리트 포트호프, 반티코 아게 filed Critical 베르너 훽스트, 지크프리트 포트호프
Publication of KR950003920A publication Critical patent/KR950003920A/ko
Application granted granted Critical
Publication of KR100299264B1 publication Critical patent/KR100299264B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1019940015453A 1993-07-02 1994-06-30 광중합성조성물 Expired - Fee Related KR100299264B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH200593 1993-07-02
CH93-4/2005 1993-07-02

Publications (2)

Publication Number Publication Date
KR950003920A KR950003920A (ko) 1995-02-17
KR100299264B1 true KR100299264B1 (ko) 2001-11-30

Family

ID=4223681

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940015453A Expired - Fee Related KR100299264B1 (ko) 1993-07-02 1994-06-30 광중합성조성물

Country Status (9)

Country Link
US (2) US5942371A (enExample)
EP (1) EP0633503B1 (enExample)
JP (1) JP3511146B2 (enExample)
KR (1) KR100299264B1 (enExample)
CN (1) CN1070211C (enExample)
AT (1) ATE155260T1 (enExample)
CA (1) CA2127238C (enExample)
DE (1) DE59403284D1 (enExample)
TW (1) TW268031B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8153751B2 (en) 2008-10-06 2012-04-10 Lg Chem, Ltd. Multifunction urethane monomer, method of manufacturing the monomer and photosensitive resin composition including the monomer

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW268011B (enExample) * 1993-07-02 1996-01-11 Ciba Geigy
TW268031B (enExample) * 1993-07-02 1996-01-11 Ciba Geigy
US5853957A (en) * 1995-05-08 1998-12-29 Tamura Kaken Co., Ltd Photosensitive resin compositions, cured films thereof, and circuit boards
US6207346B1 (en) * 1997-04-09 2001-03-27 Advanced Coatings International Waterborne photoresists made from urethane acrylates
JP3711198B2 (ja) * 1998-04-23 2005-10-26 東京応化工業株式会社 レジストパターンの形成方法
WO2000002091A1 (en) * 1998-07-07 2000-01-13 Kansai Paint Co., Ltd. Water-based solder resist composition
JP2001222103A (ja) 1999-08-05 2001-08-17 Nippon Paint Co Ltd 水性フォトソルダーレジスト組成物
GB0117155D0 (en) * 2001-07-13 2001-09-05 Coates Electrographics Ltd Improvement in or relating to photocurable resist inks
CN1582416A (zh) * 2001-12-03 2005-02-16 昭和电工株式会社 光敏膜和印刷线路板用光敏组合物及其生产方法
CN1305911C (zh) * 2002-04-26 2007-03-21 雅宝公司 一种光引发聚合中的新型胺共引发剂
CN1298796C (zh) * 2003-10-17 2007-02-07 财团法人工业技术研究院 光学涂布层合物及其制造方法
JP2007509716A (ja) * 2003-10-29 2007-04-19 ジェンティス インコーポレイテッド 組織工学用の重合可能なエマルション
EP1696719A4 (en) * 2003-11-14 2008-10-29 Bridgestone Corp ELECTROMAGNETIC SHIELDING TRANSLUCENT WINDOW MATERIAL AND METHOD OF MANUFACTURING THEREOF
US7635552B2 (en) * 2006-07-25 2009-12-22 Endicott Interconnect Technologies, Inc. Photoresist composition with antibacterial agent
CN102585556A (zh) * 2011-12-31 2012-07-18 上海东升新材料有限公司 光引发聚合制备抗盐性分散剂的方法
CN103969947B (zh) * 2013-01-31 2016-05-04 太阳油墨（苏州）有限公司 碱显影型感光性树脂组合物、其干膜及其固化物以及使用其而形成的印刷电路板
WO2017126536A1 (ja) * 2016-01-20 2017-07-27 三菱瓦斯化学株式会社 樹脂組成物、支持体付き樹脂シート、多層プリント配線板及び半導体装置
US11256273B2 (en) 2020-07-08 2022-02-22 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11274501B2 (en) 2020-07-08 2022-03-15 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11294401B2 (en) 2020-07-08 2022-04-05 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11314266B2 (en) 2020-07-08 2022-04-26 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11802645B2 (en) 2020-07-08 2023-10-31 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications
US11131158B1 (en) 2020-07-08 2021-09-28 Saudi Arabian Oil Company Flow management systems and related methods for oil and gas applications

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1618729A1 (de) * 1966-03-10 1972-03-30 North American Aviation Inc Verfahren zur Herstellung eines photopolymerisierbaren Epoxydharzes
DE3785550T2 (de) * 1986-12-02 1993-11-04 Du Pont Photosensible zusammensetzung mit verbesserter haftung, gegenstaende und verfahren.
EP0302827B1 (en) * 1987-08-05 1994-07-06 Ciba-Geigy Ag Process for the formation of images
JPS6462375A (en) * 1987-09-02 1989-03-08 Arakawa Chem Ind Liquid photosolder resist ink composition of alkali development type
JPH0823694B2 (ja) * 1988-08-04 1996-03-06 富士写真フイルム株式会社 液状感光性樹脂組成物
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
DE59009431D1 (de) * 1989-06-16 1995-08-31 Ciba Geigy Ag Photoresist.
DE59108989D1 (de) * 1990-12-18 1998-06-25 Ciba Geigy Ag Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel
JPH04294352A (ja) * 1991-03-22 1992-10-19 Tamura Kaken Kk 感光性水性樹脂組成物
JP2877659B2 (ja) * 1993-05-10 1999-03-31 日本化薬株式会社 レジストインキ組成物及びその硬化物
TW268031B (enExample) * 1993-07-02 1996-01-11 Ciba Geigy

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8153751B2 (en) 2008-10-06 2012-04-10 Lg Chem, Ltd. Multifunction urethane monomer, method of manufacturing the monomer and photosensitive resin composition including the monomer

Also Published As

Publication number Publication date
US6045972A (en) 2000-04-04
KR950003920A (ko) 1995-02-17
CA2127238A1 (en) 1995-01-03
CA2127238C (en) 2006-03-21
CN1103077A (zh) 1995-05-31
JPH0756337A (ja) 1995-03-03
EP0633503A1 (de) 1995-01-11
DE59403284D1 (de) 1997-08-14
US5942371A (en) 1999-08-24
JP3511146B2 (ja) 2004-03-29
EP0633503B1 (de) 1997-07-09
CN1070211C (zh) 2001-08-29
ATE155260T1 (de) 1997-07-15
TW268031B (enExample) 1996-01-11

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