KR100275671B1 - 플라즈마 식각 설비 - Google Patents

플라즈마 식각 설비 Download PDF

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Publication number
KR100275671B1
KR100275671B1 KR1019980034587A KR19980034587A KR100275671B1 KR 100275671 B1 KR100275671 B1 KR 100275671B1 KR 1019980034587 A KR1019980034587 A KR 1019980034587A KR 19980034587 A KR19980034587 A KR 19980034587A KR 100275671 B1 KR100275671 B1 KR 100275671B1
Authority
KR
South Korea
Prior art keywords
cathode electrode
cathode
lcd glass
mother substrate
glass mother
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019980034587A
Other languages
English (en)
Korean (ko)
Other versions
KR20000014935A (ko
Inventor
박창훈
Original Assignee
윤종용
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 윤종용, 삼성전자주식회사 filed Critical 윤종용
Priority to KR1019980034587A priority Critical patent/KR100275671B1/ko
Priority to TW088114171A priority patent/TW472320B/zh
Priority to JP23852699A priority patent/JP4487026B2/ja
Priority to CNB991180909A priority patent/CN1157758C/zh
Publication of KR20000014935A publication Critical patent/KR20000014935A/ko
Application granted granted Critical
Publication of KR100275671B1 publication Critical patent/KR100275671B1/ko
Assigned to 삼성디스플레이 주식회사 reassignment 삼성디스플레이 주식회사 권리의 전부이전등록 Assignors: 삼성전자 주식회사
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
KR1019980034587A 1998-08-26 1998-08-26 플라즈마 식각 설비 Expired - Fee Related KR100275671B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1019980034587A KR100275671B1 (ko) 1998-08-26 1998-08-26 플라즈마 식각 설비
TW088114171A TW472320B (en) 1998-08-26 1999-08-19 Plasma etching equipment and LCD module fabricated using the same
JP23852699A JP4487026B2 (ja) 1998-08-26 1999-08-25 プラズマエッチング装置
CNB991180909A CN1157758C (zh) 1998-08-26 1999-08-25 等离子体蚀刻设备

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019980034587A KR100275671B1 (ko) 1998-08-26 1998-08-26 플라즈마 식각 설비

Publications (2)

Publication Number Publication Date
KR20000014935A KR20000014935A (ko) 2000-03-15
KR100275671B1 true KR100275671B1 (ko) 2001-02-01

Family

ID=19548300

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019980034587A Expired - Fee Related KR100275671B1 (ko) 1998-08-26 1998-08-26 플라즈마 식각 설비

Country Status (4)

Country Link
JP (1) JP4487026B2 (https=)
KR (1) KR100275671B1 (https=)
CN (1) CN1157758C (https=)
TW (1) TW472320B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101384980B1 (ko) * 2012-06-25 2014-04-14 주식회사 테스 플라즈마 발생장치 및 이를 포함하는 박막증착장치

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001127041A (ja) * 1999-10-26 2001-05-11 Matsushita Electric Ind Co Ltd 基板のプラズマ処理装置およびプラズマ処理方法
EP1352415A2 (en) * 2000-10-23 2003-10-15 Applied Materials, Inc. Monitoring substrate processing using reflected radiation
CN102969361B (zh) * 2011-09-01 2015-09-23 中国科学院微电子研究所 光照稳定性非晶态金属氧化物tft器件以及显示器件
CN105225989B (zh) * 2015-10-13 2018-12-28 京东方科技集团股份有限公司 等离子刻蚀机
CN108711546B (zh) * 2018-04-28 2019-07-23 武汉华星光电技术有限公司 下电极及干蚀刻机
CN111970838B (zh) * 2020-08-24 2021-09-21 泉州市创智工业设计服务有限公司 一种用于生产电路板的蚀刻机

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101384980B1 (ko) * 2012-06-25 2014-04-14 주식회사 테스 플라즈마 발생장치 및 이를 포함하는 박막증착장치

Also Published As

Publication number Publication date
KR20000014935A (ko) 2000-03-15
JP2000091328A (ja) 2000-03-31
JP4487026B2 (ja) 2010-06-23
CN1246724A (zh) 2000-03-08
CN1157758C (zh) 2004-07-14
TW472320B (en) 2002-01-11

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