KR0146410B1 - Ti-TiN 적층막의 성막방법 및 마그네트론 캐소드 - Google Patents

Ti-TiN 적층막의 성막방법 및 마그네트론 캐소드

Info

Publication number
KR0146410B1
KR0146410B1 KR1019940017853A KR19940017853A KR0146410B1 KR 0146410 B1 KR0146410 B1 KR 0146410B1 KR 1019940017853 A KR1019940017853 A KR 1019940017853A KR 19940017853 A KR19940017853 A KR 19940017853A KR 0146410 B1 KR0146410 B1 KR 0146410B1
Authority
KR
South Korea
Prior art keywords
magnet
tin
film
trapezoidal
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1019940017853A
Other languages
English (en)
Korean (ko)
Inventor
마사히코 고바야시
노부유키 다카하시
Original Assignee
니시하라 순지
니치덴 아네루바 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 니시하라 순지, 니치덴 아네루바 가부시키가이샤 filed Critical 니시하라 순지
Application granted granted Critical
Publication of KR0146410B1 publication Critical patent/KR0146410B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3455—Movable magnets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1019940017853A 1993-10-22 1994-07-23 Ti-TiN 적층막의 성막방법 및 마그네트론 캐소드 Expired - Lifetime KR0146410B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5264770A JP2627861B2 (ja) 1993-10-22 1993-10-22 Ｔｉ−ＴｉＮ積層膜の成膜方法および装置
JP93-264770 1993-10-22

Publications (1)

Publication Number Publication Date
KR0146410B1 true KR0146410B1 (ko) 1998-11-02

Family

ID=17407950

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940017853A Expired - Lifetime KR0146410B1 (ko) 1993-10-22 1994-07-23 Ti-TiN 적층막의 성막방법 및 마그네트론 캐소드

Country Status (4)

Country Link
US (2) US5514257A (enExample)
JP (1) JP2627861B2 (enExample)
KR (1) KR0146410B1 (enExample)
TW (1) TW248573B (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2950218B2 (ja) * 1995-09-18 1999-09-20 ヤマハ株式会社 半導体装置の製造方法
GB9606920D0 (en) * 1996-04-02 1996-06-05 Applied Vision Ltd Magnet array for magnetrons
JP3935231B2 (ja) * 1996-09-18 2007-06-20 キヤノンアネルバ株式会社 スパッタリング装置
US5685959A (en) * 1996-10-25 1997-11-11 Hmt Technology Corporation Cathode assembly having rotating magnetic-field shunt and method of making magnetic recording media
US6464841B1 (en) * 1997-03-04 2002-10-15 Tokyo Electron Limited Cathode having variable magnet configuration
US6692617B1 (en) * 1997-05-08 2004-02-17 Applied Materials, Inc. Sustained self-sputtering reactor having an increased density plasma
DE69928790T2 (de) * 1998-04-16 2006-08-31 Bekaert Advanced Coatings N.V. Mittel zur kontrolle der targetabtragung und der zerstäubung in einem magnetron
US6063244A (en) * 1998-05-21 2000-05-16 International Business Machines Corporation Dual chamber ion beam sputter deposition system
US6555455B1 (en) 1998-09-03 2003-04-29 Micron Technology, Inc. Methods of passivating an oxide surface subjected to a conductive material anneal
US6328858B1 (en) 1998-10-01 2001-12-11 Nexx Systems Packaging, Llc Multi-layer sputter deposition apparatus
US6207026B1 (en) * 1999-10-13 2001-03-27 Applied Materials, Inc. Magnetron with cooling system for substrate processing system
JP4714322B2 (ja) * 2000-04-28 2011-06-29 株式会社アルバック 窒化アルミ膜成膜方法
US6821912B2 (en) 2000-07-27 2004-11-23 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
US6530733B2 (en) 2000-07-27 2003-03-11 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
US6682288B2 (en) 2000-07-27 2004-01-27 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
AUPR353601A0 (en) * 2001-03-05 2001-03-29 Commonwealth Scientific And Industrial Research Organisation Deposition process
US7244669B2 (en) * 2001-05-23 2007-07-17 Plastic Logic Limited Patterning of devices
US6491801B1 (en) * 2001-08-07 2002-12-10 Applied Materials, Inc. Auxiliary vertical magnet outside a nested unbalanced magnetron
JP4517070B2 (ja) * 2003-03-07 2010-08-04 株式会社昭和真空 マグネトロンスパッタ装置及び方法
US7100954B2 (en) 2003-07-11 2006-09-05 Nexx Systems, Inc. Ultra-thin wafer handling system
KR100667561B1 (ko) * 2005-02-18 2007-01-11 주식회사 아이피에스 박막 증착 방법
CN106903449A (zh) * 2017-03-02 2017-06-30 北京创世威纳科技有限公司 一种用于锥形或球冠形工件刻蚀的装置
CN108690962B (zh) * 2017-04-06 2020-06-19 北京北方华创微电子装备有限公司 磁控溅射设备及磁控溅射沉积方法
CN111304620A (zh) * 2020-04-24 2020-06-19 北京北方华创微电子装备有限公司 半导体加工设备及其磁控管机构

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8332394D0 (en) * 1983-12-05 1984-01-11 Pilkington Brothers Plc Coating apparatus
US4783248A (en) * 1987-02-10 1988-11-08 Siemens Aktiengesellschaft Method for the production of a titanium/titanium nitride double layer
JP2549291B2 (ja) * 1987-05-23 1996-10-30 株式会社トーキン マグネトロンスパッタリング装置
US4753851A (en) * 1987-05-29 1988-06-28 Harris Multiple layer, tungsten/titanium/titanium nitride adhesion/diffusion barrier layer structure for gold-base microcircuit interconnection
JPH0768617B2 (ja) * 1988-04-18 1995-07-26 日電アネルバ株式会社 マグネトロンスパッタリング装置
JPH01268869A (ja) * 1988-04-20 1989-10-26 Fuji Photo Film Co Ltd スパッタリング装置
JP2627651B2 (ja) * 1988-10-17 1997-07-09 アネルバ株式会社 マグネトロンスパッタリング装置
JPH02122073A (ja) * 1988-10-28 1990-05-09 Fujitsu Ltd マグネトロンスパッタ装置
KR950000011B1 (ko) * 1990-02-28 1995-01-07 니찌덴 아네루바 가부시끼가이샤 마그네트론 스패터링장치 및 박막형성방법
JP2598353B2 (ja) * 1991-12-04 1997-04-09 アネルバ株式会社 基板処理装置、基板搬送装置及び基板交換方法
US5282947A (en) * 1992-08-13 1994-02-01 Vlsi Technology, Inc. Magnet assembly for enhanced sputter target erosion

Also Published As

Publication number Publication date
US5514257A (en) 1996-05-07
US5643427A (en) 1997-07-01
JPH07118833A (ja) 1995-05-09
TW248573B (enExample) 1995-06-01
JP2627861B2 (ja) 1997-07-09

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