JPWO2025220060A5 - - Google Patents

Info

Publication number
JPWO2025220060A5
JPWO2025220060A5 JP2025552164A JP2025552164A JPWO2025220060A5 JP WO2025220060 A5 JPWO2025220060 A5 JP WO2025220060A5 JP 2025552164 A JP2025552164 A JP 2025552164A JP 2025552164 A JP2025552164 A JP 2025552164A JP WO2025220060 A5 JPWO2025220060 A5 JP WO2025220060A5
Authority
JP
Japan
Prior art keywords
wafer mounting
ceramic plate
gas passage
gas
platform according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2025552164A
Other languages
English (en)
Japanese (ja)
Other versions
JP7809252B1 (ja
JPWO2025220060A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2024/014923 external-priority patent/WO2025220060A1/ja
Publication of JPWO2025220060A1 publication Critical patent/JPWO2025220060A1/ja
Application granted granted Critical
Publication of JP7809252B1 publication Critical patent/JP7809252B1/ja
Publication of JPWO2025220060A5 publication Critical patent/JPWO2025220060A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2025552164A 2024-04-15 2024-04-15 ウエハ載置台 Active JP7809252B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2024/014923 WO2025220060A1 (ja) 2024-04-15 2024-04-15 ウエハ載置台

Publications (3)

Publication Number Publication Date
JPWO2025220060A1 JPWO2025220060A1 (https=) 2025-10-23
JP7809252B1 JP7809252B1 (ja) 2026-01-30
JPWO2025220060A5 true JPWO2025220060A5 (https=) 2026-03-25

Family

ID=97403145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025552164A Active JP7809252B1 (ja) 2024-04-15 2024-04-15 ウエハ載置台

Country Status (3)

Country Link
JP (1) JP7809252B1 (https=)
KR (1) KR20260027328A (https=)
WO (1) WO2025220060A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7002357B2 (ja) * 2018-02-06 2022-01-20 株式会社日立ハイテク プラズマ処理装置
JP2023044634A (ja) * 2021-09-17 2023-03-30 東京エレクトロン株式会社 プラズマ処理装置
TW202326801A (zh) * 2021-11-26 2023-07-01 日商東京威力科創股份有限公司 靜電吸盤及電漿處理裝置
JP7569342B2 (ja) * 2022-01-21 2024-10-17 日本碍子株式会社 半導体製造装置用部材
JP2023131599A (ja) * 2022-03-09 2023-09-22 東京エレクトロン株式会社 基板載置台、基板処理装置、及び基板載置台の製造方法

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