JPWO2023181950A5 - - Google Patents
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- Publication number
- JPWO2023181950A5 JPWO2023181950A5 JP2024509976A JP2024509976A JPWO2023181950A5 JP WO2023181950 A5 JPWO2023181950 A5 JP WO2023181950A5 JP 2024509976 A JP2024509976 A JP 2024509976A JP 2024509976 A JP2024509976 A JP 2024509976A JP WO2023181950 A5 JPWO2023181950 A5 JP WO2023181950A5
- Authority
- JP
- Japan
- Prior art keywords
- sensitive
- group
- radiation
- resin composition
- actinic ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022047069 | 2022-03-23 | ||
| PCT/JP2023/008868 WO2023181950A1 (ja) | 2022-03-23 | 2023-03-08 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023181950A1 JPWO2023181950A1 (https=) | 2023-09-28 |
| JPWO2023181950A5 true JPWO2023181950A5 (https=) | 2024-11-29 |
Family
ID=88100766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024509976A Pending JPWO2023181950A1 (https=) | 2022-03-23 | 2023-03-08 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240419072A1 (https=) |
| JP (1) | JPWO2023181950A1 (https=) |
| KR (1) | KR102912739B1 (https=) |
| TW (1) | TW202347025A (https=) |
| WO (1) | WO2023181950A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4125260A1 (de) * | 1991-07-31 | 1993-02-04 | Hoechst Ag | Oligomere verbindungen mit saeurelabilen schutzgruppen und damit hergestelltes positiv arbeitendes strahlungsempfindliches gemisch |
| US6436605B1 (en) * | 1999-07-12 | 2002-08-20 | International Business Machines Corporation | Plasma resistant composition and use thereof |
| JP2003066610A (ja) * | 2001-08-27 | 2003-03-05 | Toppan Printing Co Ltd | ポリイミド樹脂及びこれを含有する感光性樹脂組成物 |
| JP7119592B2 (ja) | 2018-05-31 | 2022-08-17 | 日本ゼオン株式会社 | Ｅｕｖリソグラフィ用ポジ型レジスト組成物およびレジストパターン形成方法 |
| JP7215005B2 (ja) * | 2018-07-23 | 2023-01-31 | 日本ゼオン株式会社 | 重合体及びその製造方法、ポジ型レジスト組成物、並びにレジストパターン形成方法 |
| KR20250138820A (ko) * | 2019-07-02 | 2025-09-22 | 오지 홀딩스 가부시키가이샤 | 패턴 형성 방법, 레지스트 재료, 및 패턴 형성 장치 |
-
2023
- 2023-03-08 JP JP2024509976A patent/JPWO2023181950A1/ja active Pending
- 2023-03-08 KR KR1020247028024A patent/KR102912739B1/ko active Active
- 2023-03-08 WO PCT/JP2023/008868 patent/WO2023181950A1/ja not_active Ceased
- 2023-03-17 TW TW112110095A patent/TW202347025A/zh unknown
-
2024
- 2024-08-19 US US18/808,427 patent/US20240419072A1/en active Pending
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