JPWO2023181635A1 - - Google Patents

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Publication number
JPWO2023181635A1
JPWO2023181635A1 JP2024509802A JP2024509802A JPWO2023181635A1 JP WO2023181635 A1 JPWO2023181635 A1 JP WO2023181635A1 JP 2024509802 A JP2024509802 A JP 2024509802A JP 2024509802 A JP2024509802 A JP 2024509802A JP WO2023181635 A1 JPWO2023181635 A1 JP WO2023181635A1
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JP
Japan
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JP2024509802A
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Japanese (ja)
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JP7765605B2 (ja
JPWO2023181635A5 (https=
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Publication of JPWO2023181635A5 publication Critical patent/JPWO2023181635A5/ja
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Publication of JP7765605B2 publication Critical patent/JP7765605B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/302—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and two or more oxygen atoms in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C08F290/126—Polymers of unsaturated carboxylic acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • C08K5/132—Phenols containing keto groups, e.g. benzophenones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5397—Phosphine oxides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Polymerization Catalysts (AREA)
JP2024509802A 2022-03-24 2023-01-27 仮固定用組成物 Active JP7765605B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022048913 2022-03-24
JP2022048913 2022-03-24
PCT/JP2023/002751 WO2023181635A1 (ja) 2022-03-24 2023-01-27 仮固定用組成物

Publications (3)

Publication Number Publication Date
JPWO2023181635A1 true JPWO2023181635A1 (https=) 2023-09-28
JPWO2023181635A5 JPWO2023181635A5 (https=) 2024-09-18
JP7765605B2 JP7765605B2 (ja) 2025-11-06

Family

ID=88100990

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2024509802A Active JP7765605B2 (ja) 2022-03-24 2023-01-27 仮固定用組成物
JP2024509810A Active JP7629143B2 (ja) 2022-03-24 2023-01-31 仮固定用組成物、仮固定用接着剤、及び薄型ウエハの製造方法
JP2024121253A Pending JP2024144632A (ja) 2022-03-24 2024-07-26 仮固定用組成物、仮固定用接着剤、及び薄型ウエハの製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2024509810A Active JP7629143B2 (ja) 2022-03-24 2023-01-31 仮固定用組成物、仮固定用接着剤、及び薄型ウエハの製造方法
JP2024121253A Pending JP2024144632A (ja) 2022-03-24 2024-07-26 仮固定用組成物、仮固定用接着剤、及び薄型ウエハの製造方法

Country Status (5)

Country Link
JP (3) JP7765605B2 (https=)
KR (1) KR20240129029A (https=)
CN (1) CN118804961A (https=)
TW (2) TWI872445B (https=)
WO (2) WO2023181635A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024162057A1 (ja) * 2023-01-31 2024-08-08 デンカ株式会社 組成物
JPWO2024162049A1 (https=) * 2023-01-31 2024-08-08
CN120641516A (zh) * 2023-01-31 2025-09-12 电化株式会社 临时固定用组合物、临时固定用粘接剂以及薄型晶片的制造方法
JP2025150191A (ja) * 2024-03-27 2025-10-09 デンカ株式会社 仮固定用組成物およびウエハの製造方法
WO2025263391A1 (ja) * 2024-06-20 2025-12-26 デンカ株式会社 仮固定用組成物およびウエハの製造方法
KR102851651B1 (ko) * 2024-12-05 2025-08-28 솔루스첨단소재 주식회사 광경화성 아크릴 수지 조성물 및 이의 경화물

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06177094A (ja) * 1992-12-10 1994-06-24 Mitsui Toatsu Chem Inc ウエハ裏面研削用テープおよびその使用方法
JP2000119262A (ja) * 1998-10-14 2000-04-25 Otsuka Chem Co Ltd ビスベンゾトリアゾリルフェノール化合物、紫外線吸収剤、紫外線吸収性ポリマー、これらを含有した樹脂組成物及び被覆材料
JP2002510862A (ja) * 1998-03-30 2002-04-09 ミネソタ マイニング アンド マニュファクチャリング カンパニー 半導体ウェハ加工テープ
JP2006522839A (ja) * 2003-02-20 2006-10-05 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 光硬化性組成物
JP2014101495A (ja) * 2012-10-25 2014-06-05 Central Glass Co Ltd 接着性組成物およびその接着方法、および接着後の剥離方法
KR20150024708A (ko) * 2013-08-27 2015-03-09 서울대학교산학협력단 벤조트리아졸계 (메트)아크릴레이트 공중합체 및 이를 포함하는 접착제 조성물
JP2018001604A (ja) * 2016-07-01 2018-01-11 東京応化工業株式会社 積層体、その製造方法、電子部品の製造方法、及び積層体において分離層と基板との接着性を向上させる方法
WO2022230874A1 (ja) * 2021-04-26 2022-11-03 デンカ株式会社 組成物
JP2023008789A (ja) * 2021-07-02 2023-01-19 日鉄ケミカル＆マテリアル株式会社 接着剤層形成用組成物、積層体、積層体の製造方法および積層体の処理方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6887917B2 (en) * 2002-12-30 2005-05-03 3M Innovative Properties Company Curable pressure sensitive adhesive compositions
WO2021235406A1 (ja) 2020-05-21 2021-11-25 デンカ株式会社 組成物

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06177094A (ja) * 1992-12-10 1994-06-24 Mitsui Toatsu Chem Inc ウエハ裏面研削用テープおよびその使用方法
JP2002510862A (ja) * 1998-03-30 2002-04-09 ミネソタ マイニング アンド マニュファクチャリング カンパニー 半導体ウェハ加工テープ
JP2000119262A (ja) * 1998-10-14 2000-04-25 Otsuka Chem Co Ltd ビスベンゾトリアゾリルフェノール化合物、紫外線吸収剤、紫外線吸収性ポリマー、これらを含有した樹脂組成物及び被覆材料
JP2006522839A (ja) * 2003-02-20 2006-10-05 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 光硬化性組成物
JP2014101495A (ja) * 2012-10-25 2014-06-05 Central Glass Co Ltd 接着性組成物およびその接着方法、および接着後の剥離方法
KR20150024708A (ko) * 2013-08-27 2015-03-09 서울대학교산학협력단 벤조트리아졸계 (메트)아크릴레이트 공중합체 및 이를 포함하는 접착제 조성물
JP2018001604A (ja) * 2016-07-01 2018-01-11 東京応化工業株式会社 積層体、その製造方法、電子部品の製造方法、及び積層体において分離層と基板との接着性を向上させる方法
WO2022230874A1 (ja) * 2021-04-26 2022-11-03 デンカ株式会社 組成物
JP2023008789A (ja) * 2021-07-02 2023-01-19 日鉄ケミカル＆マテリアル株式会社 接着剤層形成用組成物、積層体、積層体の製造方法および積層体の処理方法

Also Published As

Publication number Publication date
WO2023181635A1 (ja) 2023-09-28
KR20240129029A (ko) 2024-08-27
JP7765605B2 (ja) 2025-11-06
WO2023181648A1 (ja) 2023-09-28
JP7629143B2 (ja) 2025-02-12
CN118804961A (zh) 2024-10-18
JP2024144632A (ja) 2024-10-11
TWI872445B (zh) 2025-02-11
TW202338042A (zh) 2023-10-01
JPWO2023181648A1 (https=) 2023-09-28
TW202337884A (zh) 2023-10-01

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