JPWO2023176259A1 - - Google Patents
Info
- Publication number
- JPWO2023176259A1 JPWO2023176259A1 JP2023528273A JP2023528273A JPWO2023176259A1 JP WO2023176259 A1 JPWO2023176259 A1 JP WO2023176259A1 JP 2023528273 A JP2023528273 A JP 2023528273A JP 2023528273 A JP2023528273 A JP 2023528273A JP WO2023176259 A1 JPWO2023176259 A1 JP WO2023176259A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Chemical & Material Sciences (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Formation Of Insulating Films (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Graft Or Block Polymers (AREA)
- Polymerisation Methods In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023086262A JP2023138499A (ja) | 2022-03-18 | 2023-05-25 | 絶縁膜形成用感光性樹脂組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022043595 | 2022-03-18 | ||
| JP2022043595 | 2022-03-18 | ||
| PCT/JP2023/005180 WO2023176259A1 (ja) | 2022-03-18 | 2023-02-15 | 絶縁膜形成用感光性樹脂組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023086262A Division JP2023138499A (ja) | 2022-03-18 | 2023-05-25 | 絶縁膜形成用感光性樹脂組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP7332076B1 JP7332076B1 (ja) | 2023-08-23 |
| JPWO2023176259A1 true JPWO2023176259A1 (https=) | 2023-09-21 |
| JPWO2023176259A5 JPWO2023176259A5 (https=) | 2024-02-22 |
Family
ID=87576957
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023528273A Active JP7332076B1 (ja) | 2022-03-18 | 2023-02-15 | 絶縁膜形成用感光性樹脂組成物 |
| JP2023086262A Pending JP2023138499A (ja) | 2022-03-18 | 2023-05-25 | 絶縁膜形成用感光性樹脂組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023086262A Pending JP2023138499A (ja) | 2022-03-18 | 2023-05-25 | 絶縁膜形成用感光性樹脂組成物 |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JP7332076B1 (https=) |
| KR (2) | KR20240155178A (https=) |
| CN (1) | CN117099046A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025134897A1 (ja) * | 2023-12-18 | 2025-06-26 | 株式会社レゾナック | 感光性樹脂組成物、硬化物及び半導体素子 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05295115A (ja) | 1992-04-24 | 1993-11-09 | Sumitomo Bakelite Co Ltd | 低熱膨張性ポリイミド樹脂およびその製造方法 |
| JP2000347404A (ja) | 1999-06-02 | 2000-12-15 | Hitachi Chemical Dupont Microsystems Ltd | 感光性重合体組成物並びにこれを用いた電子部品及びその製造法 |
| KR101010036B1 (ko) | 2009-08-28 | 2011-01-21 | 주식회사 엘지화학 | 신규한 폴리아믹산, 이를 포함하는 감광성 수지 조성물 및 이로부터 제조된 드라이 필름 |
| JP6146578B2 (ja) * | 2011-12-28 | 2017-06-14 | 日産化学工業株式会社 | 液晶配向剤、液晶配向膜、液晶表示素子及び液晶表示素子の製造方法 |
| KR102283305B1 (ko) * | 2012-12-12 | 2021-07-28 | 닛산 가가쿠 가부시키가이샤 | 조성물, 액정 배향 처리제, 액정 배향막 및 액정 표시 소자 |
| WO2016172089A1 (en) * | 2015-04-21 | 2016-10-27 | Fujifilm Electronic Materials U.S.A., Inc. | Photosensitive polyimide compositions |
| TWI728137B (zh) * | 2016-06-29 | 2021-05-21 | 日商富士軟片股份有限公司 | 負型感光性樹脂組成物、硬化膜、硬化膜的製造方法、半導體裝置、積層體的製造方法、半導體裝置的製造方法及聚醯亞胺前驅物 |
-
2023
- 2023-02-15 CN CN202380010276.5A patent/CN117099046A/zh active Pending
- 2023-02-15 KR KR1020247002182A patent/KR20240155178A/ko active Pending
- 2023-02-15 KR KR1020237023964A patent/KR102628683B1/ko active Active
- 2023-02-15 JP JP2023528273A patent/JP7332076B1/ja active Active
- 2023-05-25 JP JP2023086262A patent/JP2023138499A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20240155178A (ko) | 2024-10-28 |
| JP7332076B1 (ja) | 2023-08-23 |
| KR102628683B1 (ko) | 2024-01-25 |
| KR20230136738A (ko) | 2023-09-26 |
| CN117099046A (zh) | 2023-11-21 |
| JP2023138499A (ja) | 2023-10-02 |
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