JPWO2025220065A5 - - Google Patents

Info

Publication number
JPWO2025220065A5
JPWO2025220065A5 JP2026505665A JP2026505665A JPWO2025220065A5 JP WO2025220065 A5 JPWO2025220065 A5 JP WO2025220065A5 JP 2026505665 A JP2026505665 A JP 2026505665A JP 2026505665 A JP2026505665 A JP 2026505665A JP WO2025220065 A5 JPWO2025220065 A5 JP WO2025220065A5
Authority
JP
Japan
Prior art keywords
base plate
gas passage
ceramic plate
wafer mounting
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2026505665A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025220065A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2024/014961 external-priority patent/WO2025220065A1/ja
Publication of JPWO2025220065A1 publication Critical patent/JPWO2025220065A1/ja
Publication of JPWO2025220065A5 publication Critical patent/JPWO2025220065A5/ja
Pending legal-status Critical Current

Links

JP2026505665A 2024-04-15 2024-04-15 Pending JPWO2025220065A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2024/014961 WO2025220065A1 (ja) 2024-04-15 2024-04-15 ウエハ載置台

Publications (2)

Publication Number Publication Date
JPWO2025220065A1 JPWO2025220065A1 (https=) 2025-10-23
JPWO2025220065A5 true JPWO2025220065A5 (https=) 2026-04-14

Family

ID=97403192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2026505665A Pending JPWO2025220065A1 (https=) 2024-04-15 2024-04-15

Country Status (2)

Country Link
JP (1) JPWO2025220065A1 (https=)
WO (1) WO2025220065A1 (https=)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7130359B2 (ja) * 2016-12-05 2022-09-05 東京エレクトロン株式会社 プラズマ処理装置
JP7002357B2 (ja) * 2018-02-06 2022-01-20 株式会社日立ハイテク プラズマ処理装置
KR102814220B1 (ko) * 2020-08-21 2025-05-28 니혼도꾸슈도교 가부시키가이샤 접합체, 유지 장치, 및 정전 척
JP2023044634A (ja) * 2021-09-17 2023-03-30 東京エレクトロン株式会社 プラズマ処理装置
TW202333191A (zh) * 2021-10-28 2023-08-16 日商東京威力科創股份有限公司 電漿處理裝置及靜電吸盤
TW202326801A (zh) * 2021-11-26 2023-07-01 日商東京威力科創股份有限公司 靜電吸盤及電漿處理裝置
JP7620578B2 (ja) * 2022-01-07 2025-01-23 日本碍子株式会社 半導体製造装置用部材
JP7483121B2 (ja) * 2022-02-09 2024-05-14 日本碍子株式会社 半導体製造装置用部材

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