KR100274308B1 - 멀티 챔버 처리시스템 - Google Patents

멀티 챔버 처리시스템 Download PDF

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Publication number
KR100274308B1
KR100274308B1 KR1019950012843A KR19950012843A KR100274308B1 KR 100274308 B1 KR100274308 B1 KR 100274308B1 KR 1019950012843 A KR1019950012843 A KR 1019950012843A KR 19950012843 A KR19950012843 A KR 19950012843A KR 100274308 B1 KR100274308 B1 KR 100274308B1
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KR
South Korea
Prior art keywords
chamber
load lock
arm
chambers
disposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019950012843A
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English (en)
Korean (ko)
Other versions
KR950034486A (ko
Inventor
데루오 아사카와
히로아키 사에키
Original Assignee
히가시 데쓰로
동경엘렉트론주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP14848594A external-priority patent/JP3486462B2/ja
Application filed by 히가시 데쓰로, 동경엘렉트론주식회사 filed Critical 히가시 데쓰로
Publication of KR950034486A publication Critical patent/KR950034486A/ko
Application granted granted Critical
Publication of KR100274308B1 publication Critical patent/KR100274308B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Robotics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR1019950012843A 1994-05-23 1995-05-23 멀티 챔버 처리시스템 Expired - Fee Related KR100274308B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP94-108483 1994-05-23
JP10848394 1994-05-23
JP14848594A JP3486462B2 (ja) 1994-06-07 1994-06-07 減圧・常圧処理装置
JP94-148485 1994-06-07

Publications (2)

Publication Number Publication Date
KR950034486A KR950034486A (ko) 1995-12-28
KR100274308B1 true KR100274308B1 (ko) 2001-01-15

Family

ID=51397711

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950012843A Expired - Fee Related KR100274308B1 (ko) 1994-05-23 1995-05-23 멀티 챔버 처리시스템

Country Status (2)

Country Link
KR (1) KR100274308B1 (enrdf_load_stackoverflow)
TW (1) TW282559B (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100831906B1 (ko) * 2000-11-24 2008-05-26 가부시키가이샤 알박 온도 제어실 및 그 온도 제어실을 이용한 진공 처리 장치
KR101118914B1 (ko) * 2004-03-08 2012-02-27 주성엔지니어링(주) 진공펌핑 시스템 및 방법과 이를 이용하는 공정장치
KR20150024794A (ko) * 2013-08-27 2015-03-09 도쿄엘렉트론가부시키가이샤 기판 처리 방법, 기판 처리 시스템 및 기억 매체
KR20180037279A (ko) * 2015-09-03 2018-04-11 카와사키 주코교 카부시키 카이샤 기판 이송 장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110616406A (zh) * 2018-11-29 2019-12-27 爱发科豪威光电薄膜科技(深圳)有限公司 磁控溅射镀膜机

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5186718A (en) * 1989-05-19 1993-02-16 Applied Materials, Inc. Staged-vacuum wafer processing system and method
JPH07335711A (ja) * 1994-06-07 1995-12-22 Tokyo Electron Ltd 減圧・常圧処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5186718A (en) * 1989-05-19 1993-02-16 Applied Materials, Inc. Staged-vacuum wafer processing system and method
JPH07335711A (ja) * 1994-06-07 1995-12-22 Tokyo Electron Ltd 減圧・常圧処理装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100831906B1 (ko) * 2000-11-24 2008-05-26 가부시키가이샤 알박 온도 제어실 및 그 온도 제어실을 이용한 진공 처리 장치
KR101118914B1 (ko) * 2004-03-08 2012-02-27 주성엔지니어링(주) 진공펌핑 시스템 및 방법과 이를 이용하는 공정장치
KR20150024794A (ko) * 2013-08-27 2015-03-09 도쿄엘렉트론가부시키가이샤 기판 처리 방법, 기판 처리 시스템 및 기억 매체
KR102265232B1 (ko) 2013-08-27 2021-06-15 도쿄엘렉트론가부시키가이샤 기판 처리 방법, 기판 처리 시스템 및 기억 매체
KR20180037279A (ko) * 2015-09-03 2018-04-11 카와사키 주코교 카부시키 카이샤 기판 이송 장치
KR102092868B1 (ko) * 2015-09-03 2020-03-25 카와사키 주코교 카부시키 카이샤 기판 이송 장치

Also Published As

Publication number Publication date
KR950034486A (ko) 1995-12-28
TW282559B (enrdf_load_stackoverflow) 1996-08-01

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